Abstract
Transparent high refractive index materials are of the central importance for the development of metasurface in visible range. Titanium dioxide (TiO2) has been considered as a perfect candidate due to its wide band gap and high refractive index. However, till now, it is still quite challenging to fabricate high-quality TiO2 films with high refractive indices and low losses. Here we demonstrate the fabrication of high-quality TiO2film using an electron-beam evaporation method. We show that the post-annealing conditions play key roles in the microstructure crystallography and the optical refractive index of the TiO2 films. A predominately oriented TiO2 film has been achieved by annealing at 700 °C in oxygen ambient. The refractive index is as high as 2.4, and the corresponding loss is negligible at 632 nm. Further studies on dielectric antennas show that our TiO2 film can be an ideal platform to fabricate metasurface in visible frequency range. We believe that our research will be important for the advances of all-dielectric metasurfaces.
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Acknowledgments
This work is supported by NSFC under the grant numbers 11374078, Shenzhen peacock plan KQCX20130627094 615410, and Shenzhen Fundamental research plan under the grant numbers JCYJ20130329155148184, JCYJ20140417172 417110, and JCYJ20140417172417096.
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An, N., Wang, K., Wei, H. et al. Fabricating high refractive index titanium dioxide film using electron beam evaporation for all-dielectric metasurfaces. MRS Communications 6, 77–83 (2016). https://doi.org/10.1557/mrc.2016.13
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DOI: https://doi.org/10.1557/mrc.2016.13