Skip to main content
SpringerLink
Log in

Photo-assisted crystallization of zirconia thin films prepared using chelate compounds

  • Published:
Journal of Materials Research Aims and scope Submit manuscript

Abstract

A highly crystallized and smooth-surfaced zirconia (ZrO2) thin film was prepared using a precursor solution with 2,4-pentanedione addition (molar ratio of 1:1 for zirconium alkoxide); the film was irradiated with ultraviolet (UV) light using an ultrahigh-pressure mercury lamp. This thin film was compared with another thin film, which prepared using a precursor solution without additives and UV irradiation. The crystallinity of ZrO2 thin films improved with increasing 2,4-pentanedione addition and UV irradiation time and changed according to the type of organic additives. These results occurred presumably because the orientation of polymerization in zirconium alkoxide units and stability of chelate compounds for UV irradiation were controlled under these conditions. In addition, the method was effective for lower-temperature crystallization of highly crystallized, smooth-surfaced thin films.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

TABLE I.
FIG. 1
FIG. 2
FIG. 3
FIG. 4
FIG. 5
FIG. 6
FIG. 7
FIG. 8
FIG. 9
FIG. 10
FIG. 11
FIG. 12
FIG. 13
FIG. 14
FIG. 15
FIG. 16

Similar content being viewed by others

References

  1. J.P. Chang Y-S. Lin: Dielectric property and conduction mechanism of ultrathin zirconium oxide films. Appl. Phys. Lett. 79, 3666 2001

    Article  CAS  Google Scholar 

  2. B-O. Cho, J. Wang, L. Sha J.P. Chang: Tuning the electrical properties of zirconium oxide thin films. Appl. Phys. Lett. 80, 1052 2002

    Article  CAS  Google Scholar 

  3. J. Robertson: Band offsets of wide-band-gap oxides and implications for future electronic devices. J. Vac. Sci. Technol., B 18, 1785 2000

    Article  CAS  Google Scholar 

  4. B. Kralik, E.K. Vhang S.G. Louie: Structural properties and quasiparticle band structure of zirconia. Phys. Rev. B 57, 7027 1998

    Article  CAS  Google Scholar 

  5. D-Y. Kim, C-H. Lee S.J. Park: Preparation of zirconia thin films by metalorganic chemical vapor deposition using ultrasonic nebulization. J. Mater. Res. 11, 2583 1996

    Article  CAS  Google Scholar 

  6. T.S. Jeon, J.M. White D.L. Kwong: Thermal stability of ultrathin ZrO2 films prepared by chemical vapor deposition on Si(100). Appl. Phys. Lett. 78, 368 2001

    Article  CAS  Google Scholar 

  7. M. Copel, M. Gribelyuk E. Gusev: Structure and stability of ultrathin zirconium oxide layers on Si(001). Appl. Phys. Lett. 76, 436 2000

    Article  CAS  Google Scholar 

  8. K.J. Hubbard D.G. Schlom: Thermodynamic stability of binary oxides in contact with silicon. J. Mater. Res. 11, 2757 1996

    Article  CAS  Google Scholar 

  9. Y. Komatsu, T. Sato, S. Ito K. Akashi: Preparation of YBCO/ZrO2 thin films on Si by MOCVD using a mode converting type of microwave plasma apparatus. Thin Solid Films 341, 132 1999

    Article  CAS  Google Scholar 

  10. H.S. Choi, E.H. Kim, I-H. Choi, Y.T. Kim, J.H. Choi J.Y. Lee: The effect of ZrO2 buffer layer on electrical properties in Pt/SrBi2Ta2O9/ZrO2/Si ferroelectric gate oxide structure. Thin Solid Films 388, 226 2001

    Article  CAS  Google Scholar 

  11. G-L. Tan X-J. Wu: Electronic conductivity of a ZrO2 thin film as an oxygen sensor. Thin Solid Films 330, 59 1998

    Article  CAS  Google Scholar 

  12. Z.W. Zhao, B.K. Tay, L. Huang G.Q. Yu: Study of the structure and optical properties of nanocrystalline zirconium oxide thin films deposited at low temperatures. J. Phys. D Appl. Phys. 37, 1701 2004

    Article  CAS  Google Scholar 

  13. J. Ciosek, W. Paszkowicz, P. Pankowski, J. Firak, U. Stanislawek Z. Patron: Modification of zirconium oxide film microstructure during post-deposition annealing. Vacuum 72, 135 2004

