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Structural Characterization of InAlAs/InGaAs Layers Grown on InP Patterned Substrates

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In this work we present structural characterization by both Scanning and Transmission Electron Microscopy of InAlAs/InGaAs heterostructures grown on InP substrates. Our attention is devoted to study the two main problems limiting the application of these structures as devices: the presence of defects on the epilayer and the growth habit at theedges of the well. Our results show that a different faceting between the two <110> orthogonal directions develops during the growth and that a high density of defects is observed just at the intersection between the layers grown inside the windows and on the walls. Moreover, the presence of a polycrystalline layer developing over the mask indicates that a selective growth occurs.

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Peiro, F., Cornet, A., Morante, J.R. et al. Structural Characterization of InAlAs/InGaAs Layers Grown on InP Patterned Substrates. MRS Online Proceedings Library 340, 59–64 (1994). https://doi.org/10.1557/PROC-340-59

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  • DOI: https://doi.org/10.1557/PROC-340-59

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