Abstract
The cycling endurance of phase-change memory is one of the last hurdles to overcome to enable its adoption in the larger market for persistent memory products. Phase-change memory cycling endurance failures, whether they are stuck-SET (caused by elemental segregation) or stuck-RESET (caused by void formation), are caused by atomic migration. Various driving forces responsible for the atomic migration have been identified, such as hole-wind force, electrostatic force, and crystallization-induced segregation. We introduce several strategies to improve cycling endurance based on an understanding of driving forces and interactions among them. Utilizing some of these endurance-improving techniques, record-high phase-change memory cycling endurance at around 1012 cycles has been recently reported using a confined phase-change memory cell with a metallic liner.
Similar content being viewed by others
References
A. Pirovano, A. Redaelli, F. Pellizzer, F. Ottogalli, M. Tosi, D. Ielmini, A.L. Lacaita, R. Bez, IEEE Trans. Device Mater. Reliab. 4, 422 (2004).
S.-M. Yoon, K.-J. Choi, N.-Y. Lee, S.-Y. Lee, Y.-S. Park, B.-G. Yu, Jpn. J. Appl. Phys. 46, L99 (2007).
S. Lai, 2003 IEEE International Electron Devices Meeting (IEDM) (IEEE, Washington, DC, 2003), pp. 10.1.1–10.1.4.
P. Cappelletti, 2015 IEEE International Electron Devices Meeting (IEDM) (IEEE, Washington, DC, 2015), pp. 10.1.1–10.1.4.
M. Webb, Flash Memory Summit (Santa Clara, CA, 2018).
H.-S.P. Wong, S. Raoux, S. Kim, J. Liang, J.P. Reifenberg, B. Rajendran, M. Asheghi, K.E. Goodson, Proc. IEEE 98, 2201 (2010).
C. Chen, A. Schrott, M.H. Lee, S. Raoux, Y.H. Shih, M.J. Breitwisch, F.H. Baumann, E.-K. Lai, T.M. Shaw, P. Flaitz, R. Cheek, E.A. Joseph, S.H. Chen, B. Rajendran, H.-L. Lung, C.H. Lam, 2009 IEEE International Memory Workshop (IEEE, Monterey, CA, 2009), doi:10.1109/IMW.2009.5090589.
J. Sarkar, B. Gleixner, Appl. Phys. Lett. 91, 233506 (2007).
B. Rajendran, M.-H. Lee, M. Breitwisch, G.W. Burr, Y.-H. Shih, R. Cheek, A. Schrott, C.-F. Chen, M. Lamorey, E. Joseph, Y. Zhu, R. Dasaka, P.L. Flaitz, F.H. Baumann, H.-L. Lung, C. Lam, 2008 Symposium on VLSI Technology (IEEE, Honolulu, 2008), pp. 96–97.
S. Lee, J.-H. Jeong, T.S. Lee, W.M. Kim, B.-K. Cheong, 2008 Joint Non-Volatile Semiconductor Memory Workshop and International Conference on Memory Technology and Design (IEEE, Opio, France, 2008), pp. 46–48.
M.H. Lee, R. Cheek, C.F. Chen, Y. Zhu, J. Bruley, F.H. Baumann, Y.H. Shih, E.K. Lai, M. Breitwisch, A. Schrott, S. Raoux, E.A. Joseph, H.-Y. Cheng, J.Y. Wu, H.L. Lung, C. Lam, 2010 International Electron Devices Meeting (IEEE, San Francisco, 2010), pp. 28.6.1–28.6.4.
W.S. Khwa, J.Y. Wu, T.H. Su, H.P. Li, M. BrightSky, T.Y. Wang, T.H. Hsu, P.Y. Du, S. Kim, W.C. Chien, H.Y. Cheng, R. Cheek, E.K. Lai, Y. Zhu, M.H. Lee, M.F. Chang, H.L. Lung, C. Lam, 2014 IEEE International Electron Devices Meeting (IEDM) (IEEE, San Francisco, 2014), pp. 29.8.1–29.8.4.
J.S. Bae, K.M. Hwang, K.H. Park, S.B. Jeon, J. Choi, J.H. Ahn, S.S. Kim, D.-H. Ahn, H.S. Jeong, S.W. Nam, G.T. Jeong, H.K. Cho, D.H. Jang, C.-G. Park, 2012 IEEE International Reliability Physics Symposium (IRPS) (IEEE, Anaheim, CA, 2012), pp. EM.7.1–EM.7.4.
