Abstract
In the production MBE environment it is important to maintain low densities of oval defects and particle induced defects in epitaxial films that are used for the fabrication ofGaAs ICs. Most often, the grown layers are characterized on a sample basis by use of an optical microscope. The disadvantages of this technique are the time and labor involved.The data obtained is incomplete, dependent on training, and subjective. A preferred method would be to develop an inspection method that characterizes the surface morphology ofall MBE grown GaAs wafers and the resulting defect density. The use of a laser wafer surface scanning system has allowed us to reproducably inspect 100% of wafers. Rapid diagnosis of epitaxial problems has resulted in an improved understanding of how to routinely produce high quality epitaxial films for GaAs IC production. This work will highlight the production benefits derived from employing 100% inspection of MBE grown GaAs wafers and provide 2D maps. The relationship between gallium source operation and defect sizes will be discussed.
Similar content being viewed by others
References
A. V. Buyanov, E.P. Laurs, G.P. Peka, E.M. Semashko, and V.N. Tkachenko, Fizika Tverdogo Tela 33 (9), 2744–2748 (1991).
Masanori Shinohara, Tomonori Ito, Kazumi Wada, and Yoshihiro Imamura, Jpn. J. Appl. Phys. 23 (6), L371–L373 (1984).
H. Kawada, S. Shirayone and K. Takahashi, J. Crystal Growth 128, 550–556 (1993).
Shigenori Takagishi, Hideki Yao, and Hirotaro Mori, J. Crystal Growth 129, 443–448 (1993).
Kazuo Nanbu, Junji Saito, Tomonori Ishikawa, Kazuo Kondo, and Akihiro Shibatomi, J. Electrochem. Soc. 133 (3), 601–604 (1986).
S.M. Bedair, T.P. Humphreys, N.A. El-Masry, Y. Lo, N. Hamaguchi, C.D. Lamp, A.A. Tuttle, D.L. Dreifus, and P. Russell, Appl. Phys. Lett. 49 (15), 942–944 (1986).
S. Matteson and H.D. Shih, Appl Phys. Lett. 48 (1), 47–49 (1986).
R. Z. Bachrach and B.S. Krusor, J. Vac. Sci. Technol. 18 (3), 756–764 (1981).
Y.H. Wang, W.C. Liu, S.A. Liao, K.Y. Cheng, and C.Y. Chang, Jpn. J. Appl. Phys. 24 (5), 628–629 (1985).
K. Fujiwara, Y. Nishikawa, Y. Tokuda, and T. Nakayama, Appl. Phys. Lett. 48 (11), 701–703 (1986).
Nozomu Watanabe, Toshiaki Fukunaga, Keisuke L. I. Kobayashi and Hisao Nakashima, Jpn. J. Appl. Phys. 24 (7), L498–L500 (1985).
Shing-Lin Weng, J. Vac. Sci. Technol. B 5 (3), 725–729 (1987).
Shang-Lin Weng, C. Webb, Y.G. Chai, and S.G. Bandy, Appl. Phys. Lett. 47 (4), 391–393 (1985).
J H. Fronius, A. Fisher and K. Ploog, J. Crystal Growth 81, 169–174 (1987).
H. Fronius, A. Fischer and K. Ploog, Jpn. J. Appl. Phys. 25 (2), L137–L138 (1986).
Naresh Chand and S.N.G. Chu, J. Crystal Growth 104, 485–497 (1990).
C.E.C. Wood, L. Rathbun, H. Ohno, and D. DeSimone, J. Crystal Growth 51, 299–303 (1981).
D.G. Schlom, W.S. Lee, T. Ma, and J.S. Harris Jr, J. Vac. Sci. Technol. B 7 (2), 296–298 (1989).
J. N. Miller, J. Vac. Sci. Technol. B 10 (2), 803–806 (1992).
C.T. Lee and Y.C. Chou, J. Crystal Growth 91, 169–172 (1988).
Masanori Shinohara and Tomonori Ito, J. Appl.Phys. 65 (11), 4260–4267 (1989).
Young G. Chai and Robert Chow, Appl. Phys. Lett. 38 (10), 796–798 (1981).
Shang-Lin Weng, Appl. Phys. Lett. 49 (6), 345–347 (1986).
S.K. Mehta, R. Muralidharan, G.D. Sharda and R.K. Jain, Semicond. Sci. Technol. 7, 635–640 (1992).
P.S. Kop’ev, S.V. Ivanov, A. Yu. Yegorov and D. Yu. Uglov, J. Crystal Growth 96, 533–540 (1989).
R. F. Kopf and A.P. Kinsella, C.W. Ebert, J. Vac. Sci. Technol. B 9 (1), 132–135 (1991).
J.S. Blakemore, J. Appl. Phys. 53 (10), R123–R181 (1982).
P.O. Hahn and M. Kerstan. Proc. S.P.I.E. 1009, 172–181 (1988).
P.O. Hahn, M. Grundner, A. Schnegg, and H. Jacob, Applied Surface Science 39, 436–456 (1989).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Patterson, G.A., Chang, J.S.C. Characterization and Control of Surface Morphology and Defect Density for MBE GaAs Surfaces in the Production MBE Environment. MRS Online Proceedings Library 340, 23–28 (1994). https://doi.org/10.1557/PROC-340-23
Published:
Issue Date:
DOI: https://doi.org/10.1557/PROC-340-23