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Multilayer thin and ultrathin film capacitors fabricated by chemical solution deposition

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Abstract

Chemical solution deposition has been used to fabricate continuous ultrathin lead lanthanum zirconate titanate (PLZT) films as thin as 20 nm. Further, multilayer capacitor structures with as many as 10 dielectric layers have been fabricated from these ultrathin PLZT films by alternating spin-coated dielectric layers with sputtered platinum electrodes. Integrating a photolithographically defined wet etch step to the fabrication process enabled the production of functional multilayer stacks with capacitance values exceeding 600 nF. Such ultrathin multilayer capacitors offer tremendous advantages for further miniaturization of integrated passive components.

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Acknowledgments

M.J. Rye, J.R. Michael, M.A. Rodriguez, and B.B. McKenzie provided essential technical assistance in the characterization of these films. The authors would also like to thank P.A. Mahoney and J.S. Wheeler for their technical assistance and valuable input into this project. Sandia is a multiprogram laboratory operated by Sandia Corporation, a Lockheed Martin Company, for the United States Department of Energy’s National Nuclear Security Administration under contract DE-AC04-94AL85000.

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  1. Sandia National Laboratories, Albuquerque, New Mexico, 87185, USA

    Geoff L. Brennecka, Chad M. Parish, Bruce A. Tuttle & Luke N. Brewer

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  1. Geoff L. Brennecka
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  2. Chad M. Parish
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  3. Bruce A. Tuttle
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  4. Luke N. Brewer
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Correspondence to Geoff L. Brennecka.

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Brennecka, G.L., Parish, C.M., Tuttle, B.A. et al. Multilayer thin and ultrathin film capacitors fabricated by chemical solution deposition. Journal of Materials Research 23, 176–181 (2008). https://doi.org/10.1557/JMR.2008.0010

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  • DOI: https://doi.org/10.1557/JMR.2008.0010

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