References
W.C. Omara, Liquid Crystal Displays; Manufacturing Science and Technology (Van Nostrand and Reinhold, New York, 1993).
H. Ohshima and S. Morozumi, IEEE IEDM (1989) p. 157.
H. Ohshima, Conf. Record 1994 Int. Display Conf. (1994) p. 26.
L.L. Kazmerski, Polysilicon and Amorphous Thin Film Devices (Academic, New York, 1980).
T.I. Kamins, Polycrystalline Silicon for Integrated Circuit Applications (Kluwer Academic, Boston, 1988).
C.H. Seager and D.S. Ginley, Appl. Phys. Lett. 34 (1979) p. 337.
S. Seki, O. Kogure, and B. Tsujiyama, IEEE Electron Device Lett. EDL-8 (1987) p. 434.
N. Yamauchi and R. Reif, J. Appl. Phys. 75 (1994) p. 3235.
T. Noguchi, Jpn. J. Appl. Phys. 32 (1993) p. L1585.
R.B. Iverson, in Extended Abstracts of the Materials Research Society Conference (1988) p. 173.
H. Kumomi, T. Yonehara, and T. Noma, Appl. Phys. Lett. 59 (1991) p. 3565.
H.J. Kim and J.S. Im, in Microcrystalline and Nanocrystalline Semiconductors, edited by L. Brus, M. Hirose, R.W. Collins, F. Koch, and C.C. Tsai (Mater. Res. Soc. Symp. Proc. 358, Pittsburgh, 1995) p. 903.
J.S. Im, The First TFT LCD International Workshop Proceedings (1995) p. 358.
H.W. Lam and M.J. Thompson, Comparison of Thin- Film Transistor and SOI Technologies, (Mat. Res. Soc. Symp. Proc.) 33 (North-Holland), 1984).
A. Chiang, M.W. Geis, and L. Peiffer, in Semiconductor-on-Insulator and Thin-Film-Transistor Technology (Mater. Res. Soc. Symp. Proc. 53, Pittsburgh), 1986).
S. Furukawa, ed., Silicon-On-Insulator: Its Technology and Applications (KTK Scientific Publishers, Tokyo, 1985).
D. Turnbull, in Beam-Solid Interactions and Phase Transformations (Mater. Res. Soc. Symp. Proc. 51, Pittsburgh), 1985) p. 71.
J.M. Poate, (Mat. Res. Soc. Symp. Proc. 13, Pittsburgh, 1983) p. 263.
S.R. Elliot, Physics of Amorphous Materials (John Wiley & Sons, New York, 1990).
U. Koster, Phys. Status Solidi A 48 (1978) p. 313.
R. Kakkad, J. Smith, W.S. Lau, S.J. Fonash, and R. Kerns, J. Appl. Phys. 69 (1989) p. 2069.
R.B. Iverson and R. Reif, J. Appl. Phys. 62 (1987) p. 1675.
J.W. Christian, The Theory of Transformation in Metals and Alloys, 2nd ed. (Pergamon, Oxford, 1975).
J.L. Batstone, Phil. Mag. A 67 (1993) p. 51.
E.P. Donovan, F. Spaepen, D. Turnbull, J.M. Poate, and D.C. Jacobson, Appl. Phys. Lett. 42 (1983) p. 698.
K.F. Kelton, A.L. Greer, and C.V. Thompson, J. Chem. Phys. 79 (1983) p. 6261.
P.F. James, Nucleation and Crystallization in Glasses, edited by J.H. Simmons, D.R. Uhlmann, and G.H. Beall (Columbus), 1982).
M.K. Hatalis and D.W. Greve, J. Appl. Phys. 63 (1988) p. 2260.
K. Nakazawa, J. Appl. Phys. (1991) p. 1703.
C.H. Hong, C.Y. Park, and H-K. Kim, J. Appl. Phys. 71 (1992) p. 5427.
J.S. Im and H.A. Atwater, Appl. Phys. Lett. 57 (1990) p. 1766.
W.L. Brown, R.G. Elliman, R.V. Knoell, A. Leiberich, J. Linnros, D.M. Maher, and J.S. Williams, in Microscopy of Semiconductor Materials, edited by A.G. Cullis (Institute of Physics, London, 1987) p. 61.
C. Spinella, S. Lombardo, and S.U. Campisano, Appl. Phys. Lett. 55 (1989) p. 109.
J.S. Im, J.H. Shin, and H.A. Atwater, Appl. Phys. Lett. 59 (1991) p. 2314.
E. Nygren, A.P. Pogany, K.T. Short, and J.S. Williams, R.G. Elliman, and J.M. PoateAppl. Phys. Lett. 52 (1988) p. 439.
C. Hayzeldon, J.L. Batstone, and R.C. Cammarata, Appl. Phys. Lett. 60 (1992) p. 225.
G. Liu and S.J. Fonash, Appl. Phys. Lett. 62 (1993) p. 2554.
S.W. Lee, Y.C. Jeon, and S.K. Joo, Appl. Phys. Lett. 66 (1995) p. 1671.
