Abstract
Beta-gallium oxide (β-Ga2O3) is of increasing interest to the optoelectronic community for transparent conductor and power electronic applications. Considerable variability exists in the literature on the growth and doping of Ga2O3 films, especially as a function of growth approach, temperature, and oxygen partial pressure. Here pulsed laser deposition (PLD) was used to grow high-quality β-Ga2O3 films on (0001) sapphire and (−201) Ga2O3 single crystals and to explore the growth, stability, and dopability of these films as function of temperature and oxygen partial pressure. There is a strong temperature dependence to the phase formation, morphology, and electronic properties of β-Ga2O3 from 350 to 550 °C.
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Acknowledgments
This work was funded by the Center for the Next Generation of Materials by Design, an Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science, Basic Energy Sciences under Contract No. DE-AC36-08GO28308 to NREL.
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The supplementary material for this article can be found at https://doi.org/10.1557/mrc.2016.50.
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Garten, L.M., Zakutayev, A., Perkins, J.D. et al. Structure property relationships in gallium oxide thin films grown by pulsed laser deposition. MRS Communications 6, 348–353 (2016). https://doi.org/10.1557/mrc.2016.50
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DOI: https://doi.org/10.1557/mrc.2016.50