Skip to main content
SpringerLink
Log in

Enhanced Low-Temperature Crystallization of Amorphous Si Films Using AlCl3 Vapor

  • Published:
MRS Online Proceedings Library Aims and scope

Abstract

It is known that the direct contact between Al and a-Si enhances the crystallization of a-Si film. But the poly-Si films crystallized by the direct contact of Al metal film suffer the problems of rough surface and pores. In our study, we utilized the vapor from AlCl3 instead of Al metal film. The crystallization was enhanced by annealing a-Si films with AlCl3 that the crystallization was completed in 5h at 540. And the surface was as smooth as that of the a-Si film. The Al incorporation into the poly-Si film took place, but the content was below the detection limit of AES.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. Y. Kawazu, H. Kudo, S. Onari and T. Arai, Jpn. J. Appl. Phys. 29, 2698 (1990)

    Google Scholar 

  2. G. Liu and S. Fonash, Appl. Phy. Lett. 62, 2554 (1993)

    Google Scholar 

  3. L. Hultman, A. Robertsson, H. T. G. Hentzell, I. Engstrom and P. A. Psaras, J. Appl. Phys. 62, 3647 (1987)

    Google Scholar 

  4. S. W. Russel, J. Li and J. W. Mayer, J. Appl. Phys. 70, 5153 (1991)

    Google Scholar 

  5. H. T. G. Hentzell, A. Robertsson, L. Hultman, G. Shaofang, S. E. Hornstrom and P. A. Psaras, Appl. Phys. Lett. 50, 933 (1987)

    Google Scholar 

  6. T. J. Konno and R. Sinclair, Philos. Mag. B 66, 749 (1992)

    Google Scholar 

  7. M. S. Haque, H. A. Naseem and W. D. Brown, J. Appl. Phys. 75, 3928 (1994)

    Google Scholar 

  8. M. S. Ashtikar and G. L. Sharma, J. Appl. Phys. 78, 913 (1995)

    Google Scholar 

  9. W. S. Liao and S. C. Lee, J. Appl. Phys. 81, 7793 (1997)

    Google Scholar 

  10. O. Nast, S. R. Wenham, J. Appl. Phys. 88, 124 (2000)

    Google Scholar 

  11. O. Nast, S. Brehme, D. Neuhaus and S. R. Wenham, IEEE T. Electron. Dev. 46, 2062 (1999)

    Google Scholar 

  12. H. Kim, G. Lee, D. Kim and S. H. Lee, The 3rd Korea-Japan Joint Seminar on Photovoltaics, 171 (2000)

  13. S. W. Lee and S. K. Joo, IEEE Electron Device Letters 17, 160 (1996)

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Taejon, 305-701, Korea

    Jin Hyung Ahn, Ji Hye Eom & Byung Tae Ahn

Authors
  1. Jin Hyung Ahn
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Ji Hye Eom
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Byung Tae Ahn
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Ahn, J.H., Eom, J.H. & Ahn, B.T. Enhanced Low-Temperature Crystallization of Amorphous Si Films Using AlCl3 Vapor. MRS Online Proceedings Library 685, 5191 (2001). https://doi.org/10.1557/PROC-685-D5.19.1

Download citation

  • Published:

  • DOI: https://doi.org/10.1557/PROC-685-D5.19.1

Search

Navigation