    Article  CAS  Google Scholar 

  14. H.J. Qi, L.H. Huang, Z.S. Tang, C.F. Cheng, J.D. Shao Z.X. Fan: Roughness evolution of ZrO2 thin films grown by reactive ion beam sputtering. Thin Solid Films 444, 146 2003

    Article  CAS  Google Scholar 

  15. H. Li, K. Liang, S. Gu G. Xiao: Oriented nano-structured ZrO2 thin films on fused quartz substrate by sol-gel process. J. Mater. Sci. Lett. 20, 1301 2001

    Article  CAS  Google Scholar 

  16. S-Y. Bae, H-S. Choi, S-Y. Choi Y-J. Oh: Sol-gel processing for epitaxial growth of ZrO2 thin films on Si(100) wafers. Ceram. Int. 26, 213 2000

    Article  CAS  Google Scholar 

  17. H. Niederwald, S. Laux, M. Kennedy, U. Schallenberg, A. Duparre, M. Mertin, N. Kaiser D. Ristau: Ion-assisted deposition of oxide materials at room temperature by use of different ion sources. Appl. Opt. 38, 3610 1999

    Article  CAS  Google Scholar 

  18. H. Yamamura, Y. Iwata C. Matsuno: Synthesis of highly oriented zirconia film by sol-gel method. J. Ceram. Soc. Jpn. 105, 918 1997

    Article  CAS  Google Scholar 

  19. K. Harada, H. Nakanishi, H. Itozaki S. Yazu: Growth of buffer layers on Si substrate for high-Tc superconducting thin films. Jpn. J. Appl. Phys. 30, 934 1991

    Article  CAS  Google Scholar 

  20. J.J. Yu, J-Y. Zhang I.W. Boyd: Formation of stable zirconium oxide on silicon by photo-assisted sol-gel processing. Appl. Surf. Sci. 186, 190 2002

    Article  CAS  Google Scholar 

  21. J.J. Yu, Q. Fang, J-Y. Zhang, Z.M. Wang I.W. Boyd: Hafnium oxide layers derived by photo-assisted sol-gel processing. Appl. Surf. Sci. 208–209, 676 2003

    Article  CAS  Google Scholar 

  22. A. Watanabe, T. Tsuchiya Y. Imai: Crystal structure of zirconium oxide deposoted as thin films from Zr-acetylacetonate and Zr-ter-butoxide by laser chemical vapor deposition technique. Jpn. J. Appl. Phys. 40, 4051 2001

    Article  CAS  Google Scholar 

  23. T. Hayashi, D. Togawa, M. Yamada, W. Sakamoto S. Hirano: Preparation and properties of Bi4−xLaxTi3O12 ferroelectric thin films using excimer UV irradiation. Jpn. J. Appl. Phys. 41, 6914 2002

    Google Scholar 

  24. T. Hayashi, N. Iizawa, D. Togawa, M. Yamada, W. Sakamoto, K. Kikuta S. Hirano: Excimer UV processing of (Bi, Nd)4Ti3O12 ferroelectric thin films by chemical solution deposition method. Jpn. J. Appl. Phys. 42, 5981 2003

    Article  CAS  Google Scholar 

  25. N. Asakuma, T. Fukui, M. Toki, K. Awazu H. Imai: Photoinduced hydroxylation at ZnO surface. Thin Solid Films 445, 284 2003

    Article  CAS  Google Scholar 

  26. K. Sato, K. Kikuta, Y. Iwamoto S. Hirano: Effect of UV-irradiation on processing of lead titanate thin film derived from photoreactive [Pb-Ti] precursor modified with alkanolamine. J. Ceram. Soc. Jpn. 108, 998 2000 in Japanese

    Article  CAS  Google Scholar 

  27. K. Nishizawa, T. Miki, K. Suzuki K. Kato: Novel chemical processing for crystallization of SrBi2Ta2O9 thin films via UV irradiation. Mater. Lett. 52, 20 2002

    Article  CAS  Google Scholar 

  28. K. Nishizawa, T. Miki, K. Suzuki K. Kato: Control of crystallization and crystal orientation of alkoxy-derived SrBi2Ta2O9 thin films by ultraviolet irradiation. J. Mater. Res. 18, 899 2003

    Article  CAS  Google Scholar 

  29. K. Nishizawa, T. Miki, K. Suzuki K. Kato: Wavelength dependence of crystallization of alkoxy-derived ZrO2 thin films prepared by ultraviolet irradiation. J. Mater. Res. 20, 3133 2005

