This is a preview of subscription content, log in via an institution to check access.
References
T. Urisu and H. Kyuragi, J. Vac. Sci. Technol. B 5 (1987) p. 1436.
Y. Utsumi, J. Takahashi, and T. Urisu, J. Vac. Sci. Technol. B 9 (1991) p. 2507.
B. Li, I. Twesten and N. Schwentner, Appl. Phys. A 57 (1993) p. 457.
S. Terakada, T. Goto, M. Ogura, K. Kaneda, O. Kitamura, S. Suzuki and K. Tanaka, Appl. Phys. Lett. 64 (1994) p. 1659.
V.M. Bermudez and S.M. Prokes, Surf. Sci. 248 (1991) p. 201.
A. Yoshigoe, K. Mase, Y. Tsusaka, T. Urisu, Y. Kobayashi and T. Ogino, Appl. Pliys. Lett. 67 (1995) p. 2364.
Y. Zhang, S. Sato, H. Ohshima, T. Hattori, and T. Urisu, Appl. Surf. Sci. 78/79 (1994) p. 422.
Y.J. Chabal and K. Raghavachari, Phys. Rev. Lett. 53 (1984) p. 282.
S. Mantl, Material Science Reports 8 (1992).
D.E. Ramaker, J. Vac. Sci. Technol. A 1 (1983) p. 1137.
Rights and permissions
About this article
Cite this article
Urisu, T. Infrared Reflection Absorption Spectroscopy of Selective Etching and Decomposition Stimulated by Synchrotron Radiation. MRS Bulletin 24, 46–48 (1999). https://doi.org/10.1557/S0883769400051733
Published:
Issue Date:
DOI: https://doi.org/10.1557/S0883769400051733