Article PDF
Use our pre-submission checklist
Avoid common mistakes on your manuscript.
Rights and permissions
About this article
Cite this article
Lau, J. Adding HCl during Chemical Vapor Deposition Produces Controlled Growth of 6H-SiC on On-Axis 6H-SiC(0001) Substrates. MRS Bulletin 25, 7 (2000). https://doi.org/10.1557/mrs2000.141
Published:
Issue Date:
DOI: https://doi.org/10.1557/mrs2000.141