    Article  CAS  Google Scholar 

  30. K. Nishizawa, T. Miki, K. Suzuki K. Kato: Photo-assisted crystallization of zirconia thin films and their electrical evaluation. Thin Solid Films 515, 4004 2007

    Article  CAS  Google Scholar 

  31. J.P. Holgado, J.P. Espinos, F. Yubero, A. Justo, M. Ocana, J. Benitez A.R. Gonzalez-Elipe: Ar stabilization of the cubic/tetragonal phases of ZrO2 in thin films prepared by ion beam induced chemical vapour deposition. Thin Solid Films 389, 34 2001

    Article  CAS  Google Scholar 

  32. N. Higashi, Y. Murakami, H. Machida, S. Seki, Y. Sawada H. Funakubo: New control method for low-temperature deposition limit of metal-organic chemical vapor deposition (MOCVD) by the introduction of organic vapor-application to ZrO2 film preparation. Thin Solid Films 409, 23 2002

    Article  CAS  Google Scholar 

  33. S. Wang, G. Xia, X. Fu, H. He, J. Shao Z. Fan: Preparation and characterization of nanostructured ZrO2 thin films by glancing angle deposition. Thin Solid Films 515, 3352 2007

    Article  CAS  Google Scholar 

  34. M. Atik, P. L. de Neto, L.A. Avaca M.A. Aegerter: Sol-gel thin films for corrosion protection. Ceram. Int. 21, 403 1995

    Article  CAS  Google Scholar 

  35. G. Ehrhart, B. Capoen, O. Robbe, P. Boy, S. Turrell M. Bouazaoui: Structural and optical properties of n-propoxide sol-gel derived ZrO2 thin films. Thin Solid Films 496, 227 2006

    Article  CAS  Google Scholar 

  36. H.C. You, F.H. Ko T.F. Lei: Physical characterization and electrical properties of sol-gel-derived zirconia films. J. Electrochem. Soc. 153, F94 2006

    Article  CAS  Google Scholar 

  37. N. Tohge, K. Yamada N. Noma: Selective coloration of photosensitive ZrO2 gel films. J. Ceram. Soc. Jpn. 109, 359 2001

    Article  CAS  Google Scholar 

  38. N. Tohge, M. Hasegawa, N. Noma, K. Kintaka J. Nishii: Fabrication of two-dimensional gratings using photosensitive gel films and their characterization. J. Sol.-Gel Sci. Technol. 26, 903 2003

    Article  CAS  Google Scholar 

  39. N. Noma, S. Yamazaki N. Tohge: Preparation of new photosensitive ZrO2 gel films using hydroxyl-substituted aromatic ketones as chemical modification reagents and their patterning. J. Sol.-Gel Sci. Technol. 31, 253 2004

    Article  CAS  Google Scholar 

  40. K. Kikuta, K. Takagi S. Hirano: Photoreaction of titanium-based metal-organic compounds for ceramic fine patterning. J. Am. Ceram. Soc. 82, 1569 1999

    Article  CAS  Google Scholar 

  41. K. Kikuta, K. Suzumori, K. Takagi S. Hirano: Patterning of tin oxide film from photoreactive precursor solutions prepared via the addition of N-phenyldiethanolamine. J. Am. Ceram. Soc. 82, 2263 1999

    Article  CAS  Google Scholar 

  42. K. Shinmou, N. Tohge T. Minami: Fine-patterning of ZrO2 thin films by the photolysis of chemically modified gel films. Jpn. J. Appl. Phys. 33, L1181 1994

    Article  CAS  Google Scholar 

  43. N. Tohge, G. Zhao F. Chiba: Photosensitive gel films prepared by the chemical modification and their application to surface-relief gratings. Thin Solid Films 351, 85 1999

    Article  CAS  Google Scholar 

Download references

Author information

Authors and Affiliations

  1. National Institute of Advanced Industrial Science and Technology (AIST), Shimoshidami, Moriyama-ku, Nagoya, 463-8560, Japan

    Kaori Nishizawa, Takeshi Miki, Kazuyuki Suzuki & Kazumi Kato

Authors
  1. Kaori Nishizawa
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Takeshi Miki
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Kazuyuki Suzuki
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Kazumi Kato
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Kaori Nishizawa.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Nishizawa, K., Miki, T., Suzuki, K. et al. Photo-assisted crystallization of zirconia thin films prepared using chelate compounds. Journal of Materials Research 22, 2608–2616 (2007). https://doi.org/10.1557/jmr.2007.0335

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1557/jmr.2007.0335

Search

Navigation