Abstract
The electrical resistivity, optical band gap and activation energy for electrical conduction have been determined as a function of preparation conditions. The operating conditions for the glow discharge reactor have been interpreted in terms of ion energy and reactive species production. The change in the electrical properties could not be explained as a percentage of [SP3] versus [SP2] bonding ratio. Rather, these two species are embedded in an amorphous medium which determines the materials electrical properties.
This is a preview of subscription content, access via your institution.
References
- 1.
See “The New York Times,” Science Section, Tuesday, Oct. 25, 1988.
- 2.
J.C. Angus, P. Koidl and S. Domitz, in Plasma Deposited Thin Films, edited by J. Mort and F. Jansen (CRC, Boca Raton, 1986), p. 89.
- 3.
J.L. Brédas and G.B. Street, J. Phys. C 18, L651 (1985).
- 4.
J. Robertson and E.P. O’Reilly, Phys. Rev. B 35, 2946 (1987).
- 5.
J. Fink, T. Müller-Heinzerling, B. Scheerer, B. Dischler, P. Koidl, A. Bubenzer, and R.E. Sah, Phys. Rev. B 30 4713 (1984).
- 6.
W. J. Varhue, S. Krause and J. Dea and C.O. Jung in Clemical Perspectives of Microelectronic Materials, edited by M.E. Gross, J. Jasinski, and J.T. Yates, Jr. (Mater, Res. Soc. Proc. 131, Boston, MA 1988).
- 7.
B. Dischler, A. Bubenzer and P. Koidl, Solid State Communications Vol. 48, No. 2, 105 (1983).
Author information
Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Varhue, W., Pandelisev, K. & Shinseki, B. Electrical Properties of Hard Carbon Films. MRS Online Proceedings Library 131, 605 (1988). https://doi.org/10.1557/PROC-131-605
Published: