Abstract
Molecular dynamics simulations of a-Si:H/c-Si models with and without an oxygen layer at the interface were performed using a machine learning potential (MLP) that was efficiently trained using an on-the-fly scheme with ab initio molecular dynamics. The relaxation processes up to 1 ns at 500 and 700 K were simulated using MLP, and snapshots were evaluated using ab initio calculations to examine the in-gap states that could significantly affect the solar cell performance. The results showed that oxygen atoms passivated surface dangling bonds on c-Si, but simultaneously generated strain-induced in-gap states at the Si–O/a-Si interface. The hydrogen atoms suppressed the recrystallization of a-Si, distributed in a-Si particularly at the Si–O/a-Si interface because of the repulsive potential of the Si–O layer and contributed to the reduction of the in-gap states. Our results support experimental observation where optimization of the a-Si:H/O/c-Si interface could improve the performance of solar cells.
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Acknowledgments
We thank Drs. Kazuhiro Gotoh, Noritaka Usami, Alex Kutana, and Pradeep Varadwaj for fruitful discussions. We also thank Ferenc Karsai and Georg Kresse for their support with the VASP-MLP code.
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Computations of MLP done by TS with technical support by RJ; geometric analysis done by TS and JM; electronic structure analyses by RA and RJ; supervision RA; all authors have read and agreed to the published version of the manuscript.
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Semba, T., McKibbin, J., Jinnouchi, R. et al. Molecular dynamics simulations using machine learning potential for a-Si:H/c-Si interface: Effects of oxygen and hydrogen on interfacial defect states. Journal of Materials Research 38, 5151–5160 (2023). https://doi.org/10.1557/s43578-023-01155-x
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DOI: https://doi.org/10.1557/s43578-023-01155-x