Abstract
Metal Ir films were prepared by spray chemical vapor deposition (CVD) in air from an Ir precursor, (1,3-cyclohexadiene)(ethylcyclopentadienyl)iridium, Ir(EtCp)(CHD). Film deposition was ascertained at 270–430°C on a SiO2/Si substrate and the deposition rate increased with the deposition temperature but was saturated above 330°C. The obtained films consisted of Ir metal without any iridium oxide impurity irrespective of the deposition temperature. Films tended to orient to (111) with increasing deposition temperature. Resistivity of these Ir films decreased with increasing film thickness and reached to values on the order of 10−6 Ω・cm, which was the same order of the values for bulk Ir metal. Good step coverage was observed for the Ir metal films deposited at 270°C and 330°C. This shows that the simple spray CVD process in air is a good candidate for depositing Ir metal films with good conductivity and step coverage.
Similar content being viewed by others
References
K. Kawano, T. Furukawa, M. Takamori, K. Tada, T. Yamakawa, N. Oshima, H. Fujisawa and M. Shimizu, Mater. Rec. Soc. Symp. Proc., 784, C3.30.1–6 (2004).
H. Fuijisawa, S. Watari, N. Iwamoto, M. Shimizu, T. Furukawa, K. Kawano and N. Oshima, Jpn. J. Appl. Phys., 45, 7354–7359 (2006).
Y. Sawada, C. Kobayashi, S. Seki, and H. Funakubo, Thin Solid Films, 409, 46–50 (2002).
T. Kondo, H. Funakubo, K. Akiyama, H. Enta, Y. Seki, M.H. Wang, T. Uchida, Y. Sawada, J. Crystal Growth, 311, 642–646 (2009).
T. Kondo, Y. Sawada, H. Funakubo, K. Akiyama, T. Kiguchi, M. Wang, and T. Uchida, Electrochem. Solid-State Lett., 12, D42–D44 (2009).
T. Kondo, Y. Sawada, K. Akiyama, H. Funakubo, T. Kiguchi, S. Seki, M.H. Wang, T. Uchida, Thin Solid Films, 516, 5864–5867 (2008).
T. Kondo, T. Aoyama, T Uchida, Y. Seki, K. Ninomiya, A. Iwasa, C. Konayashi, S. Seki, H. Enta, H. Funakubo, R. Ozao, T. Shishido, Y. Sawada, J. Flux Growth, 3, 14–17 (2008.)
T. Kondo, H. Funakubo, K. Akiyama, M. Wang, T. Uchida and Y. Sawada, Tran. Mater. Res. Soc. Jpn., 33, 1363–1366 (2008).
A. Jones, H. Aspinall, P. Chalker, R. Potter, T. Manning, Y. Loo, R. O’Kane, J. Gaskell, and L. Smith, Chem. Vap. Depo., 12, 83–98 (2006)
CRC Handbook of Chemistry and Physics, ed. Lide D. R. (CRC Press, Boca Raton, 1991) 72nd ed., p. 12–35.
H. Chiba, M. Hirano, K. Kawano, N. Oshima and H. Funakubo, J. Ceram. Soc. Jpn., 124, 694–696 (2016).
H. Fujisawa, S. Watari, N. Iwamoto, M. Shimizu, T. Furukawa, K. Kawano, and N. Oshima, Jpn. J. Appl. Phys., 45, 7354–7359 (2006).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Seki, Y., Sawada, Y., Funakubo, H. et al. Preparation of iridium metal films by spray chemical vapor deposition. MRS Advances 5, 1681–1685 (2020). https://doi.org/10.1557/adv.2020.99
Published:
Issue Date:
DOI: https://doi.org/10.1557/adv.2020.99