Abstract
Alloys between Ga2O3 and Al2O3 (AGO) present a rich material space exhibiting numerous structural phases with unique optoelectronic properties that make them attractive candidates as ultra-wide bandgap (UWBG) semiconductors for next-generation power devices. Here we review the properties of AGO, focusing on theoretical results on the thermodynamics of Al incorporation and its consequences on the electronic structure. We review predictions and progress in experimentally realizing these alloys, as well as how composition influences important optoelectronic variables such as the band gap, band offsets, transport properties, and n-type dopability. A number of these parameters, such as the breakdown field (related to the band gap) and electron mobility, are discussed in assessing AGO in terms of relevant power device figures of merit. Overall, the rapid progress and predicted properties highlight the promise of AGO as a model UWBG semiconductor platform with the potential to revolutionize power devices.
Graphic Abstract

This is a preview of subscription content,
to check access.






Similar content being viewed by others
References
A.L. Hickman, R. Chaudhuri, S.J. Bader, K. Nomoto, L. Li, J.C.M. Hwang, H.G. Xing, D. Jena, Semicond. Sci. Technol. 36, 044001 (2021)
M. Higashiwaki, K. Sasaki, A. Kuramata, T. Masui, S. Yamakoshi, Appl. Phys. Lett. 100, 013504 (2012)
M. Higashiwaki, G.H. Jessen, Appl. Phys. Lett. 112, 060401 (2018)
J. Kim, S.J. Pearton, C. Fares, J. Yang, F. Ren, S. Kim, A.Y. Polyakov, J. Mater. Chem. C 7, 10 (2018)
Z. Galazka, Semicond. Sci. Technol. 33, 113001 (2018)
S.J. Pearton, J. Yang, P.H. Cary, F. Ren, J. Kim, M.J. Tadjer, M.A. Mastro, Appl. Phys. Rev. 5, 011301 (2018)
E. Ahmadi, Y. Oshima, J. Appl. Phys. 126, 160901 (2019)
D. Guo, Q. Guo, Z. Chen, Z. Wu, P. Li, W. Tang, Mater. Today Phys. 11, 100157 (2019)
R. Singh, T. Lenka, D. Panda, R. Velpula, B. Jain, H. Bui, H. Nguyen, Mater. Sci. Semicond. Process. 119, 105216 (2020)
M.H. Wong, M. Higashiwaki, IEEE Trans. Electron. Devices 67, 3925 (2020)
D. Kaur, M. Kumar, Adv. Opt. Mater. (2021). https://doi.org/10.1002/adom.202002160
H. Zhang, L. Yuan, X. Tang, J. Hu, J. Sun, Y. Zhang, Y. Zhang, R. Jia, IEEE Trans. Power Electron. 35, 5157 (2019)
Y. Zhang, J.S. Speck, Semicond. Sci. Technol. 35, 125018 (2020)
A.J. Green, K.D. Chabak, M. Baldini, N. Moser, R. Gilbert, R.C. Fitch, G. Wagner, Z. Galazka, J. Mccandless, A. Crespo, K. Leedy, G.H. Jessen, IEEE Electron Device Lett. 38, 790 (2017)
C. Kim, G. Pilania, R. Ramprasad, Chem. Mater. 28, 1304 (2016)
