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Vanadium Oxide Thin Film by Aqueous Spray Deposition

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Abstract

Vanadium Oxide has application to infrared bolometers due to high temperature coefficient of resistivity (TCR). It has attracted interest for switchable plasmonic devices due to its metal to insulator transition near room temperature. We report here the properties of vanadium oxide deposited by an aqueous spray process. The films have a ropy surface morphology with ∼70 nm surface roughness. The polycrystalline phase depends on annealing conditions. The films have TCR of ∼2%/deg, which compares well with sputtered films. Only weak evidence is found for an insulator-metal phase transition in these films.

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Authors and Affiliations

  1. Physics Department, University of Central Florida, Orlando, FL, United States

    Seth Calhoun, Rachel Evans, Cameron Nickle, Sayan Chandra, Debashis Chanda & Robert E. Peale

  2. SISOM Thin Films LLC, 1209 W. Gore St, Orlando, FL, 32805, United States

    Isaiah O. Oladeji

  3. Air Force Research Laboratory, Sensors Directorate, Wright-Patterson AFB, OH, United States

    Justin Cleary & Evan M. Smith

Authors
  1. Seth Calhoun
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  2. Rachel Evans
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  3. Cameron Nickle
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  4. Isaiah O. Oladeji
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  5. Justin Cleary
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  6. Evan M. Smith
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  7. Sayan Chandra
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  8. Debashis Chanda
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  9. Robert E. Peale
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Calhoun, S., Evans, R., Nickle, C. et al. Vanadium Oxide Thin Film by Aqueous Spray Deposition. MRS Advances 3, 2777–2782 (2018). https://doi.org/10.1557/adv.2018.512

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  • DOI: https://doi.org/10.1557/adv.2018.512

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