Abstract
Herein, we report the results of directly synthesizing wafer-scale graphene on silicon dioxide surface using the photoresist based and Cu and Cu/Ni thin-film coating-assisted chemical vapor deposition method. A systematical investigation of the effects of growth condition, such as temperature, time, and metal catalyst layer of Cu and Cu/Ni, on the growth of graphene have been conducted. Multi-layer graphene films are prone to be grown using the Cu/Ni capping layer, while monolayer graphene films are produced using the Cu capping layer. The results demonstrate that such simple method using solid phase photoresist as carbon feedstock can provide a practical route to realize large-scale and mass production of monolayer graphene on dielectric substrate no need of conventional transfer procedure. It sheds a light on future graphene electronic industry.
Graphical abstract
Data availability
The datasets generated during and analyzed during the current study are available from the corresponding author on reasonable request.
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Acknowledgments
This work was supported by the National Natural Science Foundation of China (No. 11774255) and the National Key R&D Program of China (No. 2020YFC2004602).
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Funding was provided by the National Natural Science Foundation of China (Grant Number 11774255) and the National Key R&D Program of China (973 Program) (Grant Number 2020YFC2004602).
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Wang, S., Li, M., Chen, Z. et al. Study of solid carbon source-based graphene growth directly on SiO2 substrate with Cu or Cu/Ni as the sacrificial catalysts. MRS Communications 13, 34–40 (2023). https://doi.org/10.1557/s43579-022-00308-z
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DOI: https://doi.org/10.1557/s43579-022-00308-z