I.W. Wu, W.Y. Huang, W.B. Jackson, A.G. Lewis, and A. Chiang, IEEE, Elect. Dev. Lett. 12 (1991) p. 181.
D.M. Moffatt, in Flat Panel Display Materials, edited by J. Batey, A. Chiang, and P.H. Holloway (Mater. Res. Soc. Symp. Proc. 345, Pittsburgh), 1994) p. 163.
J.H. Song and J.S. Im, in Crystallization and Related Phenomena in Amorphous Materials, edited by M. Libera, T.E. Haynes, P. Cebe, and J.E. Dickinson Jr. (Mater. Res. Soc. Symp. Proc. 321, Pittsburgh), 1994) p. 307.
C.W. Hwang, M.K. Ryu, K.B. Kim, S.C. Lee, and C.S. Kim, J. Appl. Phys. 77 (1995) p. 3042.
T.J. King, J.R. Pfeister, J.D. Shott, J.P. McVittie, K.C. Saraswat, IEEE DM (1990) p. 253.
T. Sameshima and S. Usui, in Materials Issues in Silicon Integrated Circuit Processing (Mater. Res. Soc. Symp. Proc. 71, Pittsburgh), 1986) p. 435.
K. Sera, F. Okumura, H. Uchida, S. Itoh, S. Kaneko, and K. Hotta, IEEE Trans. Electron Dev. 36 (1989) p. 2868.
R. Z. Bachrach, K. Winer, J.B. Boyce, S.E. Ready, R.I. Johnson, and G.B. Anderson, J. Electron. Mater. 19 (1990) p. 241.
H. Kuriyama, S. Kiyama, S. Noguchi, T. Kuwahara, S. Ishida, T. Nohda, K. Sano, H. Iwata, S. Tsuda, and S. Nakano, IEEE IEDM (1991) p. 1.
K. Shimizu, H. Horoya, O. Sugiura, and M. Matsumura, Jpn. J. Appl. Phys. 30 (1991) p. 3704.
S.D. Brotherton, D.J. McCulloch, J.B. Clegg, and J.P. Gowers, IEEE Trans. Elect. Dev. 40 (1993) p. 407.
J.M. Poate and J.W. Mayer, Laser Annealing of Semiconductors (Academic, New York, 1982).
G.L. Olson and J.A. Roth, Materials Science Reports (Amsterdam), North-Holland, 1988).
J.H. Perepezko, J. Non-Cryst. Solids 156 (1993) p. 463.
J.S. Im, H.J. Kim, and M.O. Thompson, Appl. Phys. Lett. 63 (1993) p. 1969.
S.R. Stiffler, M.O. Thompson, and P.S. Peercy, Phys. Rev. Lett. 60 (1988) p. 2519.
J.S. Im and H.J. Kim, Appl. Phys. Lett. 64 (1994) p. 2303.
T. Sameshima and S. Usui, Appl. Phys. Lett. 59 (1991) p. 2724.
T. Eiumchotchawalit and J.S. Im, in Crystallization and Related Phenomena in Amorphous Materials (Mater. Res. Soc. Symp. Proc. 321, Pittsburgh), 1994) p. 725.
R.I. Johnson, G.B. Anderson, J.B. Boyce, D.K. Fork, P. Mei, S.E. Ready, and S. Chen, in Amorphous Silicon Technology—1993 (Mater. Res. Soc. Symp. Proc. 297, Pittsburgh), 1993) p. 533.
H.J. Kim and J.S. Im, in Amorphous Silicon Technology—1993 (Mater. Res. Soc. Symp. Proc. 297, Pittsburgh), 1993, 321, Pittsburgh, 1994) p. 665.
H. Kuriyama, K. Sano, S. Ishida, T. Nohda, Y. Aya, T. Kuwahara, S. Noguchi, S. Kiyama, S. Tsuda, and S. Nakano, in Amorphous Silicon Technology—1993 (Mater. Res. Soc. Symp. Proc. 297, Pittsburgh), 1993) p. 657.
R.W. Cahn, Physical Metallurgy (North-Holland, Amsterdam, 1970).
C.V. Thompson, J. Appl. Phys. 58 (1985) p. 763.
M. Simile, Information Display 11 (1995) p. 18.
E.I. Givargizov, Oriented Crystallization on Amorphous Substrates (Plenum Press, New York, 1991).
Rights and permissions
About this article
Cite this article
Im, J.S., Sposili, R.S. Crystalline Si Films for Integrated Active-Matrix Liquid-Crystal Displays. MRS Bulletin 21, 39–48 (1996). https://doi.org/10.1557/S0883769400036125
Published:
Issue Date:
DOI: https://doi.org/10.1557/S0883769400036125