Abstract
Dielectric thin films of high- and low-refractive index are the essential components for optical coatings. To achieve high sputtering rates and superior film quality, the authors have developed novel conductive SiO2:Si and ZnO:Zn composites that become conductive once the doped silicon and metal Zn reach a critical ratio. The sputtering characteristics of the composite targets in direct current and radio-frequency (RF) plasma discharge are quite different from the corresponding element targets. The optical properties of the RF sputtered SiO2 and ZnO films from the composite targets is comparable with the films obtained from RF sputtering of pure oxide targets.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
H.A. Macleod: Thin-Film Optical Filters, 3rd ed. IOP Publishing: Bristol and Philadelphia (2001).
W.A. Pliskin: Comparison of properties of dielectric films deposited by various methods. J. Vac. Sci. Technol. 14, 1064 (1977).
O. Hanaizumi, K. Ono, and Y. Ogawa: Blue-light emission from sputtered Si:SiO2 films without annealing. Appl. Phys. Lett. 82, 538 (2003).
K. Iwahori, M. Furuta, Y. Taki, T. Yamamura, and A. Tanaka: Optical properties of fluoride thin films deposited by RF magnetron sputtering. Appl. Opt. 45, 4598 (2006).
Y.L. Wang, F. Ren, W. Lim, D.P. Norton, S.J. Pearton, I.I. Kravchenko, and J.M. Zavada: Room temperature deposited indium zinc oxide thin film transistors. Appl. Phys. Lett. 90, 232103 (2007).
M. Kitano, K. Funatsu, M. Matsuoka, M. Ueshima, and M. Anpo: Preparation of nitrogen-substituted TiO2 thin film photocatalysts by the radio frequency magnetron sputtering deposition method and their photocatalytic reactivity under visible light irradiation. J. Phys. Chem. B 110, 25266 (2006).
M.M. Hasana, A.S.M.A. Haseeba, R. Saidura, H.H. Masjukia, and M. Hamdi: Influence of substrate and annealing temperatures on optical properties of RF-sputtered TiO2 thin films. Opt. Mater. 32, 690 (2010).
M.A. Signorea, A. Sytchkovab, D. Dimaioa, A. Cappelloa, and A. Rizzo: Deposition of silicon nitride thin films by RF magnetron sputtering: a material and growth process study. Opt. Mater. 34, 632 (2012).
A. Kitao, K. Imakita, I. Kawamura, and M. Fujii: An investigation into second harmonic generation by Si-rich SiNx thin films deposited by RF sputtering over a wide range of Si concentrations. J. Phys. D, Appl. Phys. 47, 215101 (2014).
D. Rademacher, G. Bräuer, B. Fritz, and M. Vergöhl: Optical properties of silicon titanium oxide mixtures prepared by metallic mode reactive sputtering. Appl. Opt. 51, 8047 (2012).
S.D. Pappas, S. Grammatikopoulos, P. Poulopoulos, V. Kapaklis, A. Delimitis, D. Trachylis, and C. Politis: A cost-effective growth of SiOx thin films by reactive sputtering: photoluminescence tuning. J. Nanosc. Nanotechnol. 11, 3684 (2011).
W.H.P. Pernice, C. Xiong, and H.X. Tang: High Q micro-ring resonators fabricated from polycrystalline aluminum nitride films for near infrared and visible photonics. Opt. Express 20, 12261 (2012).
T. Kuschel and A. von Keudell: Ion-enhanced oxidation of aluminum as a fundamental surface process during target poisoning in reactive magnetron sputtering. J. Appl. Phys. 107, 103302 (2010).
M. Aiempanakit, T. Kubart, P. Larsson, K. Sarakinos, J. Jensen, and U. Helmersson: Hysteresis and process stability in reactive high power impulse magnetron sputtering of metal oxides. Thin Solid Films 519, 7779 (2011).
E. Särhammara, K. Strijckmansb, T. Nyberga, S. Van Steenbergeb, S. Berga, and D. Depla: A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination. Surface Coat. Technol. 232, 357 (2013).
R. Hollerweger, D. Holec, J. Paulitsch, R. Rachbauer, P. Polcik, and P.H. Mayrhofer: Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5. J. Phys. D, Appl. Phys. 46, 335203 (2013).
G. Strnad, L. Jakab-Farkas, S. Papp, A.Z. Fekete, D. Biro, and I. Vida-Simiti: Optimization of reactive sputtering technology for hard coatings deposition. Appl. Mech. Mater. 657, 246 (2014).
L.Q. Zhou, M. Dubey, R. Simões, Q.H. Fan, and V. Neto: Conductive ZnO:Zn composites for high rate sputtering deposition of intrinsic ZnO thin films. J. Electron. Mater. 44, 682 (2015).
D.S. McLachlan, M. Blaszkiewicz, and R.E. Newnham: Electrical resistivity of composites. J. Am. Ceram. Soc. 73, 2187 (1990).
E.M. Bachari, G. Baud, S.B. Amor, and M. Jacquet: Structural and optical properties of sputtered ZnO films. Thin Solid Films 348, 165 (1999).
V. Craciun, J. Elders, J.G.E. Gardeniers, and I.W. Boyd: Characteristics of high quality ZnO thin films deposited by pulsed laser deposition. Appl. Phys. Lett. 65, 2963 (1994).
K. Ellmer: Resistivity of polycrystalline zinc oxide films: current status and physical limit. J. Phys. D, Appl. Phys. 34, 3097 (2001).
Acknowledgments
The authors acknowledge support from FCT Portugal Grant No. PTDC/CTM-CER/121440/2010 and PEst-C/EME/UI0481/2013. This research was partly supported by National Science Foundation award no. 1462389 and South Dakota BOR PIF Grant.
Author information
Authors and Affiliations
Corresponding authors
Rights and permissions
About this article
Cite this article
Zhou, L.Q., Fan, Q.H., Simões, R. et al. High-rate sputtering deposition of high- and low-refractive index films from conductive composites. MRS Communications 5, 327–232 (2015). https://doi.org/10.1557/mrc.2015.32
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1557/mrc.2015.32