Abstract
We report the realization of the p-type conductivity and the enhancement of the photoluminescence (PL) intensity in undoped ZnO films treated with high-energy (1 MeV) electron-beam irradiation (HEEBI), suggesting that the HEEBI process is compatible with a low-temperature requirement for the fabrication of transparent thin film transistors with good efficiency on a plastic substrate. The p-type conductivity of the films was revealed by the Hall, x-ray photoelectron spectroscopy, and PL measurements after being electron-irradiated in air at room temperature. The major acceptor-like defects were determined to be oxygen interstitial and zinc vacancy. A model was proposed in terms of O as well as Zn diffusion to explain the observed results. It was also observed that HEEBI treatment has little influence on the optical transmittance of ZnO films, whereas HEEBI treatment shifts the optical band gap toward the lower energy region from 3.29 to 3.28 eV.
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S.H. Cha, M.S. Oh, K.H. Lee, S-I. Im, B.H. Lee, and M.M. Sung: Electrically stable low voltage ZnO transistors with organic/inorganic nanohybrid dielectrics. Appl. Phys. Lett. 92, 23506 (2008).
D-H. Kang, H. Lim, C-J. Kim, I-H. Song, J-C. Park, Y-S. Park, and J-H. Chung: Amorphous gallium indium zinc oxide thin film transistors: Sensitive to oxygen molecules. Appl. Phys. Lett. 90, 192101 (2007).
S.J. Lim, S-J. Kwon, H-J. Kim, and J-S. Park: High performance thin film transistor with low temperature atomic layer deposition nitrogen-doped ZnO. Appl. Phys. Lett. 91, 183517 (2007).
Y-J. Zeng, Z-Z. Ye, J-G. Lu, L-P. Zhu, D-Y. Li, B-H. Zhao, and J-Y. Huang: Effects of Al content on properties of Al–N codoped ZnO films. Appl. Surf. Sci. 249, 203 (2005).
H.P. He, F. Zhuge, Z.Z. Ye, L.P. Zhu, F.Z. Wang, B.H. Zhao, and J.Y. Huang: Strain and its effect on optical properties of Al–N codoped ZnO films., J. Appl. Phys. 99, 023503 (2006).
V. Vaithianathan, B-T. Lee, C-H. Chang, K. Asokan, and S.S. Kim: Characterization of as-doped, p-type ZnO by x-ray absorption near-edge structure spectroscopy. Appl. Phys. Lett. 88. 112103 (2006).
H.S. Kang, G.H. Kim, D.L. Kim, H.W. Chang, B.D. Ahn, and S.Y. Lee: Investigation on the p-type formation mechanism of arsenic doped p-type ZnO thin film. Appl. Phys. Lett. 89, 181103 (2006).
G. Hu, G.H. Gong, E.F. Chor, and P. Wu: Properties of p-type and n-type ZnO influenced by P concentration. Appl. Phys. Lett. 89, 251102 (2006).
Y.J. Zeng, Z.Z. Ye, W.Z. Xu, B. Liu, Y. Che, L.P. Zhu, and B.H. Zhao: Study on the Hall-effect and photoluminescence of N-doped p-type ZnO thin films. Mater. Lett. 61, 41 (2007).
B. Yao, L.X. Guan, G.Z. Xing, Z.Z. Zhang, B.H. Li, Z.P. Wei, X.H. Wang, C.X. Cong, Y.P. Xie, Y.M. Lu, and D.Z. Shen: P-type conductivity and stability of nitrogen-doped zinc oxide prepared by magnetron sputtering. J. Lumin. 122–123, 191 (2007).
W-J. Lee, J. Kang, and K.J. Chang: The origin of p-type conductivity in P-doped ZnO. J. Korean Phys. Soc. 50, 602 (2007).
F. Zhuge, L.P. Zhu, Z.Z. Ye, J.G. Lu, H.P. He, and B.H. Zhao: Al concentration dependence of electrical and photoluminescent properties of co-doped ZnO films. Chem. Phys. Lett. 437, 203 (2007).
D.H. Kong, W.C. Choi, Y.C. Shin, J.H. Park, and T.G. Kim: Role of oxygen in green emission from ZnO thin films. J. Korean Phys. Soc. 48, 1214 (2006).
E-J. Yun, H-S. Park, K.H. Lee, H.G. Nam, and M. Jung: Characterization of Al–As codoped p-type ZnO films by magnetron cosputtering deposition. J. Appl. Phys. 103, 73507 (2008).