S.-W. Nam, C. Kim, M.-H. Kwon, H.-S. Lee, J.-S. Wi, D. Lee, T.-Y. Lee, Y. Khang, K.-B. Kim, Appl. Phys. Lett. 92, 111913 (2008).
C. Kim, D. Kang, T.-Y. Lee, K.H.P. Kim, Y.-S. Kang, J. Lee, S.-W. Nam, K.-B. Kim, Y. Khang, Appl. Phys. Lett. 94, 193504 (2009).
T.-Y. Yang, I.-M. Park, B.-J. Kim, Y.-C. Joo, Appl. Phys. Lett. 95, 032104 (2009).
Y.-J. Park, T.-Y. Yang, J.-Y. Cho, S.-Y. Lee, Y.-C. Joo, Appl. Phys. Lett. 103, 073503 (2013).
Y.-J. Park, J.-Y. Cho, M.-W. Jeong, S. Na, Y.-C. Joo, Sci. Rep. 6, 21466 (2016).
S.-W. Nam, H.-S. Chung, Y.C. Lo, L. Qi, J. Li, Y. Lu, A.T.C. Johnson, Y. Jung, P. Nukala, R. Agarwal, Science 336, 1561 (2012).
K. Do, D. Lee, D.-H. Ko, H. Sohn, M.-H. Cho, Electrochem. Solid-State Lett. 13, H284 (2010).
A. Debunne, K. Virwani, A. Padilla, G.W. Burr, A.J. Kellock, V.R. Deline, R.M. Shelby, B. Jackson, J. Electrochem. Soc. 158, H965 (2011).
P. Yeoh, Y. Ma, D.A. Cullen, J.A. Bain, M. Skowronski, Appl. Phys. Lett. 114, 163507 (2019).
N. Yamada, E. Ohno, K. Nishiuchi, N. Akahira, M. Takao, J. Appl. Phys. 69, 2849 (1991).
J.H. Coombs, A.P.J.M. Jongenelis, W. van Es-Spiekman, B.A.J. Jacobs, J. Appl. Phys. 78, 4918 (1995).
S. Raoux, H.-Y. Cheng, M.A. Caldwell, H.-S.P. Wong, Appl. Phys. Lett. 95, 071910 (2009).
I.-M. Park, J.-K. Jung, S.-O. Ryu, K.-J. Choi, B.-G. Yu, Y.-B. Park, S.M. Han, Y.-C. Joo, Thin Solid Films 517, 848 (2008).
L. Crespi, A. Lacaita, M. Boniardi, E. Varesi, A. Ghetti, A. Redaelli, G. D’Arrigo, 2015 IEEE International Memory Workshop (IMW) (IEEE, Monterey, CA, 2015), doi:10.1109/IMW.2015.7150296.
A. Padilla, G.W. Burr, K. Virwani, A. Debunne, C.T. Rettner, T. Topuria, P.M. Rice, B. Jackson, D. Dupouy, A.J. Kellock, R.M. Shelby, K. Gopalakrishnan, R.S. Shenoy, B.N. Kurdi, 2010 International Electron Devices Meeting (IEDM) (IEEE, San Francisco, 2010), pp. 29.4.1–29.4.4.
A. Padilla, G.W. Burr, C.T. Rettner, T. Topuria, P.M. Rice, B. Jackson, K. Virwani, A.J. Kellock, D. Dupouy, A. Debunne, R.M. Shelby, K. Gopalakrishnan, R.S. Shenoy, B.N. Kurdi, J. Appl. Phys. 110, 054501 (2011).
L. Goux, D. Tio Castro, G.A.M. Hurkx, J.G. Lisoni, R. Delhougne, D.J. Gravesteijn, K. Attenborough, D.J. Wouters, IEEE Trans. Electron Devices 56, 354 (2009).
A. Calderoni, M. Ferro, E. Varesi, P. Fantini, M. Rizzi, D. Ielmini, 2012 4th IEEE International Memory Workshop (IEEE, Milan, Italy, 2012), doi:10.1109/IMW.2012.6213675.
P.-Y. Du, J.-Y. Wu, T.-H. Hsu, M.-H. Lee, T.-Y. Wang, H.-Y. Cheng, E.-K. Lai, S.-C. Lai, H.-L. Lung, S. Kim, M. Breitwisch, Y. Zhu, S. Mittal, R. Cheek, S. Raoux, E.A. Joseph, A. Schrott, J. Li, C. Lam, 2012 IEEE International Reliability Physics Symposium (IRPS) (IEEE, Anaheim, CA, 2012), pp. 6C.2.1–6C.2.6.
