Abstract
Nano-structured graphene has recently attracted extraordinary attention due to its potential use as an electronic or spintronic material. We investigated the electrical conductivities of antidot and Ar-sputtered graphene samples under a magnetic field in terms of the carrier density. Antidot samples exhibit conductivity that is well explained by charged impurity scattering, which is associated with intravalley scattering. This suggestion is supported by the low intensity of the Raman D band, which is related to intervalley scattering induced by structural defects. In contrast, Ar-sputtered samples show a strong D band and conductivity that is affected by defect scattering. The difference in the main scattering mechanism between the two types of samples appears as Shubnikov-de Haas oscillations at high magnetic fields, which are observed in antidot samples but not in Ar-sputtered samples. Furthermore, an analysis of weak localization effects in both samples at low fields reveals that intra- and intervalley scatterings play significant roles in antidot and Ar-sputtered samples, respectively.
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Acknowledgments
This work was supported by Grant-in-aid for Scientific Research no. 20001006 from the Ministry of Education, Culture, Sports, Science and Technology, Japan. This work was partly supported by MEXT Nanotechnology platform 12025014 (F-12-IT-0002).
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APPENDIX A
APPENDIX A
We used bilayer and monolayer graphenes for the antidot and Ar-sputtered samples. Monolayer graphene can be prepared easily for Ar-sputtered samples because the preparation process is simple. In contrast, we have seldom succeeded in the preparation and cleaning of monolayer antidot graphene because monolayer graphene is mechanically weak and chemically reactive. However, the electron-beam lithography technique allows the fabrication of antidots not only on the uppermost layer but also on the second layer as well, so that the characteristics of the antidots are almost the same for the first and second layers. Accordingly, we can treat these two layers as identical. Furthermore, as the physical processes that underlie the scattering are not significantly modified by the interlayer interaction, their essence is preserved. On the other hand, in the Ar-sputtered sample, bilayer graphene is inappropriate as defects created on the second layer are different from those on the uppermost layer because of differences in the penetration of the Ar ion. Thus, we chose bilayer antidot graphene and monolayer Ar-sputtered graphene to investigate the dominant scattering mechanism in each sample. In fact, the number of layers is not crucial to our analysis; our discussion focuses on the comparison of inter- and intravalley scattering sources.
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Kudo, Y., Takai, K. & Enoki, T. Electron transport properties of graphene with charged impurities and vacancy defects. Journal of Materials Research 28, 1097–1104 (2013). https://doi.org/10.1557/jmr.2013.62
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DOI: https://doi.org/10.1557/jmr.2013.62