J.E.N. Swallow, C. Vorwerk, P. Mazzolini, P. Vogt, O. Bierwagen, A. Karg, M. Eickhoff, J. Schormann, M.R. Wagner, J.W. Roberts, P.R. Chalker, M.J. Smiles, P.A.E. Murgatroyd, S.A. Razek, Z.W. Lebens-Higgins, L.F.J. Piper, L.A.H. Jones, P.K. Thakur, T.-L. Lee, J.B. Varley, J. Furthmuller, C. Draxl, T.D. Veal, A. Regoutz, Chem. Mater. 32, 8460 (2020)
K. Momma, F. Izumi, J. Appl. Crystallogr. 44, 1272–1276 (2011)
A. Hassa, M. Grundmann, H.V. Wenckstern, J. Phys. D: Appl. Phys. (2020). https://doi.org/10.1088/1361-6463/abd4a4
Z. Li, Y. Wu, B. Feng, Y. Li, T. Liu, J. Feng, X. Chen, R. Huang, L. Xu, Z. Li, N. Hu, F. Li, Z. Jia, G. Niu, Q. Guo, G. He, and S. Ding, Phys. Status Solidi A 2000785 ( 2021)
B. Baliga, IEEE Electron Device Lett. 10, 455 (1989)
J.B. Varley, A. Perron, V. Lordi, D. Wickramaratne, J.L. Lyons, Appl. Phys. Lett. 116, 172104 (2020)
H. Peelaers, J.B. Varley, J.S. Speck, C.G. Van de Walle, Appl. Phys. Lett. 112, 242101 (2018)
P. Ranga, A. Rishinaramangalam, J. Varley, A. Bhattacharyya, D. Feezell, S. Krishnamoorthy, Appl. Phys. Express 12, 111004 (2019)
K.A. Mengle, E. Kioupakis, AIP Adv. 9, 015313 (2019)
S. Ponce, F. Giustino, Phys. Rev. Res. 2, 033102 (2020)
J. Fu, T. Song, X. Liang, G. Zhao, Results Phys. 14, 102505 (2019)
Y. Kamakura, T. Kotani, K. Konaga, N. Minamitani, G. Wakimura, and N. Mori, In: Proceedings of the 2015 IEEE International Electron Devices Meeting (IEDM) , 1 ( 2015)
S.B. Reese, T. Remo, J. Green, A. Zakutayev, Joule 3, 903 (2019)
T.E. Graedel, E.M. Harper, N.T. Nassar, P. Nuss, B.K. Reck, Proc. Natl. Acad. Sci. 112, 4257 (2015)
R. Jinno, C.S. Chang, T. Onuma, Y. Cho, S.-T. Ho, D. Rowe, M.C. Cao, K. Lee, V. Protasenko, D.G. Schlom, D.A. Muller, H.G. Xing, D. Jena, Sci. Adv. (2021). https://doi.org/10.1126/sciadv.abd5891
K. Ghosh, U. Singisetti, J. Mater. Res. 32, 4142 (2017)
S. Krishnamoorthy, Z. Xia, C. Joishi, Y. Zhang, J. McGlone, J. Johnson, M. Brenner, A.R. Arehart, J. Hwang, S. Lodha, S. Rajan, Appl. Phys. Lett. 111, 023502 (2017)
Y. Zhang, A. Neal, Z. Xia, C. Joishi, J.M. Johnson, Y. Zheng, S. Bajaj, M. Brenner, D. Dorsey, K. Chabak, G. Jessen, J. Hwang, S. Mou, J.P. Heremans, S. Rajan, Appl. Phys. Lett. 112, 173502 (2018)
E. Ahmadi, O.S. Koksaldi, X. Zheng, T. Mates, Y. Oshima, U.K. Mishra, J.S. Speck, Appl. Phys. Express 10, 071101 (2017)
T. Oshima, Y. Kato, N. Kawano, A. Kuramata, S. Yamakoshi, S. Fujita, T. Oishi, M. Kasu, Appl. Phys. Express 10, 035701 (2017)
A.F.M.A.U. Bhuiyan, Z. Feng, J.M. Johnson, Z. Chen, H.-L. Huang, J. Hwang, H. Zhao, Appl. Phys. Lett. 115, 120602 (2019)
A. Bhattacharyya, A. Chmielewski, S. Roy, R. Sun, M.A. Scarpulla, N. Alem, S. Krishnamoorthy, Appl. Express Phys. (2020). https://doi.org/10.35848/1882-0786/abd675
S. Mu, H. Peelaers, Y. Zhang, M. Wang, C.G. Van de Walle, Appl. Phys. Lett. 117, 252104 (2020)
