Abstract
Two-dimensional MoS2 with a layered structure has excellent optoelectronic properties in theory, but MoS2 films prepared by chemical vapor deposition (CVD) method are still underexplored in optoelectronic applications. Hence, different layers of MoS2 films were prepared on sapphire substrate by CVD in this article. After structural characterization, the optoelectronic properties of MoS2 films with different number of layers under specific wavelength laser irradiation (365 nm, 532 nm, 650 nm) were explored, and the improvement of properties after annealing. The experimental results manifested that the multilayer MoS2 film had the highest sensitivity (0.589 mA/W), and the monolayer MoS2 film had the highest on/off ratio (34.68) to violet light. Furthermore, the annealed monolayer MoS2 had the shortest response and recovery time of only 3 s. The results demonstrated the great potential of two-dimensional MoS2 films in the field of photodetection and contributed to the development of a new generation of optoelectronic devices.
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The datasets generated during and/or analyzed during the current study are available from the corresponding author on reasonable request.
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Acknowledgments
This work was financially supported by the National Natural Science Foundation of China (51402220), Key Project of Hubei Education Department (D20191503), and Wuhan Institute of Technology Science Foundation (K201801). C.G. Wu appreciated the support from Graduate Education Innovation Fund provided by Wuhan Institute of Technology (CX2021173).
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Wu, C., Luo, S., Luo, X. et al. Exploring the photoelectric properties of 2D MoS2 thin films grown by CVD. Journal of Materials Research 37, 3470–3480 (2022). https://doi.org/10.1557/s43578-022-00720-0
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DOI: https://doi.org/10.1557/s43578-022-00720-0