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Baumann, F.H., Chopp, D.L., de la Rubia, T.D. et al. Multiscale Modeling of Thin-Film Deposition: Applications to Si Device Processing. MRS Bulletin 26, 182–189 (2001). https://doi.org/10.1557/mrs2001.40
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DOI: https://doi.org/10.1557/mrs2001.40