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Low-Temperature Photosensitive Polyimide Processing for Use in 3D Integration Technologies

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Abstract

Imidization in solid state and the impact of photo-crosslinking of a photosensitive low-temperature cure ester-type polyimide was studied by in-situ FT-IR spectroscopy. Imidization kinetics depends on the crosslinking degree of the PI precursor. It is confirmed that the full imidization can be achieved at T < 250°C with low exposure doses. The reaction rate within the chemically-controlled region is lowered with increased exposure energy from 0.279 min-1 to 0.097 min-1 and to 0.038 min-1 at 215°C. The diffusion controlled rate constant at 215°C is lowered from 0.00329min-1 to 0.00298min-1 and to 0.00170min-1 with increased exposure energy 0, 200, 600mJ/cm2 respectively. This shows that crosslinking has a major influence on the chemically-controlled reaction rate. Thermo gravimetric analysis (TGA) and TGA/FT-IR spectroscopy confirms the in-situ FT-IR results. At temperatures > 300°C further weight losses of volatile components were detected.

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Acknowledgments

The authors would like to acknowledge the German Federal Ministry of Education and Research (BMBF) for financial support. Special thanks go to Liane Häußler and Kerstin Arnhold for assistance with the TGA and TGA/FTIR analysis and to Danny Parei and Kay Viehweger for assistance with the Koyo Thermo Systems Co. vertical furnace.

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Windrich, F., Malanin, M., Eichhorn, K.J. et al. Low-Temperature Photosensitive Polyimide Processing for Use in 3D Integration Technologies. MRS Online Proceedings Library 1692, 1–6 (2014). https://doi.org/10.1557/opl.2014.520

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  • DOI: https://doi.org/10.1557/opl.2014.520

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