H. Kim, H. Ko, Y.-C. Chung, S.B. Cho, J. Eur. Ceram. Soc. (2020). https://doi.org/10.1016/j.jeurceramsoc.2020.08.067
T. Oshima, T. Okuno, N. Arai, Y. Kobayashi, S. Fujita, Jap. J. Appl. Phys. 48, 070202 (2009)
S.W. Kaun, F. Wu, J.S. Speck, J. Vac. Sci. Technol. A 33, 041508 (2015)
H. Ito, K. Kaneko, S. Fujita, Jap. J. Appl. Phys. 51, 100207 (2012)
V.G. Hill, R. Roy, E.F. Osborn, J. Am. Ceram. Soc. 35, 135 (1952)
T. Wang, W. Li, C. Ni, A. Janotti, Phys. Rev. Appl. 10, 011003 (2018)
A. Ratnaparkhe, W.R.L. Lambrecht, Phys. Status Solidi B 257, 1900317 (2020)
R.E. Newnham, Y.M. Haan, Zeitschrift fur Kristallographie 117, 235 (1962)
R.H. French, J. Am. Ceram. Soc. 73, 477 (1990)
T. Uchida, R. Jinno, S. Takemoto, K. Kaneko, S. Fujita, Jap. J. Appl. Phys. 57, 040314 (2018)
G.T. Dang, T. Yasuoka, Y. Tagashira, T. Tadokoro, W. Theiss, T. Kawaharamura, Appl. Phys. Lett. 113, 062102 (2018)
M. Marezio, J.P. Remeika, J. Chem. Phys. 46, 1862 (1967)
Y. Ota, AIP Adv. 10, 125321 (2020)
E. Husson, Y. Repelin, Eur. J. Solid State Inorg. Chem. 33, 1223 (1996)
R. Wakabayashi, K. Yoshimatsu, M. Hattori, J.-S. Lee, O. Sakata, A. Ohtomo, Cryst. Growth Des. (2021). https://doi.org/10.1021/acs.cgd.1c00030
J. Åhman, G. Svensson, and J. Albertsson, Acta Crystallogr., Sect. C: Cryst. Struct. Commun. 52, 1336 (1996)
T. Matsumoto, M. Aoki, A. Kinoshita, T. Aono, Jap. J. Appl. Phys. 13, 1578 (2014)
T. Onuma, S. Saito, K. Sasaki, T. Masui, T. Yamaguchi, T. Honda, M. Higashiwaki, Jap. J. Appl. Phys. 54, 112601 (2015)
S. Seacat, J.L. Lyons, H. Peelaers, Appl. Phys. Lett. 116, 232102 (2020)
B. Ollivier, R. Retoux, P. Lacorre, D. Massiot, G. Ferey, J. Mater. Chem. 7, 1049 (1997)
M. Halvarsson, V. Langer, S. Vuorinen, Surf. Coat. Technol. 76, 358 (1995)
M. Kneiß, A. Hassa, D. Splith, C. Sturm, H. von Wenckstern, T. Schultz, N. Koch, M. Lorenz, M. Grundmann, APL Mater. 7, 022516 (2019)
I. Cora, F. Mezzadri, F. Boschi, M. Bosi, M. Caplovicova, G. Calestani, I. Dódony, B. Pecz, R. Fornari, CrystEngComm 19, 1509 (2017)
R.-S. Zhou, R. Snyder, Acta Crystallogr. Sect. B: Struct. Sci. 47, 617 (1991)
T. Oshima, Y. Kato, M. Oda, T. Hitora, M. Kasu, Appl. Phys. Express 10, 051104 (2017)
H.Y. Playford, A.C. Hannon, M.G. Tucker, D.M. Dawson, S.E. Ashbrook, R.J. Kastiban, J. Sloan, R.I. Walton, J. Phys. Chem. C 118, 16188 (2014)
M. Bosi, P. Mazzolini, L. Seravalli, R. Fornari, J. Mater. Chem. C 8, 10975 (2020)
R. Roy, V. G. Hill., and E. F. Osborn, J. Am. Chem. Soc. 74, 719 (1952)
S. Yoshioka, H. Hayashi, A. Kuwabara, F. Oba, K. Matsunaga, I. Tanaka, J. Phys.: Condens. Matter 19, 346211 (2007)
H. Akazawa, Vacuum 123, 8 (2016)
H.Y. Playford, A.C. Hannon, E.R. Barney, R.I. Walton, Chem. Eur. J. 19, 2803 (2013)
M. Zinkevich, F. Aldinger, J. Am. Ceram. Soc. 87, 683 (2004)
