Abstract
Indium-tin-oxide (ITO) thin films were prepared by reactive magnetron sputtering; their optical constants and thickness were determined by spectral reflectometry (SR) in the wavelength range from 400 nm to 800 nm and spectroscopic ellipsometry (SE) in the wavelength range from 191 nm to 1690 nm. A comparative evaluation of the measured data from SR and SE has been made using the same single layer optical model based on the Cauchy dispersion relation.
The introduction of a surface roughness layer into the optical model considerably improved the fit quality during evaluation of SE data. Vertical inhomogeneity of the ITO thin films was assessed using a multilayer optical model describing porosity gradient and the three-layer optical model suggested by Jung [Y.S. Jung, Thin Solid Films 467, 36 (2004)] from the SE data.
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References
J.P. Zheng and H.S. Kwok: Preparation of indium tin oxide films at room temperature by pulsed laser deposition. Thin Solid Films 232, 99 (1993).
W. Fukarek and H. Kersten: Application of dynamic in situ ellipsometry to the deposition of tin-doped indium oxide films by reactive direct-current magnetron sputtering. J. Vac. Sci. Technol., A 12, 523 (1994).
J.A. Woollam, W.A. McGahan, and B. Johs: Spectroscopic ellipsometry studies of indium tin oxide and other flat panel display multilayer materials. Thin Solid Films 241, 44 (1994).
R.A. Synowicki: Spectroscopic ellipsometry characterization of indium tin oxide film microstructure and optical constants. Thin Solid Films 313/314, 394 (1998).
E. Benamar, M. Rami, C. Messaoudi, D. Sayan, and A. Ennaoui: Structural, optical and electrical properties of indium tin oxide thin films prepared by spray pyrolysis. Sol. Energy Mater. Sol. Cells 56, 125 (1999).
J.A. Dobrowolski, L. Li, and J.N. Hilfiker: Long-wavelength cutoff filters of a new type. Appl. Opt. 38, 4891 (1999).
J. George and C.S. Mourn: Electrical and optical properties of electron beam evaporated ITO thin films. Surf. Coat. Technol. 132, 45 (2000).
Y. Han, D. Kim, J.S. Cho, S.K. Koh, and Y.S. Song: Tin-doped indium oxide (ITO) film deposition by ion beam sputtering. Sol. Energy Mater. Sol. Cells 65, 211 (2001).
M. Martino, A. Luches, M. Fernandez, P. Anobile, and V. Petnizzelli: Characterization of thin indium tin oxide films deposited by pulsed XeCl laser ablation. J. Phys. D: Appl. Phys. 34, 2606 (2001).
M. Losurdo, M. Giangregorio, P. Capezzuto, G. Bruno, R. DeRosa, F. Roca, C. Summonte, J. Plá, and R. Rizzoli: Parametrization of optical properties of indium–tin–oxide thin films by spectroscopic ellipsometry: Substrate interfacial reactivity. J. Vac. Sci. Technol., A 20, 37 (2002).
H. El Rhaleb, E. Benamar, M. Rami, J.P. Roger, A. Hakam, and A. Ennaoui: Spectroscopic ellipsometry studies of index profile of indium tin oxide films prepared by spray pyrolysis. Appl. Surf. Sci. 201, 138 (2002).
T.C. Gorjanc, D. Lemig, C. Py, and D. Roth: Room temperature deposition of ITO using r.f. magnetron sputtering. Thin Solid Films 413, 181 (2002).
K. Maki, N. Komiya, and A. Suzuki: Fabrication of thin films of ITO by aerosol CVD. Thin Solid Films 445, 224 (2003).
Y.S. Jung: Spectroscopic ellipsometry studies on the optical constants of indium tin oxide films deposited under various sputtering conditions. Thin Solid Films 467, 36 (2004).
M. Yamaguchi, A. Ide-Ektessabi, H. Nomura, and N. Yasiu: Characteristics of indium tin oxide thin films prepared using electron beam evaporation. Thin Solid Films 447/448, 115 (2004).
Y.S. Jung: A spectroscopic ellipsometry study on the variation of the optical constants of tin-doped indium oxide thin films during crystallization. Solid State Commun. 129, 491 (2004).
F.F. Ngaffo, A.P. Caricato, A. Fazzi, M. Fernandez, S. Lattante, M. Martino, and F. Romano: Deposition of ITO films on SiO2 substrates. Appl. Surf. Sci. 248, 428 (2005).
H.C. Lee and O.O. Park: The evolution of the structural, electrical and optical properties in indium-tin-oxide thin film on glass substrate by DC reactive magnetron sputtering. Vacuum 80, 880 (2006).
A. Krasilnikova Sytchkova, M.L. Grilli, S. Boycheva, and A. Piegari: Optical, electrical, structural and microstructural characteristics of r.f. sputtered ITO films developed for art protection coating. Appl. Phys. A 89, 63 (2007).
J.K. Kim, S. Chhajed, M.F. Schubert, E.F. Schubert, A.J. Fischer, M.H. Crawford, J. Cho, H. Kim, and C. Sone: Light-extraction enhancement of GaInN light-emitting diodes by graded-refractive-index indium tin oxide anti-reflection contact. Adv. Mater. 20, 801 (2008).
L. Hao, X. Diao, H. Xu, B. Gu, and T. Wang: Thickness dependence of structural, electrical and optical properties of indium tin oxide (ITO) films deposited on PET substrates. Appl. Surf. Sci. 254, 3504 (2008).
