Abstract
Irradiation-induced amorphization in nanocrystalline and single-crystal 3C-SiC has been studied using 1 MeV Si+ ions under identical irradiation conditions at room temperature and 400 K. The disordering behavior has been characterized using in situ ion channeling and ex situ x-ray diffraction methods. The results show that, compared with single-crystal 3C-SiC, full amorphization of small 3C-SiC grains (~3.8 nm in size) at room temperature occurs at a slightly lower dose. Grain size decreases with increasing dose until a fully amorphized state is attained. The amorphization dose increases at 400 K relative to room temperature. However, at 400 K, the amorphization dose for 2.0 nm grains is about a factor of 4 and 8 smaller than for 3.0 nm grains and bulk single-crystal 3C-SiC, respectively. The behavior is attributed to the preferential amorphization at the interface.
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References
W.J. Weber, L.M. Wang, N. Yu, and N.J. Hess: Structure and properties of ion-beam-modified (6H) silicon carbide. Mater. Sci. Eng.,4 253, 62 (1998).
W. Jiang, Y. Zhang, and W.J. Weber: Temperature dependence of disorder accumulation and amorphization in Au-ion-irradiated 6H-S1C. Phys. Rev. B 70, 165208 (2004).
T.D. Shen, S. Feng, M. Tang, J.A. Valdez, Y. Wang, and K.E. Sickafus: Enhanced radiation tolerance in nanocrystalline MgGa2O4. Apl. Phys. Lett. 90, 263115 (2007).
H. Wang, R. Araujo, J.G. Swadener, Y.Q. Wang, X. Zhang, E.G. Fu, and T. Cagin: Ion irradiation effects in nanocrystalline TiN coatings. Nucl. Iustrum. Methods Phys. Res., Sect. B 261, 1162 (2007).
W. Jiang, H. Wang, I. Kim, I-T. Bae, G. Li, P. Nachimuthu, Z. Zhu, Y. Zhang, and W.J. Weber: Response of nanocrystalline 3C silicon carbide to heavy-ion irradiation. Phys. Rev B 80, 161301(R) (2009).
J.F. Ziegler: http://www.srim.org.
R. Devanathan, W.J. Weber, and F. Gao: Atomic scale simulation of defect production in irradiated 3C-SiC. J. Appl. Phys. 90, 2303 (2001).
Y. Zhang, I-T. Bae, K. Sun, C.M. Wang, M. Ishimaru, Z. Zhu, W. Jiang, and W.J. Weber: Damage profile and ion distribution of slow heavy ions in compounds. J. Appl. Phys. 105, 104901 (2009).
W.J. Weber, N. Yu, and L.M. Wang: Irradiation-induced amorphization in ß-SiC. J. Nucl. Mater. 253, 53 (1998).
F. Gao, D. Chen, W. Hu, and W.J. Weber: Energy dissipation and defect generation in nanocrystalline silicon carbide. Phys. Rev. B 81, 184101 (2010).
W. Jiang, W.J. Weber, J. Lian, and N.M. Kalkhoran: Disorder accumulation and recovery in gold-ion irradiated 3C-SiC. J. Appl. Phys. 105, 013529 (2009).
F. Gao, W.J. Weber, M. Posselt, and V. Belko: Atomistic study of intrinsic defect migration in 3C-SiC. Phys. Rev. B 69, 245205 (2004).
Z. Rong, F. Gao, W.J. Weber, and G. Hobler: Monte Carlo simulations of defect recovery within a 10 keV collision cascade in 3C-SiC. J. Appl. Phys. 102, 103508 (2007).
Y. Zhang, W.J. Weber, W. Jiang, C.M. Wang, V. Shutthanandan, and A. Hallen: Effects of implantation temperature on damage accumulation in Al-implanted 4H-SiC J. ADDI. Phys. 95, 4012 (2004).
H.A. Atwater and W.L. Brown: Grain boundary mediated amorphization in silicon during ion irradiation. Appl. Phys. Lett. 56, 30 (1990).
H.A. Atwater, J.S. Im, and W.L. Brown: Heterogeneous amorphization of Si during ion irradiation: Dependence of amorphous Si nucleation kinetics on defect energy and structure. Nucl. lustrum. Methods Phys. Res., Sect. B 5960, 386 (1991).
K.A. Jackson: A defect model for ion-induced crystallization and amorphization. J. Mater. Res. 3, 1218 (1988).
G.A. Kachurin, M-O. Ruault, A.K. Gutakovsky, O. Kai’tasov, S.G. Yanovskaya, K.S. Zhuravlev, and H. Bernas: Light particle irradiation effects in Si nanocrystals. Nucl. lustrum. Methods Phys. Res., Sect. B 147, 356 (1999).
T.D. Shen: Radiation tolerance in a nanostructure: Is smaller better? Nucl. lustrum. Methods Phys. Res., Sect. B 266, 921 (2008).
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Jiang, W., Wang, H., Kim, I. et al. Amorphization of nanocrystalline 3C−SiC irradiated with Si+ ions. Journal of Materials Research 25, 2341–2348 (2010). https://doi.org/10.1557/jmr.2010.0311
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DOI: https://doi.org/10.1557/jmr.2010.0311