Abstract
Fe–Ni alloy cluster-assembled films were obtained by a plasma–gas-condensation-type cluster-deposition method. We studied the magnetic and electrical properties of these assemblies prepared on an electrically grounded substrate [bias voltage (Va) = 0 kV] and on a negatively biased substrate (Va = −20 kV). The packing density and saturation magnetization per volume, Ms, are much larger for the assemblies prepared at Va = −20 kV than those prepared at Va = 0 kV, while the magnetic coercivity, Hc, and electrical resistivity, ρ, are much lower for the assemblies prepared at Va = −20 kV than those prepared at Va = 0 kV. For Ni-rich Fe–Ni alloy cluster-assembled films obtained at Va = −20 kV, the Hc values can become smaller than 160 A/m (the precision limit of our superconducting quantum interference device magnetometer) by adjusting the initial cluster size. The magnetic and electrical properties of Fe–Ni cluster-assembled films are much improved in comparison with those of pure Fe cluster-assembled films.
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This work has been supported by the Intellectual Cluster Project supported by the Ministry of Education, Science, Culture, and Sports, Japan, Aichi Prefecture, Nagoya City, and Aichi Science and Technology Foundation; a Grant-in-Aid for Scientific Research given by the Ministry of Education, Science, Culture and Sports, Japan; NITECH 21st Century COE Program “World Ceramics Center for Environmental Harmony”; and the Research Encourage Program of Xiamen University.
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Peng, D., Sumiyama, K., Kumagai, K. et al. Magnetic and electrical characteristics in dense Fe–Ni alloy cluster-assembled films prepared by energetic cluster deposition. Journal of Materials Research 23, 189–197 (2008). https://doi.org/10.1557/JMR.2008.0018
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DOI: https://doi.org/10.1557/JMR.2008.0018