X.Q. Wei, B.Y. Man, M. Liu, C.S. Xue, H.Z. Zhuang, and C. Yang: Blue luminescent centers and microstructural evaluation by XPS and Raman in ZnO thin films annealed in vacuum, N2 and O2. Physica B (Amsterdam) 388, 145 (2007).
G.Z. Xing, B. Yao, C.X. Cong, T. Yang, Y.P. Xie, B.H. Li, and D.Z. Shen: Effect of annealing on conductivity behavior of undoped zinc oxide prepared by rf magnetron sputtering. J. Alloys Compd. 457, 36 (2008).
H. Amano, M. Kito, and K. Hiramatsu: P-type conduction in Mg-doped GaN treated with low-energy electron beam irradiation (LEEBI). Jpn. J. Appl. Phys. 28, L2112 (1989).
J.A.V. Vechten, J.D. Zook, R.D. Horning, and B. Goldenberg: Defeating compensation in wide gap semiconductors by growing in H that is removed by low temperature de-ionizing radiation. Jpn. J. Appl. Phys. 31, 3662 (1992).
X. Li and J.J. Coleman: Time-dependent study of low energy electron beam irradiation of Mg-doped GaN grown by metalor-ganic chemical vapor deposition. Appl. Phys. Lett. 69, 1605 (1996).
D.U. Lee, E.K. Kim, B.C. Lee, and D.K. Oh: Electrical and optical properties of a GaN n+-p junction with high-energy electron irradiation. J. Korean Phys. Soc. 50, 1904 (2007).
D.U. Lee, E.K. Kim, B.C. Lee, and D.K. Oh: Characterization of electron irradiated GaN n+-p diode. Thin Solid Films 516, 3482 (2008).
L.S. Vlasenko and G.D. Watkins: Optical detection of electron paramagnetic resonance in room-temperature electron-irradiated ZnO. Phys. Rev. B 71, 125210 (2005).
B.D. Cullity: Elements of X-ray Diffraction (Addison-Wesley, MA, 1978), p. 102.
L.P. Dai, H. Deng, J.J. Chen, and M. Wei: Realization of the intrinsic p-type ZnO thin film by SSCVD. Solid State Commun. 143, 378 (2007).
Y-J. Lin, C-L. Tsai, Y-M. Lu, and C-J. Liu: Optical and electrical properties of undoped ZnO films. J. Appl. Phys. 99, 093501 (2006).
D.H. Fan, Z.Y. Ning, and M.F. Jiang: Characteristics and luminescence of Ge-doped ZnO films prepared by alternate radio frequency magnetron sputtering. Appl. Surf. Sci. 245, 414 (2005).
M.A. Reshchikov, H. Morkoc, B. Nemeth, J. Nause, J. Xie, B. Hertog, and A. Osinsky: Luminescence properties of defects in ZnO. Physica B (Amsterdam) 401–402, 358 (2007).
E-J. Yun, H-S. Park, K-H. Cha, K.H. Lee, N-I. Cho, and H.G. Nam: Effect of hydrogen peroxide on the stability of undoped p-type ZnO prepared by magnetron sputtering. J. Korean Phys. Soc. 52, 606 (2008).
G. Xiong, J. Wilkinson, B. Mischuck, S. Tuzemen, K.B. Ucer, and R.T. Williams: Control of p- and n-type conductivity in sputter deposition of undoped ZnO. Appl. Phys. Lett. 80, 1195 (2002).
M. Tanemura, H. Hatano, M. Kudo, N. Ide, Y. Fujimoto, L. Miao, H.Y. Yang, S.P. Lau, S.F. Yu, and J. Kato: Low-temperature fabrication and random laser action of doped zinc oxide nanoneedles. Surf. Sci. 601, 4459 (2007).
H. Li, H. Liu, J. Wang, S. Yao, X. Cheng, and R.I. Boughton: Influence of annealing on ZnO films grown by metal–organic chemical vapor deposition. Mater. Lett. 58, 3630 (2004).
NIST XPS Database: Selected element search results. Available at: https://www.srdata.nist.gov/xps.
C. Kittel: Introduction to Solid State Physics, 6th ed. (John Wiley and Sons, New York, 1986), p. 76.
Wacklepedia—The Free Encyclopedia: Available at: https://www.wacklepedia.com/z/zi/zinc.html.
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Yun, EJ., Jung, J.W., Cheon, C.I. et al. P-type conduction in room-temperature high-energy electron-irradiated ZnO thin films. Journal of Materials Research 24, 1785–1790 (2009). https://doi.org/10.1557/jmr.2009.0186
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DOI: https://doi.org/10.1557/jmr.2009.0186