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Subsurface Processing of Electronic Materials Assisted by Atomic Displacements

  • Ion-Assisted Processing of Electronic Materials
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Conclusions

This article has reviewed some of the consequences and applications of subsurface atomic displacements in the processing of electronic materials. Under appropriate irradiation conditions, defect production and subsequent migration, agglomeration, and annihilation processes can control amorphization, crystallization, removal of pre-existing defects, superlattice disordering, diffusion, mixing, and phase formation. Despite extensive studies of such processes in recent years, it is somewhat surprising that the controlling defects and their interactions are not well understood. The continued application of MeV irradiation schemes, where the energy deposition density is more uniform with depth, may assist in such a pursuit.

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Williams, J.S. Subsurface Processing of Electronic Materials Assisted by Atomic Displacements. MRS Bulletin 17, 47–51 (1992). https://doi.org/10.1557/S0883769400041464

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