C. Wouters, C. Sutton, L. M. Ghiringhelli, T. Markurt, R. Schewski, A. Hassa, H. v. Wenckstern, M. Grundmann, M. Scheffler, and M. Albrecht, Phys. Rev. Mater. 4, 125001 (2020), arxiv: 2008.04573
H. Peelaers, D. Steiauf, J.B. Varley, A. Janotti, C.G. Van de Walle, Phys. Rev. B 92, 085206 (2015)
J.E.N. Swallow, R.G. Palgrave, P.A.E. Murgatroyd, A. Regoutz, M. Lorenz, A. Hassa, M. Grundmann, H.V. Wenckstern, J.B. Varley, T.D. Veal, A.C.S. Appl, Mater. Interfaces (2021). https://doi.org/10.1021/acsami.0c16021
M. Hilfiker, U. Kilic, A. Mock, V. Darakchieva, S. Knight, R. Korlacki, A. Mauze, Y. Zhang, J. Speck, M. Schubert, Appl. Phys. Lett. 114, 231901 (2019)
B. Mazumder, J. Sarker, Y. Zhang, J.M. Johnson, M. Zhu, S. Rajan, J. Hwang, Appl. Phys. Lett. 115, 132105 (2019)
M. Wang, S. Mu, C.G. Van de Walle, A.C.S. Appl, Mater. Interfaces 13, 10650 (2021)
A.F.M.A.U. Bhuiyan, Z. Feng, J.M. Johnson, H.-L. Huang, J. Hwang, H. Zhao, Cryst. Growth Des. 20, 6722 (2020)
J.M. Johnson, H. Huang, M. Wang, S. Mu, J.B. Varley, A. Bhuiyan, N.K. Kalarickal, S. Rajan, H. Zhao, C.G. Van de Walle, J. Hwang, APL Mater. 9, 051103 (2021)
B.W. Krueger, C.S. Dandeneau, E.M. Nelson, S.T. Dunham, F.S. Ohuchi, M.A. Olmstead, J. Am. Ceram. Soc. 99, 2467 (2016)
A.F.M.A.U. Bhuiyan, Z. Feng, J.M. Johnson, H.-L. Huang, J. Sarker, M. Zhu, M.R. Karim, B. Mazumder, J. Hwang, H. Zhao, APL Mater. 8, 031104 (2020)
B. Mazumder, J. Sarker, J. Mater. Res. 36, 52 (2021)
S. Mu, M. Wang, H. Peelaers, C.G. Van de Walle, APL Mater. 8, 091105 (2020)
R. Jinno, K. Kaneko, S. Fujita, Jap. J. Appl. Phys. 60, SBBD13 (2021)
J. Furthmuller, F. Bechstedt, Phys. Rev. B 93, 115204 (2016)
N.K. Kalarickal, Z. Xia, J.F. McGlone, Y. Liu, W. Moore, A.R. Arehart, S.A. Ringel, S. Rajan, J. Appl. Phys. 127, 215706 (2020)
B. Chatterjee, Y. Song, J.S. Lundh, Y. Zhang, Z. Xia, Z. Islam, J. Leach, C. McGray, P. Ranga, S. Krishnamoorthy, A. Haque, S. Rajan, S. Choi, Appl. Phys. Lett. 117, 153501 (2020)
C. Yuan, Y. Zhang, R. Montgomery, S. Kim, J. Shi, A. Mauze, T. Itoh, J.S. Speck, S. Graham, J. Appl. Phys. 127, 154502 (2020)
F. Zhang, K. Saito, T. Tanaka, M. Nishio, M. Arita, Q. Guo, Appl. Phys. Lett. 105, 162107 (2014)
Y. Hinuma, T. Gake, F. Oba, Phys. Rev. Mater. 3, 084605 (2019)
T. Schultz, M. Kneiß, P. Storm, D. Splith, H. von Wenckstern, M. Grundmann, N. Koch, A.C.S. Appl, Mater. Interfaces 12, 8879 (2020)
A. Vaidya, J. Sarker, Y. Zhang, L. Lubecki, J. Wallace, J.D. Poplawsky, K. Sasaki, A. Kuramata, A. Goyal, J.A. Gardella, B. Mazumder, U. Singisetti, J. Appl. Phys. 126, 095702 (2019)
A.F.M.A.U. Bhuiyan, Z. Feng, J.M. Johnson, H.-L. Huang, J. Hwang, H. Zhao, Appl. Phys. Lett. 117, 252105 (2020)
R. Wakabayashi, M. Hattori, K. Yoshimatsu, K. Horiba, H. Kumigashira, A. Ohtomo, Appl. Phys. Lett. 112, 232103 (2018)
