Abstract
(CrTaTiVZr)Nx coatings were deposited via reactive radio frequency magnetron sputtering. The effects of N2 flow at 0–8 SCCM on the chemical composition, microstructure, and mechanical properties of the films were investigated. The coatings deposited at a N2 flow of ≤2 SCCM showed a featureless structure with an amorphous phase. When the N2 flow was at 4 SCCM, two distinct layers were observed, namely, the bottom layer (close to the substrate) with an amorphous structure and the top layer with a fibrous structure and face-centered cubic phase. When the N2 flow was further increased, the structure was converted from fibers to columns with larger grains. Accordingly, the maximum hardness value of 36.4 GPa was achieved at a N2 flow of 4 SCCM, thereby indicating that (CrTaTiVZr)Nx coatings may be suitable as hard protective coatings.
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J.W. Yeh, S.K. Chen, S.J. Lin, J.Y. Gan, T.S. Chin, T.T. Shun, C.H. Tsau, and S.Y. Chang: Nanostructured high-entropy alloys with multiple principal elements: Novel alloy design concepts and outcomes. Adv. Eng. Mater. 6, 299 (2004).
Y.Y. Chen, T. Duval, U.D. Hung, J.W. Yeh, and H.C. Shih: Microstructure and electrochemical properties of high entropy alloys—A comparison with type-304 stainless steel. Corros. Sci. 47, 2257 (2005).
J.W. Yeh, S.K. Chen, J.Y. Gan, S.J. Lin, T.S. Chin, T.T. Shun, C.H. Tsau, and S.Y. Chang: Formation of simple Crystal structures in Cu-Co-Ni-Cr-al-Fe-Ti-V alloys with multiprincipal metallic elements. Metall. Mater. Trans. A 35, 2533 (2004).
P.J. Craievich, M. Weinert, J.M. Sanchez, and R.E. Watson: Local stability of nonequilibrium phases. Phys. Rev. Lett. 72, 3076 (1994).
A. Takeuchi, N. Chen, T. Wada, Y. Yokoyama, H. Kato, A. Inoue, and J.W. Yeh: Pd20Pt20Cu20Ni20P20 high-entropy alloy as a bulk metallic glass in the centimeter. Intermetallics 19, 1546 (2011).
H.Y. Ding and K.F. Yao: High entropy Ti20Zr20Cu20Ni20Be20 bulk metallic glass. J. Non-Cryst. Solids 364, 9 (2013).
C.H. Lai, S.J. Lin, J.W. Yeh, and S.Y. Chang: Preparation and characterization of AlCrTaTiZr multi-element nitride coatings. Surf. Coat. Technol. 201, 3275 (2006).
S.C. Liang, Z.C. Chang, D.C. Tsai, Y.C. Lin, H.S. Sung, M.J. Deng, and F.S. Shieu: Effects of substrate temperature on the structure and mechanical properties of (TiVCrZrHf)N coatings. Appl. Surf. Sci. 257, 7709 (2011).
M.H. Tsai, C.H. Lai, J.W. Yeh, and J.Y. Gan: Effects of nitrogen flow ratio on the structure and properties of reactively sputtered (AlMoNbSiTaTiVZr)Nx coatings. J. Phys. D: Appl. Phys. 41, 235402 (2008).
M.H. Tsai, C.W. Wang, C.H. Lai, J.W. Yeh, and J.Y. Gan: Thermally stable amorphous (AlMoNbSiTaTiVZr)50N50 nitride film as diffusion barrier in copper metallization. Appl. Phys. Lett. 92, 052109 (2008).
H.O. Pierson: Handbook of Refractory Carbides and Nitrides, 1st ed. (Noyes Publications, Westwood, New Jersey, 1996).
W. Gulbiński, T. Suszko, and D. Pailharey: High load AFM friction and wear experiments on V2O5 thin films. Wear 254, 988 (2003).
P.H. Mayrhofer, H. Willmann, and C. Mitterer: Oxidation kinetics of sputtered Cr–N hard coatings. Surf. Coat. Technol. 146, 222 (2001).
D.C. Tsai, Y.L. Huang, S.R. Lin, D.R. Jung, S.Y. Chang, and F.S. Shieu: Structure and mechanical properties of (TiVCr)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios. J. Alloys Compd. 509, 3141 (2011).
G. Abadias, L.E. Koutsokeras, A. Siozios, and P. Patsalas: Stress, phase stability and oxidation resistance of ternary Ti–Me–N (Me=Zr, Ta). Thin Solid Films 538, 56 (2013).
H.W. Chang, P.K. Huang, A. Davison, J.W. Yeh, C.H. Tsau, and C.C. Yang: Nitride films deposited from an equimolar Al–Cr–Mo–Si–Ti Alloy target by reactive direct current magnetron sputtering. Thin Solid Films 516, 6402 (2008).
