Abstract
The thermally oxidized Si1-x-yGexCy thin films were grown on silicon substrates by Plasma-enhanced Chemical Vapor Deposition (PECVD) and then wet oxidized at 800°C for 20 minutes. Photoluminescence spectra of the samples were measured at room temperature under 250nm excitation. Two ultraviolet photoluminescence bands with the peaks at ~370nm and ~396nm were observed in the oxidized samples. Possible mechanism of this photoluminescence is discussed.
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References
A.R. Silin and L. N. Skuja, J. of Non-Cryst. Solids, 71 (1985), p.443.
L.N. Skuja, A.N. Streketsky and A.B. Pakovich, Solid State Commun. 50 (1984), p. 1069.
E.W.J. Mitchell and E.G.S. Page, Proc. Phys. Soc.(London), B67 (1954), p. 262
L.N. Skuja, A.N. Trukhin and A.E. Plaudis, Phys. Stat. Sol. (a),84 (1984) K153.
L.P. Ginzburg, A.A. Gordeev, A.P. Gorchakov, A.P. Jilinsky, J. of Non-Cryst. Solids, 183 (1995), p. 234.
A.J. Cohen, Phys. Rev. 105 (1957), p. 1151
Myeongcheol Kim and H.J. Osten, Appl. Phys. Lett., 70 (1997), p. 2702
Xuemei Cheng, Youdou Zheng, Xiabing Liu, Lan Zang, Zhiyun Lo, Shunmning Zhu, Ping Han and Ruolian Jiang, Appl. Phys. Lett., 78 No.21 (1999), (to be published).
Ning Jiang, L. Zang, R.L. Jiang, S.M. Zhu, P. Han, X.B. Liu, X.M. Cheng, R.H. Wang, Y.D. Zheng, X.N. Hu, J.X. Fang., Appl. Phys. A, 68(1998), p.457–460
Handbook of x-ray photoelectron spectroscopy edited by C.D. Wagner, W.M. Riggs, L.E. Davis, J.F. Moulder and G.E. Muilenberg, (Perkin-Elmer Corporation, Physical Electronics Division 1978)
Acknowledgments
This work was supported by National Science Fund of China and the Research Fund for the Doctoral Program of Higher Education. The first author is also supported by MOTOROLA company. The authors also acknowledged W. F. Chen, Y. D. Ye and H. Chen for characterization assistance.
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Cheng, X.M., Zheng, Y.D., Zang, L. et al. Room Temperature Ultraviolet Photoluminescence from 800°C Thermally Oxidized Si,1-x-yGexCy Thin Films on Si(100) Substrate. MRS Online Proceedings Library 592, 13–17 (1999). https://doi.org/10.1557/PROC-592-165
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DOI: https://doi.org/10.1557/PROC-592-165