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Wavelength dependence of crystallization of alkoxy-derived ZrO2 thin films prepared by ultraviolet irradiation

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Abstract

Wavelength dependence was observed in the ultraviolet (UV) irradiation-assisted crystallization of alkoxy-derived ZrO2 thin films. The surface grains of thin films deposited on Si(100) substrates became enlarged by UV irradiation using an ultrahigh-pressure mercury lamp. The crystallinity of thin films deposited on Si(100) substrates was improved by UV irradiation using a low-pressure mercury lamp. The reaction using the ultrahigh-pressure mercury lamp depended on the substrate type.

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Authors and Affiliations

  1. National Institute of Advanced Industrial Science and Technology (AIST), Moriyama-ku, Nagoya, 463-8560, Japan

    Kaori Nishizawa, Takeshi Miki, Kazuyuki Suzuki & Kazumi Kato

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  1. Kaori Nishizawa
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  2. Takeshi Miki
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  3. Kazuyuki Suzuki
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  4. Kazumi Kato
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Correspondence to Kaori Nishizawa.

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Nishizawa, K., Miki, T., Suzuki, K. et al. Wavelength dependence of crystallization of alkoxy-derived ZrO2 thin films prepared by ultraviolet irradiation. Journal of Materials Research 20, 3133–3140 (2005). https://doi.org/10.1557/JMR.2005.0392

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  • DOI: https://doi.org/10.1557/JMR.2005.0392

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