Abstract
Characterization of three vendor’s bulk semi-insulating GaN:Fe wafers, grown by either hydride vapor phase epitaxy or the ammonothermal method, was performed using: scanning electron microscopy, secondary ion mass spectroscopy, high resolution X-ray diffraction, cathodoluminescence, photoluminescence, and high voltage testing. Although the Fe doping level is significantly different for each growth method, both are promising for the fabrication of PCSS devices operating in the lock-on mode.
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J. H. Leach, R. Metzger, E. A. Preble, and K. R. Evans, Proc. SPIE 8625, 86251Z-1 (2014)
D. Mauch, J. Dickens, V. Kuryatkov, V. Meyers, R. Ness, S. Nikishin, and A. Neuber. Proc. Pulsed Power Conf. (PPC), 20th IEEE, June 2015.
V. Meyers, D. Mauch, J. Mankowski, J. Dickens, and A. Neuber. Proc. Pulsed Power Conf. (PPC), 20th IEEE, June 2015.
S. Heikman, S. Keller, S. P. DenBaars, and U. K. Mishra, Appl. Phys. Lett., 81, 439 (2002).
Z. H. Feng, B. Liu, F. P. Yuan, J. Y. Yin, D. Liang, X. B. Li, Z. Feng, K. W. Yang, S. J. Cai, 309, J. Cryst. Growth 309, 8 (2007).
O. Lopatiuk, A. Osinsky, A. Dabiran, K. Gartsman, I. Feldman, and L. Chernyak, Solid-State Electron. 49, 1662 (2005).
T. Kashiwagi, S. Sonoda, H. Yashiro, Y. Ishihara, A. Usui, Y. Akasaka, and M. Hagiwara, Jpn. J. Appl. Phys., Part 1 46, 581 (2007).
M. Kubota, T. Onuma, Y. Ishihara, A. Usui, A. Uedono, and S. F. Chichibu, J. Appl. Phys., 105, 083542 (2009).
F. Lipski, Annual Report 2010, Institute of Optoelectronics, Ulm University, pp.63–70 (2010).
R. Dwilinski, A. Wysmolek, J. Baranowski, M. Kaminska, R. Doradzinski, J. Garczynski, L. Sierzputowski, and H. Jacobs, Acta Physica Polonica A, 88, 833 (1995).
T. Hashimoto, K. Fujito, F. Wu, B. A. Haskell, P. T. Fini, J. S. Speck and S. Nakamura, Jpn. J. Appl. Phys. 44, L 797 (2005).
M. Callahan, B. G. Wang, K. Rakes, D. Bliss, L. Bouthillette, M. Suscavage, and S. Q. Wang: J. Mater. Sci. 41 1399 (2006).
R. Dwilinski, R. Doradzinski, J. Garczynski, L. P. Sierzputowski, A. Puchalski, Y. Kanbara, K. Yagi, H. Minakuchi, and H. Hayashi, J. Cryst. Growth 310, 391 (2008).
T. M. M. Richter and R Niewa, Inorganics 2, 29 (2014).
R. Chierchia, T. Böttcher, H. Heinke, S. Einfeldt, S. Figge, and D. Hommel, J. Appl. Phys. 93, 8918 (2003).
T. Metzger, R. Höpler, E. Born, O. Ambacher, M. Stutzmann, R. Stömmer, M. Schuster, H. Göbel, S. Christiansen, M. Albrecht, and H. P. Strunk, Philos. Mag. A 77, 1013 (1998).
V. M. Kaganer, O. Brandt, A. Trampert, and K. H. Ploog, Phys. Rev. B 72, 045423 (2005).
Secondary Ion Mass Spectrometry: A Practical Handbook for Depth Profiling and Bulk Impurity Analysis, 1st Edition., by R.G. Wilson, F. A. Stevie, C. W. Magee, Wiley-Interscience (1989).
D. O. Demchenko, I. C. Diallo, and M. A. Reshchikov, J. Appl. Phys. 119, 035702 (2016).
M. Godlewski, H. Przybylinska, R. Bozek, E. M. Goldys, J. P. Bergman, B. Monemar, I. Grzegory, and S. Porowski, Phys. Stat. Sol (a) 201, 216 (2004).
M. A. Reshchikov, J. D. McNamara, M. Toporkov, V. Avrutin, H. Morkoç, A. Usikov, H. Helava, and Yu. Makarov, Sci. Rep 6, 37511 (2016).
M. Kubota, T. Onuma, Y. Ishihara, A. Usui, A. Uedono, and S. F. Chichibu, J. Appl. Phys. 105, 083542 (2009).
D. C. Look, J. H. Leach, and R. Metzger, J. Appl. Phys., 121, 065702 (2017).
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Gaddy, M., Kuryatkov, V., Meyers, V. et al. Structural, Morphological, Optical and Electrical Properties of Bulk (0001) GaN:Fe Wafers. MRS Advances 3, 179–184 (2018). https://doi.org/10.1557/adv.2018.234
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DOI: https://doi.org/10.1557/adv.2018.234