Abstract
The evolution of elastic strain engineering in nanostructures and devices requires characterization tools that can be used to not only observe but also quantify the actual strain in a sample, whether this strain is intrinsic or applied. Strain contrast in crystalline samples has always been one of the primary contrast mechanisms used for imaging the microstructure of a material in a transmission electron microscope (TEM). In this regard, TEM is a particularly powerful tool due to its ability to spatially resolve strain information with high precision and spatial resolution. This article reviews the techniques currently available for directly measuring strain in the TEM. Examples are given for measuring strain in semiconductor devices using imaging, diffraction, and holographic techniques. For strain measurement during in situ mechanical testing, two general methods are presented: the conversion of displacement from an actuation device or the direct measurement of strain using image features during deformation.
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References
S.E. Thomson, M. Armstrong, C. Auth, M. Alavi, M. Buehler et al. IEEE Trans. Electron Devices 51, 1790 (2004).
J.F. Nye, Physical Properties of Crystals: Their Representation by Tensors and Matrices (Oxford University Press, Oxford, 1985).
P.M. Jones, G.M. Rackham, J.W. Steeds, Proc. R. Soc. London, Ser. A 354, 197 (1977).
A. Armigliato, R. Balboni, G.P. Carnevale, G. Pavia, D. Piccolo, S. Frabboni, A. Benedetti, A.G. Cullis, Appl. Phys. Lett. 82, 2172 (2003).
K. Usuda, T. Numata, T. Irisawa, N. Hirashita, S. Takagi, Mater. Sci. Eng., B 124–125, 143 (2005).
F. Uesugi, A. Hokazono, S. Takeno, Ultramicroscopy 111, 995 (2011).
R. Bierwolf, M. Hohenstein, F. Phillipp, O. Brandt, G.E. Crook, K. Ploog, Ultramicroscopy 49, 273 (1993).
M.J. Hÿtch, E. Snoeck, R. Kilaas, Ultramicroscopy 74, 131 (1998).
M.J. Hÿtch, E. Snoeck, F. Houdellier, F. Hüe, US Patent 8502143 (August 6, 2013).
M.J. Hÿtch, F. Houdellier, F. Hüe, E. Snoeck, Nature 453, 1086 (2008).
M.J. Hÿtch, F. Houdellier, F. Hüe, E. Snoeck, Ultramicroscopy 111, 1328 (2011).
J.M. Gibson, M.M.J. Treacy, Ultramicroscopy 14, 345 (1984).
A. Lubk, E. Javon, N. Cherkashin, S. Reboh, C. Gatel, M.J. Hÿtch, Ultramicroscopy 136, 42 (2014).
P. Hirsch, A. Howie, R. Nicholson, D.W. Pashley, M.J. Whelan, Electron Microscopy of Thin Crystals (Krieger Publishing, Malabar, 1965).
J.C.H. Spence, High-Resolution Electron Microscopy (Oxford University Press, Oxford, Ed. 3, 2003).
M. J. Hÿtch, T. Plamann, Ultramicroscopy 87, 199 (2001).
A. Armigliato, R. Balboni, S. Frabboni, Appl. Phys. Lett. 86, 063508 (2005).
A. Chuvilin, U. Kaiser, Ultramicroscopy 104, 73 (2005).
L. Clément, R. Pantel, L.F.T. Kwakman, J.-L. Rouvière, Appl. Phys. Lett. 85, 651 (2004).
F. Houdellier, C. Roucau, L. Clément, J.L. Rouvière, M.J. Casanove, Ultramicroscopy 106, 951 (2006).
J. Huang, M.J. Kima, P.R. Chidambaram, R.B. Irwin, P.J. Jones, J.W. Weijtmans, E.M. Koontz, Y.G. Wang, S. Tang, R. Wise, Appl. Phys. Lett. 89, 063114 (2006).
P. Zhang, A.A. Istratov, E.R. Weber, C. Kisielowski, H. He, C. Nelson, J.C.H. Spence, Appl. Phys. Lett. 89, 161907 (2006).
W. Zhao, G. Duscher, G. Rozgonyi, M.A. Zikry, S. Chopra, M.C. Ozturk, Appl. Phys. Lett. 90, 191907 (2007).
K. Müller, A. Rosenauer, M. Schowalter, J. Zweck, R. Fritz, K. Volz, Microsc. Microanal. 18, 995 (2012).
H.H. Liu, X.F. Duan, Q. Xu, B.-G. Liu, Ultramicroscopy 108, 816 (2008).
A. Béché, J.-L. Rouvière, L. Clément, J.M. Hartmann, Appl. Phys. Lett. 95, 123114 (2009).
A. Armigliato, S. Frabboni, G.C. Gazzadi, Appl. Phys. Lett. 93, 161906 (2008).
J.P. Liu, K. Li, S.M. Pandey, F.L. Benistant, A. See, M.S. Zhou, L.C. Hsia, R. Schampers, D.O. Klenov, Appl. Phys. Lett. 93, 221912 (2008).
S.W. Kim, J.-H. Yoo, S.-M. Koo, D.-H. Ko, H.-J. Lee, Appl. Phys. Lett. 99, 133107 (2011).
T. Sato, H. Matsumoto, K. Nakano, M. Konno, M. Fukui, I. Nagaoki, Y. Taniguchi, J. Phys. Conf. Ser. 241, 012014 (2010).
M.J. Hÿtch, J.-L. Putaux, J.-M. Pénisson, Nature 423, 270 (2003).
