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Abiade, J.T. Xenon Flash Lamp Annealing Shown to be Effective for Processing Ultrathin HfO2 Films for Advanced CMOS Gate Dielectrics. MRS Bulletin 31, 83–84 (2006). https://doi.org/10.1557/mrs2006.35
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DOI: https://doi.org/10.1557/mrs2006.35