C. Fares, F. Ren, E. Lambers, D.C. Hays, B.P. Gila, S.J. Pearton, J. Electron. Mater. 48, 1568 (2019)
C. Fares, M. Kneiss, H. von Wenckstern, M. Grundmann, M.J. Tadjer, F. Ren, D. Hays, B.P. Gila, S.J. Pearton, ECS Trans. 92, 79 (2019)
C. Fares, Z. Islam, A. Haque, M. Kneiß, H. von Wenckstern, M. Grundmann, M. Tadjer, F. Ren, S.J. Pearton, ECS J. Solid State Sci. Technol. 8, P751 (2019)
T. Kamimura, Y. Nakata, M. Higashiwaki, Jap. J. Appl. (2021). https://doi.org/10.35848/1347-4065/abe3a4
G.I. Csonka, J.P. Perdew, A. Ruzsinszky, P.H.T. Philipsen, S. Lebègue, J. Paier, O.A. Vydrov, J.G. AngyAn, Phys. Rev. B 79, 155107 (2009)
X. Gonze, Phys. Rev. B 55, 10355 (1997)
G. Kresse, Phys. Rev. B 54, 11169 (1996)
G. Kresse, J. Furthmuller, Comput. Mater. Sci. 6, 15 (1996)
A. Fiedler, R. Schewski, Z. Galazka, K. Irmscher, ECS J. Solid State Sci. Technol. 8, Q3083 (2019)
A. Kumar, K. Ghosh, U. Singisetti, J. Appl. Phys. 128, 105703 (2020)
G. Seryogin, F. Alema, N. Valente, H. Fu, E. Steinbrunner, A.T. Neal, S. Mou, A. Fine, A. Osinsky, Appl. Phys. Lett. 117, 262101 (2020)
F. Alema, Y. Zhang, A. Osinsky, N. Orishchin, N. Valente, A. Mauze, J.S. Speck, APL Mater. 8, 021110 (2020)
Z. Feng, A.F.M.A.U. Bhuiyan, M.R. Karim, H. Zhao, Appl. Phys. Lett. 114, 250601 (2019)
Y. Zhang, F. Alema, A. Mauze, O.S. Koksaldi, R. Miller, A. Osinsky, J.S. Speck, APL Mater. 7, 022506 (2019)
N. Ma, N. Tanen, A. Verma, Z. Guo, T. Luo, H.G. Xing, D. Jena, Appl. Phys. Lett. 109, 212101 (2016)
K. Ghosh, U. Singisetti, Appl. Phys. Lett. 109, 072102 (2016)
K. Ghosh, U. Singisetti, J. Appl. Phys. 124, 085707 (2018)
A. Parisini, K. Ghosh, U. Singisetti, R. Fornari, Semicond. Sci. Technol. 33, 105008 (2018)
Y. Kang, K. Krishnaswamy, H. Peelaers, C.G. Van de Walle, J. Phys.: Condens. Matter 29, 234001 (2017)
A. Sharma, U. Singisetti, Appl. Phys. Lett. 118, 032101 (2021)
Z. Feng, A.F.M.A.U. Bhuiyan, Z. Xia, W. Moore, Z. Chen, J.F. McGlone, D.R. Daughton, A.R. Arehart, S.A. Ringel, S. Rajan, H. Zhao, Phys. Status Solidi RRL 14, 2000145 (2020)
J.B. Varley, A. Janotti, C. Franchini, C.G. Van de Walle, Phys. Rev. B 85, 081109 (2012)
H. Peelaers, J.L. Lyons, J.B. Varley, C.G. Van de Walle, APL Mater. 7, 2519 (2019)
M. Mohamed, C. Janowitz, I. Unger, R. Manzke, Z. Galazka, R. Uecker, R. Fornari, J.R. Weber, J.B. Varley, C.G. Van de Walle, Appl. Phys. Lett. 97, 211903 (2010)
H. Peelaers, C.G. Van de Walle, Appl. Phys. Lett. 111, 182104 (2017)
Z. Cheng, N. Tanen, C. Chang, J. Shi, J. McCandless, D. Muller, D. Jena, H.G. Xing, S. Graham, Appl. Phys. Lett. 115, 092105 (2019)
Y. Song, P. Ranga, Y. Zhang, Z. Feng, H.-L. Huang, M.D. Santia, S.C. Badescu, C.U. Gonzalez-Valle, C. Perez, K. Ferri et al., ACS Appl. Mater. Interfaces (2021). https://doi.org/10.1021/acsami.1c08506
