Abstract
Temperature programmed desorption (TPD) was performed on deuterated GaN(0001) surfaces which had been exposed to various doses of 90-eV electrons. TPD of the deuterated surface without electron exposure shows a broad D2 desorption feature with a peak desorption temperature at ∼400 °C. Electron exposure results in a decrease in intensity of the desorption peak which is attributed to removal of surface deuterium by electron stimulated desorption (ESD). This removal of deuterium by ESD produces no change in the peak desorption temperature indicating that recombinative desorption is first order in deuterium coverage.
Similar content being viewed by others
References
R. F. Davis, Proc. IEEE 79, 702 (1991).
S. Strite and H. Morkoc, J. Vac. Sci. Technol. B 10, 1237 (1992).
S. N. Mohammad, A. Salvador, and H. Morkoc, Proc. IEEE 83, 1306 (1995).
Z. Yu, S. L. Buczkowiski, N. C. Gilies, T. H. Myers and M. R. Richards-Babb, Appl. Phys. Lett. 69, 2371 (1996).
Y. Okamoto,S. Hashiguchi, Y. Okada and M. Kawabe, Jpn. J. Appl. Phys., 38, L230 (1990).
D. D. Koleske, A. E. Wickenden, R. L. Henry, M. E. Twigg, J. C. Culbertson and R. J. Gorman, Appl. Phys. Lett. 73, 2018 (1996).
J. Han, T.-B. Ng, R. M. Biefeld, M. H. Crawford and D. M. Follstaedt, Appl. Phys. Lett. 71, 3114 (1997).
E. L. Piner, M. K. Behbehani, N. A. El-Masry, J. C. Roberts, F. G. McIntosh and S. M. Bedair, Appl. Phys Lett. 71, 2023 (1997).
Randy J. Shul in Processing of Wide Band Gap Semiconductors, 263, edited by S. J. Pearton and J. W. Lee (Noyes Publications, New York, 2000), p.263.
S. J. Pearton, C. R. Abernathy, F. Ren, J. R. Lothian, P. Wisk, A. Katz and C. Constantine, Semicond. Sci. Technol. 8, 310 (1993).
S. J. Pearton and J. W. Lee, in Semiconductors and Semimetals, Vol. 61, edited by N. H. Nickel, (Academic Press, San Diego, 1999), p. 471.
S. Nakamura, N. Twasa, M. Senoh and T. Mukai, Jpn. J. Appl. Phys. 31, 1258 (1992).
T. D. Moustaks and R. Molnar, Mater. Res, Soc. Symp. Proc. 281, 753 (1993).
S. Nakamura, T. Mukai, M. Senoh and N. Iwasa, Jpn. J. Appl. Phys. 31, L139 (1992).
W. Götz, N. M. Johnson, D. P. Bour, M. D. McCluskey and E. E. Haller, Appl. Phys. Lett. 69, 3725 (1996).
B. Clerjaud, D. Côte, A. Lebkiri, C. Naud, J. M. Baranowski, K. Pakula, D. Wasik and T. Suski , Phys. Rev. B 61, 8238-8241 (2000).
Y. Okamato, M. Saito and A. Oshiyama, Jpn. J. Appl. Phys., 35, L807 (1996).
J. Neugerbauer and C. G. Van de Walle, Phys. Rev. Lett. 75, 4452 (1995).
S. Limpijumnong, J. E. Northrup and C. G. Van de Walle, Phys. Rev. Lett., 87, 205505 (2001).
A. F. Wright, J. Appl. Phys., 90, 1164 (2001).
A. F. Wright, J. Appl. Phys., 90, 6526 (2001).
C.-M. Chiang, S. M. Gates, A. Bensaoula and J. A. Schultz, Chem. Phys. Lett. 246, 275 (1995).
R. Shekhar and K. Jensen, Surf. Sci. Lett. 381, L581 (1997).
M. E. Bartram and J. R. Creighton, MRS Internet J. Nitride Semicond. Res. 4S1, G3.68 (1999).
V. J. Bellitto, B. D. Thoms, D. D. Koleske, A. E. Wickenden and R. L. Henry, Surf. Sci. 430, 80 (1999).
V. J. Bellitto, B. D. Thoms, D. D. Koleske, A. E. Wickenden and R. L. Henry, Phys. Rev. B 60, 4816 (1999).
V. J. Bellitto, Y. Yang, B. D. Thoms, D. D. Koleske, A. E. Wickenden, R. L. Henry, Surf. Sci. Lett. 442, L1019 (1999).
V. J. Bellitto, B. D. Thoms, D. D. Koleske, A. E. Wickenden, R. L. Henry, Phys. Rev. B 60, 4821 (1999).
Y. Yang, J. Lee, B. D. Thoms, D. D. Koleske and R. Henry, Mater. Res. Soc. Symp. Proc., Vol. 693, I6.48.1.
H. P. Gillis, D. A. Choutov, K. P. Martin, S. J. Pearton, and C. R. Abernathy, J. Electrochem. Soc. 143 (1996) L251.
R. Shul et al., Appl. Phys. Lett. 66 (1995) 1761.
A. T. Ping and I. Adesida, Appl. Phys. Lett. 67 (1995) 1250.
S. J. Pearton, Mat. Sci. and Engineering. B 44(1997) 1, and references therein.
R. S. Becker, G. S. Higashi, Y. J. Chabal, and A. J. Becker, Phys. Rev. Lett. 65 (1990) 1917.
J. J. Boland, Surf. Sci. 261 (1992) 17.
J. W. Lyding, T. -C. Shen, J. S. Hubacek, J. R. Tucker, and G. C. Abeln, Appl. Phys. Lett. 64 (1994) 15.
N. Kramer, H. Birk, J. Jorritsma, and C. Schönenberger, Appl. Phys. Lett. 66 (1995) 1325.
T. Mitsui, E. Hill, and E. Ganz, J. Appl. Phys. 85 (1999) 522.
V. M. Bermudez, D. D. Koleske, and A. E. Wickenden, Appl. Surf. Sci. 126, 69 (1998).
A. E. Wickenden, D. K. Gaskill, D. D. Koleske, K. Doverspike, S. D. Simons, and P. H. Chi, Res. Mat. Soc. Symp. Proc. 395, 679 (1996).
J.-L. Lin and J. T. Yates, Jr., J. Vac. Sci. Technol. A, 12(5), 2795 (1994).
P. A. Redhead, Can. J. Phys. 42, 886 (1964).
V. M. Bermudez, J. Appl. Phys. 80, 1190 (1996).
C. G. Olson, D. W. Lynch, and A. Zehe, Phys. Rev. B 24, 4629 (1981).
A. Berger, D. Troost, and W. Mönch, Vacuum 41, 671 (1990).
D. Troost, H.-U. Baier, A. Berger, and W. Mönch, Surf. Sci. 242, 324 (1991).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Yang, Y., Lee, J. & Thoms, B.D. Electron Stimulated Desorption of Deuterium from GaN (0001) Surface. MRS Online Proceedings Library 743, 1130 (2002). https://doi.org/10.1557/PROC-743-L11.30
Published:
DOI: https://doi.org/10.1557/PROC-743-L11.30