G. Novielli, A. Ghetti, E. Varesi, A. Mauri, R. Sacco, 2013 IEEE International Electron Devices Meeting (IEDM) (IEEE, Washington, DC, 2013), pp. 22.3.1–22.3.4.
G. Servalli, 2009 IEEE International Electron Devices Meeting (IEDM) (IEEE, Baltimore, 2009), pp. 5.7.1–5.7.4.
D.T. Castro, L. Goux, G.A.M. Hurkx, K. Attenborough, R. Delhougne, J. Lisoni, F.J. Jedema, M.A.A. in `T Zandt, R.A.M. Wolters, D.J. Gravesteijn, M.A. Verheijen, M. Kaiser, R.G.R. Weemaes, D.J. Wouters, 2007 IEEE International Electron Devices Meeting (IEDM) (IEEE, Washington, DC, 2007), pp. 315–318.
A. Faraclas, G. Bakan, L. Adnane, F. Dirisaglik, N.E. Williams, A. Gokirmak, H. Silva, IEEE Trans. Electron Devices 61, 372 (2014).
M. Salinga, B. Kersting, I. Ronneberger, V.P. Jonnalagadda, X.T. Vu, M. Le Gallo, I. Giannopoulos, O. Cojocaru-Mirédin, R. Mazzarello, A. Sebastian, Nat. Mater. 17, 681 (2018).
W. Zhang, E. Ma, Nat. Mater. 17, 654 (2018).
W. Kim, M. BrightSky, T. Masuda, N. Sosa, S. Kim, R. Bruce, F. Carta, G. Fraczak, H.Y. Cheng, A. Ray, Y. Zhu, H.-L. Lung, K. Suu, C. Lam, 2016 IEEE International Electron Devices Meeting (IEDM) (IEEE, San Francisco, 2016), pp. 4.2.1–4.2.4.
W. Kim, S. Kim, R. Bruce, F. Carta, G. Fraczak, A. Ray, C. Lam, M. BrightSky, Y. Zhu, T. Masuda, K. Suu, Y. Xie, Y. Kim, J.J. Cha, 2018 IEEE International Reliability Physics Symposium (IRPS) (IEEE, Burlingame, CA, 2018), pp. 6D.5-1–6D.5-5.
H.-Y. Cheng, M. BrightSky, S. Raoux, C.F. Chen, P.Y. Du, J.Y. Wu, Y.Y. Lin, T.H. Hsu, Y. Zhu, S. Kim, C.M. Lin, A. Ray, H.-L. Lung, C. Lam, 2013 IEEE International Electron Devices Meeting (IEDM) (IEEE, Washington, DC, 2013), pp. 30.6.1–30.6.4.
M. BrightSky, N. Sosa, T. Masuda, W. Kim, S. Kim, A. Ray, R. Bruce, J. Gonsalves, Y. Zhu, K. Suu, C. Lam, 2015 IEEE International Electron Devices Meeting (IEDM) (IEEE, Washington, DC, 2015), pp. 3.6.1–3.6.4.
Y. Xie, W. Kim, Y. Kim, S. Kim, J. Gonsalves, M. BrightSky, C. Lam, Y. Zhu, J.J. Cha, Adv. Mater. 30, 1705587 (2018).
S. Kim, P.Y. Du, J. Li, M. Breitwisch, Y. Zhu, S. Mittal, R. Cheek, T.-H. Hsu, M.H. Lee, A. Schrott, S. Raoux, H.Y. Cheng, S.-C. Lai, J.Y. Wu, T.Y. Wang, E.A. Joseph, E.K. Lai, A. Ray, H.-L. Lung, C. Lam, Proc. 2012 Int. Symp. VLSI Technol. Syst. Appl. (IEEE, Hsinchu, Taiwan, 2012), doi:10.1109/VLSI-TSA.2012.6210122.
F. Rao, K. Ding, Y. Zhou, Y. Zheng, M. Xia, S. Lv, Z. Song, S. Feng, I. Ronneberger, R. Mazzarello, W. Zhang, E. Ma, Science 358, 1423 (2017).
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Kim, S., Burr, G.W., Kim, W. et al. Phase-change memory cycling endurance. MRS Bulletin 44, 710–714 (2019). https://doi.org/10.1557/mrs.2019.205
Published:
Issue Date:
DOI: https://doi.org/10.1557/mrs.2019.205