Y.-B. Liu, J.-Y. Yang, G.-M. Xin, L.-H. Liu, G. Csányi, B.-Y. Cao, J. Chem. Phys. 153, 144501 (2020)
Z. Cheng, V.D. Wheeler, T. Bai, J. Shi, M.J. Tadjer, T. Feygelson, K.D. Hobart, M.S. Goorsky, S. Graham, Appl. Phys. Lett. 116, 062105 (2020)
J.S. Harris, J.N. Baker, B.E. Gaddy, I. Bryan, Z. Bryan, K.J. Mirrielees, P. Reddy, R. Collazo, Z. Sitar, D.L. Irving, Appl. Phys. Lett. 112, 152101 (2018)
L. Gordon, J.B. Varley, J.L. Lyons, A. Janotti, C.G. Van de Walle, Phys. Status Solidi RRL 9, 462 (2015)
J.B. Varley, J.R. Weber, A. Janotti, C.G. Van de Walle, Appl. Phys. Lett. 97, 142106 (2010)
M. Saleh, J.B. Varley, J. Jesenovec, A. Bhattacharyya, S. Krishnamoorthy, S. Swain, K. Lynn, Semicond. Sci. Technol. 35, 04LT01 (2020)
M. Saleh, A. Bhattacharyya, J.B. Varley, S. Swain, J. Jesenovec, S. Krishnamoorthy, K. Lynn, Appl. Phys. Express 12, 085502 (2019)
J. Sarker, A.F.M.A.U. Bhuiyan, Z. Feng, H. Zhao, B. Mazumder, J. Phys. D Appl. Phys. 54, 184001 (2021)
G.T. Dang, Y. Tagashira, T. Yasuoka, L. Liu, T. Kawaharamura, AIP Adv. 10, 115019 (2020)
J.B. Varley, H. Peelaers, A. Janotti, C.G. Van de Walle, J. Phys.: Condens. Matter 23, 334212 (2011)
J.M. Johnson, Z. Chen, J.B. Varley, C.M. Jackson, E. Farzana, Z. Zhang, A.R. Arehart, H.-L. Huang, A. Genc, S.A. Ringel, C.G. Van de Walle, D.A. Muller, J. Hwang, Phys. Rev. X 9, 041027 (2019)
Y.K. Frodason, C. Zimmermann, E.F. Verhoeven, P.M. Weiser, L. Vines, J.B. Varley, Phys. Rev. Mater. 5, 025402 (2021)
A. Karjalainen, I. Makkonen, J. Etula, K. Goto, H. Murakami, Y. Kumagai, F. Tuomisto, Appl. Phys. Lett. 118, 072104 (2021)
P.E. Blöchl, Phys. Rev. B 50, 17953 (1994)
G. Kresse, D. Joubert, Phys. Rev. B 59, 1758 (1998)
Acknowledgments
This work was partially performed under the auspices of the U.S. DOE by Lawrence Livermore National Laboratory under contract DE-AC52-07NA27344, and supported by the Critical Materials Institute, an Energy Innovation Hub funded by the U.S. DOE, Office of Energy Efficiency and Renewable Energy, Advanced Manufacturing Office. Collaborations and discussions with A. Perron, V. Lordi, J. L. Lyons, D. Wickramaratne, H. Peelaers, A. Janotti, K. Lynn, J. McCloy, J. Hwang, S. Krishnamoorthy, J. S. Speck, and C. G. Van de Walle are gratefully acknowledged.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Varley, J.B. First-principles calculations of structural, electrical, and optical properties of ultra-wide bandgap (Al\(_x\)Ga\(_{1-x}\))\(_2\)O\(_3\) alloys. Journal of Materials Research 36, 4790–4803 (2021). https://doi.org/10.1557/s43578-021-00371-7
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1557/s43578-021-00371-7