Abstract
The optical properties of ZnO thin films were modulated using Mg alloying and applying bending stress. To modulate the optical properties using bending stress, synthetic mica was employed as a flexible substrate and the epitaxial growth was achieved by mist chemical vapor deposition (mist CVD). In addition, a ZnMgO alloy thin film was grown by mixing Mg precursors. Based on the previous studies on the relationship between Mg composition in the films and c-axis length, the Mg composition in the ZnMgO thin film was approximately 18%. Transmittance and photoluminescence (PL) spectra revealed that the optical properties of ZnO were also modulated by the Mg alloying. Moreover, the PL peak energies of the epitaxial ZnO and ZnMgO thin films were red shifted by approximately 15 meV due to the applied bending stress.
Graphical Abstract
Similar content being viewed by others
References
A. Tsukazaki, A. Ohtomo, T. Onuma, M. Ohtani, T. Makino, M. Sumiya, K. Ohtani, S.F. Chichibu, S. Fuke, Y. Segawa, H. Ohno, H. Koinuma, M. Kawasaki, Nat. Mater. 4, 42–46 (2005). https://doi.org/10.1038/nmat1284
L. Gong, Z. Ye, J. Lu, L. Zhu, J. Huang, X. Gu, B. Zhao, Vacuum 84, 947–952 (2010). https://doi.org/10.1016/j.vacuum.2010.01.010
F. Rahman, Opt. Eng. 58, 010901 (2019). https://doi.org/10.1117/1.OE.58.1.010901
X. Liao, X. Yan, P. Lin, S. Lu, Y. Tian, Y. Zhang, ACS Appl. Mater. Interfaces 7, 1602–1607 (2015). https://doi.org/10.1021/am5070443
F.C. Krebs, Org. Electron. 10, 761–768 (2009). https://doi.org/10.1016/j.orgel.2009.03.009
X. Chen, G. Xu, G. Zeng, H. Gu, H. Chen, H. Xu, H. Yao, Y. Li, J. Hou, Y. Li, Adv. Mater. 32, 1908478 (2020). https://doi.org/10.1002/adma.201908478
F. Alema, O. Ledyaev, R. Miller, V. Beletsky, A. Osinsky, W.V. Schoenfeld, J. Cryst. Growth 435, 6–11 (2016). https://doi.org/10.1016/j.jcrysgro.2015.11.012
A. Ohtomo, M. Kawasaki, T. Koida, K. Masubuchi, H. Koinuma, Y. Sakurai, Y. Yoshida, T. Yasuda, Y. Segawa, Appl. Phys. Lett. 72, 2466–2468 (1998). https://doi.org/10.1063/1.121384
K. Koike, K. Hama, I. Nakashima, G.-Y. Takada, K.-I. Ogata, S. Sasa, M. Inoue, M. Yano, J. Cryst. Growth 278, 288–292 (2005). https://doi.org/10.1016/j.jcrysgro.2005.01.021
T.A. Wassner, B. Laumer, S. Maier, A. Laufer, B.K. Meyer, M. Stutzmann, M. Eickhoff, J. Appl. Phys. 105, 023505 (2009). https://doi.org/10.1063/1.3065535
H. Nishinaka, Y. Kamada, N. Kameyama, S. Fujita, Phys. Status Solidi B 247, 1460–1463 (2010). https://doi.org/10.1002/pssb.200983247
P. Rutthongjan, L. Liu, M. Nishi, M. Sakamoto, S. Sato, E.K.C. Pradeep, G.T. Dang, T. Kwaharamura, Jpn. J. Appl. Phys. 58, 035503 (2019). https://doi.org/10.7567/1347-4065/aafd18
R. Ghosh, D. Basak, S. Fujihara, J. Appl. Phys. 96, 2689–2692 (2004). https://doi.org/10.1063/1.1769598
A.B.M.A. Ashrafi, N.T. Binh, B.-P. Zhang, Y. Segawa, Appl. Phys. Lett. 84, 2814–2816 (2004). https://doi.org/10.1063/1.1705722
T.P. Rao, M.C.S. Kumar, S.A. Angayarkanni, M. Ashok, J. Alloys Compd. 485, 413–417 (2009). https://doi.org/10.1016/j.jallcom.2009.05.116
B. Wei, K. Zheng, Y. Ji, Y. Zhang, Z. Zhang, X. Han, Nano Lett. 12, 4595–4599 (2012). https://doi.org/10.1021/nl301897q
R. Chen, Q.-L. Ye, T.C. He, T. Wu, H.D. Sun, Appl. Phys. Lett. 98, 241916 (2011). https://doi.org/10.1063/1.3601479
F. Fang, D. Zhao, B. Li, Z. Zhang, D. Shen, X. Wang, J. Phys. Chem. C 114, 12477–12480 (2010). https://doi.org/10.1021/jp1037975
A. Koma, Thin Solid Films 216, 72–76 (1992). https://doi.org/10.1016/0040-6090(92)90872-9
C.-I. Li, J.-C. Lin, H.-J. Liu, M.-W. Chu, H.-W. Chen, C.-H. Ma, C.-Y. Tsai, H.-W. Huang, H.-J. Lin, H.-L. Liu, P.-W. Chiu, Y.-H. Chu, Chem. Mater. 28, 3914–3919 (2016). https://doi.org/10.1021/acs.chemmater.6b01180
C.-H. Ma, J.-C. Lin, H.-J. Liu, T.H. Do, Y.-M. Zhu, T.D. Ha, Q. Zhan, J.-Y. Juang, Q. He, E. Arenholz, P.-W. Chiu, Y.-H. Chu, Appl. Phys. Lett. 108, 3104 (2016). https://doi.org/10.1063/1.4954172
M. Yen, Y.-H. Lai, C.-L. Zhang, H.-Y. Cheng, Y.-T. Hsieh, J.-W. Chen, Y.-C. Chen, L. Chang, N.-T. Tsou, J.-Y. Li, Y.-H. Chu, ACS Appl. Mater. Interfaces 12, 21818–21826 (2020). https://doi.org/10.1021/acsami.0c02275
B. Li, L. Ding, P. Gui, N. Liu, Y. Yue, Z. Chen, Z. Song, J. Wen, H. Lei, Z. Zhu, X. Wang, M. Su, L. Liao, Y. Gao, D. Zhang, G. Fang, Adv. Mater. Interfaces 6, 1901156 (2019). https://doi.org/10.1002/admi.201901156
H.-G. Chen, Y.-H. Shih, H.-S. Wang, S.-R. Jian, T.-Y. Yang, S.-C. Chuang, Coatings 12, 706 (2022). https://doi.org/10.3390/coatings12050706
S. Ke, J. Xie, C. Chen, P. Lin, X. Zeng, L. Shu, L. Fei, Y. Wang, M. Ye, D. Wang, Appl. Phys. Lett. 112, 031905 (2018). https://doi.org/10.1063/1.5010358
Y. Arata, H. Nishinaka, K. Shimazoe, M. Yoshimoto, MRS Adv. 5, 1671–1679 (2020). https://doi.org/10.1557/adv.2020.85
D. Tahara, H. Nishinaka, S. Morimoto, M. Yoshimoto, Appl. Phys. Lett. 112, 152102 (2018). https://doi.org/10.1063/1.5021296
G.T. Dang, T. Kawaharamura, M. Furuta, M.W. Allen, IEEE Electron Device Lett. 36, 463–465 (2015). https://doi.org/10.1109/LED.2015.2412124
Y. Ogura, Y. Arata, H. Nishinaka, M. Yoshimoto, Jpn. J. Appl. Phys. 61, SC1037 (2022). https://doi.org/10.35848/1347-4065/ac4688
S.C. Abrahams, J.L. Bernstein, Acta Cryst. B25, 1233–1236 (1969). https://doi.org/10.1107/S0567740869003876
Acknowledgments
This study was supported by the JST SPRING (Grant Number JPMJSP2107).
Author information
Authors and Affiliations
Corresponding author
Ethics declarations
Conflict of interest
The authors have no financial or proprietary interests in any material discussed in this article.
Additional information
Publisher's Note
Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.
Rights and permissions
Springer Nature or its licensor (e.g. a society or other partner) holds exclusive rights to this article under a publishing agreement with the author(s) or other rightsholder(s); author self-archiving of the accepted manuscript version of this article is solely governed by the terms of such publishing agreement and applicable law.
About this article
Cite this article
Arata, Y., Nishinaka, H., Kanegae, K. et al. Modulation of optical properties in epitaxial ZnO thin films on synthetic mica by incorporating Mg and bending stress. MRS Advances 8, 371–375 (2023). https://doi.org/10.1557/s43580-023-00534-0
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1557/s43580-023-00534-0