Abstract
Observation of ovonic threshold switching (OTS) behavior in ZnTe attracted attention to this material as a replacement to GeAsSeTe alloy currently used for the OTS selector devices in the non-volatile memory. However, only ZnTe films deposited by RF magnetron sputtering were studied. Here, we extended the study of this material to ZnTe films grown using Atomic Layer Deposition (ALD). As a conformal growth technique, ALD is much more suitable for memory devices. We determined that, in addition to threshold switching, ALD-deposited ZnTe films can undergo high-speed non-volatile phase change. Such dual behavior of ZnTe expands potential applications of this material. It opens the opportunity to use ZnTe both for OTS selector elements and phase change memory elements greatly simplifying fabrication of memory devices.
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The datasets generated during and/or analyzed during the current study are available from the corresponding author on reasonable request.
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This material is based upon work supported by the DOE SBIR Program Office under Contract No. DE-SC0020938.
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Maksimov, O., Hansen, K., Bhandari, H.B. et al. Novel applications of ZnTe as an ovonic threshold switching and as a phase change material. MRS Advances 8, 173–176 (2023). https://doi.org/10.1557/s43580-023-00508-2
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DOI: https://doi.org/10.1557/s43580-023-00508-2