D.C. Tsai, Y.L. Huang, S.R. Lin, S.C. Liang, and F.S. Shieu: Effect of nitrogen flow ratios on the structure and mechanical properties of (TiVCrZrY)N coatings prepared by reactive magnetron sputtering. Appl. Surf. Sci. 257, 1361 (2010).
D.C. Tsai, Z.C. Chang, B.H. Kuo, M.H. Shiao, S.Y. Chang, and F.S. Shieu: Structure and properties of (TiVCrZrY)N coatings prepared by energetic bombardment sputtering with different nitrogen flow ratios. Appl. Phys. A 115, 1205 (2014).
M. Larsson, M. Bromark, P. Hedenqvist, and S. Hogmark: Deposition and mechanical properties of multilayered PVD Ti–TiN coatings. Surf. Coat. Technol. 76, 202 (1995).
W.C. Oliver and G.M. Pharr: Measurement of hardness and elastic modulus by instrumented indentation: Advances in understanding and refinements to methodology. J. Mater. Res. 19, 3 (2004).
R.M. Mason and M. Pichiling: Sputtering in a glow discharge ion source-pressure dependence: Theory and experiment. J. Phys. D: Appl. Phys. 27, 2363 (1994).
H. Hasegawa, A. Kimura, and T. Suzuki: Ti1−xAlxN, Ti1−xZrxN and Ti1−xCrxN films synthesized by the AIP method. Surf. Coat. Technol. 132, 76 (2000).
P. Hones, R. Sanjinés, and F. Lévy: Sputter deposited chromium nitride based ternary compounds for hard coatings. Thin Solid Films 332, 240 (1998).
H.P. Klug and L.E. Alexander: X-Ray Diffraction Procedures for Polycrystalline and Amorphous Materials, 2nd ed. (Wiley&Sons, New York, 1974).
J.A. Dean: Lange’s Handbook of Chemistry, 16th ed. (McGraw-Hill, New York, 1999).
O. Kappertz, R. Drese, and M. Wuttig: Correlation between structure, stress and deposition parameters in direct current sputtered zinc oxide films. J. Vac. Sci. Technol., A 20, 2084 (2002).
P.K. Huang and J.W. Yeh: Effects of nitrogen content on structure and mechanical properties of multi-element (AlCrNbSiTiV)N coating. Surf. Coat. Technol. 203, 1891 (2009).
S. Mahieu, P. Ghekiere, G.D. Winter, R.D. Gryse, D. Depla, G.V. Tendeloo, and O.I. Lebedev: Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering. Surf. Coat. Technol. 200, 2764 (2006).
D.C. Tsai, Z.C. Chang, B.H. Kuo, M.H. Shiao, S.Y. Chang, and F.S. Shieu: Structural morphology and characterization of (AlCrMoTaTi)N coating deposited via magnetron sputtering. Appl. Surf. Sci. 282, 789 (2013).
A. van der Drift: Evolutionary selection, a principle governing growth orientation in vapor-deposited layers. Philips Res. Rep. 22, 267 (1967).
G. Hu, X. Kong, Y. Wang, L. Wan, and X. Duan: Formation mechanism of amorphous layer at the interface of Si(111) substrate and AlN buffer layer for GaN. J. Mater. Sci. Lett. 22, 1581 (2003).
J.H. Song, S.C. Wang, J.C. Sung, J.L. Huang, and D.F. Lii: Characterization of reactively sputtered C-axis orientation (Al, B)N films on diamond. Thin Solid Films 517, 4753 (2009).
J.G. Kim and Yu. Jin: Behavior of residual stress on CVD diamond films. Mater. Sci. Eng., B 57, 24 (1998).
D.C. Tsai, Z.C. Chang, L.Y. Kuo, T.J. Lin, T.N. Lin, and F.S. Shieu: Solid solution coating of (TiVCrZrHf)N with unusual structural evolution. Surf. Coat. Technol. 217, 84 (2013).
S. Veprek: The search for novel, superhard materials. J. Vac. Sci. Technol., A 17, 2401 (1999).
S. Veprek and A.S. Argon: Towards the understanding of mechanical properties of super- and ultrahard nanocomposites. J. Vac. Sci. Technol., B 20, 650 (2002).
ACKNOWLEDGMENT
The authors gratefully acknowledge the financial support for this research by the Ministry of Science and Technology of Taiwan under Grant No. 103-2622-E-167-011-CC3.
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Chang, ZC., Tsai, DC. & Chen, EC. Effect of N2 flow on the structure and mechanical properties of (CrTaTiVZr)Nx coatings processed by reactive magnetron sputtering. Journal of Materials Research 30, 924–934 (2015). https://doi.org/10.1557/jmr.2015.79
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DOI: https://doi.org/10.1557/jmr.2015.79