Abstract
We have shown that variation in the real part of the dielectric permittivity of typical transparent conducting oxide (TCO) films can have a profound effect on the optical properties of the material. This has been demonstrated by adding small amounts of Zr to an ITO ceramic sputtering target and analyzing the resulting ITO and ITO:Zr (ITZO) films. Comparative electrical and optical analyses of the films show that, although the carrier concentration and mobility do not change appreciably by adding 1 wt.% ZrO2 to the ITO sputtering target, the plasma wavelength increases significantly for the ITZO film. We believe that the underlying physics of these results can be exploited in designing future TCO films for photovoltaic (PV) applications—especially those that embody industrial advantages but remain limited by low mobility.
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Gessert, T.A., Yoshida, Y., Fesenmaier, C.C. et al. TCO Thin Films with Permittivity Control. MRS Online Proceedings Library 1165, 608 (2009). https://doi.org/10.1557/PROC-1165-M06-08
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DOI: https://doi.org/10.1557/PROC-1165-M06-08