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Molecular Beam Epitaxy from Research to Manufacturing

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Abstract

The following is an edited transcript of the address that Von Hippel Award recipient A.Y. Cho gave at the 1994 MRS Fall Meeting. Cho received the Materials Research Society’s highest honor “for pioneering work in the development of molecular beam epitaxy (MBE), and its application to devices based on quantum wells and artificially structured materials.”

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References

  1. A.Y. Cho, Appl. Phys. Lett. 19 (1971) p. 467.

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  2. J.P. Lee and A.Y. Cho, Appl. Phys. Lett. 29 (1976) p. 164.

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  3. D.C. Tsui, H.L. Stormer, and A.C. Gossard, Phys. Rev. Lett. 48 (1982) p. 1559.

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  4. J. Faist, F. Capasso, D.L. Sivco, C. Sirtori, A.L. Hutchinson, and A.Y. Cho, Science 264 (1994) p. 553.

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Authors and Affiliations

  1. Semiconductor Research AT&T Bell Laboratories, Room 6H-422 600 Mountain Avenue, Murray Hill, NJ, 07974-0636, USA

    A. Y. Cho (Director)

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  1. A. Y. Cho
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Cho, A.Y. Molecular Beam Epitaxy from Research to Manufacturing. MRS Bulletin 20, 21–28 (1995). https://doi.org/10.1557/S0883769400044638

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  • DOI: https://doi.org/10.1557/S0883769400044638

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