MOCVD of oxides can be achieved through deposition reaction schemes such as oxidation, thermal pyrolysis, plasma assisted pyrolysis, radiation-assisted pyrolysis or any combinations of these free-radical processes. Chemically mild and clean reaction schemes such as the hydrolysis-polycondensation and the hydrolysis-assisted pyrolysis reactions are found favorable for stoichiometric depositions using alkoxide complex precursors. We review the various reaction schemes and try to point out comparatively the advantages and disadvantages of each. Experiments in the deposition of lithium tantalate from alkoxide complex precursors are presented. Low deposition temperature, high deposition rate and autostoichiometry capabilities are demonstrated in the experiments.
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A. A. Weinberg, G. H. Braunstein, and H. Gysling, “Improved solid phase epitaxial growth of lithium tantalate thin films on sapphire, using a two-step metalorganic chemical-vapor deposition process”, Appl. Phys. Lett., 63, 2649 (1993).
H. Xie and R. Raj, “Epitaxial LiTaO3 thin film by pulsed metalorganic chemical vapor deposition from a single precursor”, Appl. Phys. Lett., 63, 3146 (1993).
K. W. Chour and R. Xu, “Vapor deposition of lithium tantalate with volatile double alkoxide precursors”, Mater. Res. Soc. Symp. Proc., 335, 65 (1994) presented Nov. 29, 1993 MRS-Fall meeting.
R. Xu, “Autostoichiometric vapor deposition I: Theory”, J. Mater. Res., 10, 2536–2541 (1995).
K. W. Chour and R. Xu, “Autostoichiometric vapor deposition II: Experiment”, J. Mater. Res., 10, 2542–2547 (1995).
J. Zhang, G. T. Stauf, R. Gardiner, P. Van Buskirk, and J. Strinbeck, “Single molecular precursor metal-organic chemical vapor deposition of MgAl2O4”, J. Mater. Res., 9, 1333 (1994).
D. C. Bradley, “Metal Alkoxides as Precursors for Electronic and Ceramic Materials”, Chem. Rev., 89, 1317 (1989).
K. J. Sladek and W. W. Gilbert, “Low Temperature Metal Oxide Deposition by Alkoxide Hydrolysis”, Proc. Int. Conf. on CVD (3rd), Salt Lake City, Utah, 24–27 April, 1973.
H. Huppertz & W. L. Engl, IEEE Trans. Elect. Devices. Vol. ED-26, No. 4, 658 (1979).
J. D. Mackenzie and D. R. Ulrich eds., Sol-gel Optics, SPIE Proc. Vol. 1328, (1990).
J. D. Mackenzie ed., Sol-gel Optics II, SPIE Proc. Vol. 1758, (1992).
This work is partially supported by the Faculty Research Grant of the University of Utah.
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Xu, R. Chemical Vapor Deposition of Oxides from Alkoxides. MRS Online Proceedings Library 415, 249–253 (1995). https://doi.org/10.1557/PROC-415-249