T.S. Sathiaraj: Effect of annealing on the structural, optical and electrical properties of ITO films by RF sputtering under low vacuum level. Microelectron. J. 39, 1444 (2008).
A. Iljinas, I. Mockevicius, M. Andrulevicius, S. Meskinis, and S. Tamulevicius: Growth of ITO thin films by magnetron sputtering: OES study, optical and electrical properties. Vacuum 83, S118 (2009).
C. Tejo-Cruz, A. Mendoza-Galván, A.M. López-Beltrán, and M. Garcia-Jimenez: Effects of air annealing on the optical, electrical, and structural properties of indium-tin oxide thin films. Thin Solid Films 517, 4615 (2009).
S. D’Elia, N. Scaramuzza, F. Ciuchi, C. Versace, G. Strangi, and R. Bartolino: Ellipsometry investigation of the effects of annealing temperature on the optical properties of indium tin oxide thin films studied by Drude–Lorentz model. Appl. Surf. Sci. 255, 7203 (2009).
V. Senthilkumar, P. Vickraman, M. Jayachandran, and C. Sanjeeviraja: Structural and optical properties of indium tin oxide (ITO) thin films with different compositions prepared by electron beam evaporation. Vacuum 84, 864 (2010).
K.J. Kumar, N.R.C. Raju, and A. Subrahmanyam: Thickness dependent physical and photocatalytic properties of ITO thin films prepared by reactive DC magnetron sputtering. Appl. Surf. Sci. 257, 3075 (2011).
H. Kim, A. Pique, J.S. Horowitz, H. Mattoussi, H. Murata, Z.H. Kafafi, and D.B. Chrisey: Indium tin oxide thin films for organic light-emitting devices. Appl. Phys. Lett. 74, 3444 (1999).
V. Teixeira, H.N. Cui, L.J. Meng, E. Fortunato, and R. Martins: Amorphous ITO thin films prepared by DC sputtering for electrochromic applications. Thin Solid Films 420, 70 (2002).
J.B. Chu, S.M. Huang, H.B. Zhu, X.B. Xu, Z. Sun, Y.W. Chen, and F.Q. Huang: Preparation of indium tin oxide thin films without external heating for application in solar cells. J. Non-Cryst. Solids 354, 5480 (2008).
H.P. Lobl, M. Huppertz, and D. Mergel: ITO films for antireflective and antistatic tube coatings prepared by d.c. magnetron sputtering. Surf. Coat. Technol. 82, 90 (1996).
T. Sako, A. Ohmi, H. Yumoto, and K. Nishiyama: ITO-film gas sensor for measuring photodecomposition of NO2 gas. Surf. Coat. Technol. 142/144, 781 (2001).
M. Balestrieri, D. Pysch, J-P. Becker, M. Hermle, W. Warta, and S.W. Glunz: Characterization and optimization of indium tin oxide films for hetero junction solar cells. Sol. Energy Mater. Sol. Cells 95, 2390 (2011).
E.A. Irene: Applications of spectroscopic ellipsometry to microelectronics. Thin Solid Films 233, 96 (1993).
T.F. Stoica, M. Gartner, M. Losurdo, V. Teodorescu, M. Blanchin, T. Stoica, and M. Zaharescu: Spectroellipsometric study of the sol–gel nanocrystalline ITO multilayer films. Thin Solid Films 455/456, 509 (2004).
H. Fujiwara: Spectroscopic Ellipsometry: Principles and Applications (John Wiley and Sons, Chichester, England, 2007).
C. Major, G. Juhász, Z. Horváth, O. Polgár, and M. Fried: Wide angle beam ellipsometry for extremely large samples. Phys. Status Solidi C 5(5), 1077 (2008).
M. Kulik, J. Zuk, A. Drozdiel, K. Pyszniak, F.F. Komarov, and W. Rzodkiewicz: RBS-C and ellipsometric investigations of radiation damage in hot-implanted GaAs layers. Mater. Sci. Eng., B 176, 340 (2011).
www.filmetrics.com (accessed June 2014).
J.A. Woollam Co., Inc.: www.jawoollam.com (accessed March 2014).
D.E. Aspnes: Optical properties of thin films. Thin Solid Films 89, 249 (1982).
K-S. Tseng and Y-L. Lo: Investigation into inhomogeneous electrical and optical properties of indium tin oxide film using spectroscopic ellipsometry with multi-layer optical models. Opt. Mater. Express 4, 43 (2014).
ACKNOWLEDGMENTS
The authors acknowledge the support of the Hungarian-Indian R&D Cooperation Program under the contracts No. TÉT10-1-2011-0305 and INT/HUN/P-O4/2012 dated 27 Sept 2012 (DST, Govt of India project sanction: TET_09_IN_DST_KFI dated 21 March 2012), the support from the Hungarian Scientific Research Fund (OTKA No. K81842), and the Hungarian National Development Agency grant TÁMOP-4.2.2/B-10/1-2010-0025; Department of Science and Technology, Government of India (INT/HUN/P-04/2012 dated 15 Dec 2009) for supporting the project.
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Lohner, T., Kumar, K.J., Petrik, P. et al. Optical analysis of room temperature magnetron sputtered ITO films by reflectometry and spectroscopic ellipsometry. Journal of Materials Research 29, 1528–1536 (2014). https://doi.org/10.1557/jmr.2014.173
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DOI: https://doi.org/10.1557/jmr.2014.173