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Growth, characterization, and electrical properties of PbZr0.52Ti0.48O3 thin films on buffered silicon substrates using pulsed laser deposition

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Abstract

Epitaxial thin films of PbZr0.52Ti0.48O3 (PZT) were synthesized successfully on SrRuO3/SrTiO3/MgO/TiN/Si heterostructures by pulsed laser deposition. The films were single phase and had (001) orientation. The deposition parameters were varied to obtain the best epitaxial layer for each of the compounds. Transmission electron microscopy indicated good epitaxy for the entire heterostructure and sharp interfaces between the epilayers. Dielectric and P–E hysteresis loop measurements were carried out with evaporated Ag electrodes. The dielectric constant for the films was found to be between 400–450. The value of saturation polarization Ps was between 55–60 μC/cm2, and the coercive field Ec varied from 60–70 kV/cm. Integration of PZT films with silicon will be useful for future memory and micromechanical devices.

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Authors and Affiliations

  1. NSF Center for Advanced Materials and Smart Structures, Department of Electrical Engineering, North Carolina Agricultural and Technical State University, 27411, Greensboro, North Carolina, USA

    Walter M. Gilmore III & Soma Chattopadhyay

  2. North Carolina State University, Materials Science Department, 27695-7916, Raleigh, North Carolina, USA

    Alex Kvit, A. K. Sharma & J. Narayan

  3. Department of Electrical Engineering, North Carolina Agricultural and Technical State University, 551 McNair Hall, 27411, Greensboro, North Carolina, USA

    C. B. Lee & Ward J. Collis

  4. NSF Center for Advanced Materials and Smart Structures, North Carolina Agricultural and Technical State University, 27411, Greensboro, North Carolina, USA

    J. Sankar

Authors
  1. Walter M. Gilmore III
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  2. Soma Chattopadhyay
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  3. Alex Kvit
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  4. A. K. Sharma
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  5. C. B. Lee
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  6. Ward J. Collis
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  7. J. Sankar
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  8. J. Narayan
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Gilmore, W.M., Chattopadhyay, S., Kvit, A. et al. Growth, characterization, and electrical properties of PbZr0.52Ti0.48O3 thin films on buffered silicon substrates using pulsed laser deposition. Journal of Materials Research 18, 111–114 (2003). https://doi.org/10.1557/JMR.2003.0016

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  • DOI: https://doi.org/10.1557/JMR.2003.0016

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