K.-W. Ang, K.-J. Chui, V. Bliznetsov, C.-H. Tung, A. Du, N. Balasubramanian, G. Samudra, M.F. Li, Y.-C. Yeo, Appl. Phys. Lett. 86, 093102 (2005).
F. Hüe, M.J. Hÿtch, H. Bender, F. Houdellier, A. Claverie, Phys. Rev. Lett. 100, 156602 (2008).
J.H. Chung, G.D. Lian, L. Rabenberg, Appl. Phys. Lett. 93, 081909 (2008).
J.H. Chung, G.D. Lian, L. Rabenberg, IEEE Electron Device Lett. 31, 854 (2010).
D. Diercks, G. Lian, J. Chung, M. Kaufman, J. Microsc. 241, 195 (2010).
M. de Graef, Introduction to Conventional Transmission Electron Microscopy (Cambridge University Press, Cambridge, 2003).
J. Demarest, R. Hull, S.T. Schonenberg, K.G.F. Janssens, Appl. Phys. Lett. 77, 412 (2000).
D. Cooper, J.-L. Rouvière, A. Béché, S. Kadkhodazadeh, E.S. Semenova, K. Yvind, R.E. Dunin-Borkowski, Appl. Phys. Lett. 99, 261911 (2011).
Y.Y. Wang, J. Bruley, H. van Meer, J. Li, A. Domenicucci, C.E. Murray, J. Rouvière, Appl. Phys. Lett. 103, 052104 (2013).
F. Hüe, M.J. Hÿtch, F. Houdellier, H. Bender, A. Claverie, Appl. Phys. Lett. 95, 073103 (2009).
D. Cooper, A. Béché, J.-M. Hartmann, V. Carron, J.-L. Rouvière, Appl. Phys. Lett. 96, 113508 (2010).
T. Denneulin, D. Cooper, J.-M. Hartmann, J.-L. Rouvière, J. Appl. Phys. 112, 094314 (2012).
Z.F. Wang, Y. Yao, X.Q. He, Y. Yang, L. Gu, Y.G. Wang, X.F. Duan, Mater. Trans. 53, 2019 (2012).
M.J. Hÿtch, F. Houdellier, N. Cherkashin, S. Reboh, E. Javon, P. Benzo, C. Gatel, E. Snoeck, A. Claverie, in Transmission Electron Microscopy in Micro-Nanoelectronics, A. Claverie, Ed. (Wiley, London, 2013), C. 4, pp. 81–106.
C.T. Koch, V.B. Ozdol, P.A. van Aken, Appl. Phys. Lett. 96, 9 (2010).
E.P. Butler, Rep. Prog. Phys. 42, 833 (1979).
H.G.F. Wilsdorf, Rev. Sci. Instrum. 29, 323 (1958).
I. Robertson, P. Ferreira, G. Dehm, R. Hull, E.A. Stach, MRS Bull. 33, 122 (2008).
A.M. Minor, E.A. Stach, J.W. Morris Jr., Appl. Phys. Lett. 79, 1625 (2001).
A.M. Minor, S.A. Syed Asif, Z.W. Shan, E.A. Stach, E. Cyrankowski, T.J. Wyrobek, O.L. Warren, Nat. Mater. 5, 697 (2006).
Z.W. Shan, R.K. Mishra, S.A. Syed Asif, O.L. Warren, A.M. Minor, Nat. Mater. 7, 115 (2008).
M. Legros, D.S. Gianola, C. Motz, MRS Bull. 35, 354 (2010).
M.A. Haque, M.T.A. Saif, Proc. Natl. Acad. Sci. U.S.A. 101, 6335 (2004).
D. Kiener, A.M. Minor, Nano Lett. 11, 3816 (2011).
H. Guo, K. Chen, Y. Oh, K. Wang, C. Dejoie, S.A. Syed Asif, O.L. Warren, Z.W. Shan, J. Wu, A.M. Minor, Nano Lett. 11, 3207 (2011).
L. Tian, Y.Q. Cheng, Z.W. Shan, J. Li, C.C. Wang, X.D. Han, J. Sun, E. Ma, Nat. Commun. 3, 609 (2012).
C. Chisholm, H. Bei, M. Lowry, J. Oh, S.A. Syed Asif, O.L. Warren, Z.W. Shan, E.P. George, A.M. Minor, Acta Mater. 60, 2258 (2012).
Acknowledgments
M.J.H. acknowledges financial support from the European Union under the Seventh Framework Programme under a contract for an Integrated Infrastructure Initiative Reference 312483-ESTEEM2 and the European Metrology Research Programme (EMRP) Project IND54 Nanostrain. The EMRP is jointly funded by the EMRP participating countries within EURAMET and the European Union. A.M.M. acknowledges support from the National Center for Electron Microscopy, Lawrence Berkeley National Laboratory, which is supported by the US Department of Energy under Contract #DE-AC02–05CH11231.
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Hÿtch, M.J., Minor, A.M. Observing and measuring strain in nanostructures and devices with transmission electron microscopy. MRS Bulletin 39, 138–146 (2014). https://doi.org/10.1557/mrs.2014.4
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DOI: https://doi.org/10.1557/mrs.2014.4