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Electron field emission from Ar+ ion-treated thick-film carbon paste

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Abstract

Ion bombardment was used to produce electron-emitting microscale features on surfaces of thick films printed with carbon pastes. This technology can potentially enable the development of large-area field emission displays. Systematic investigations using microscopy and electron field emission experiments have demonstrated a close link among paste formulation, ion processing parameters, and the development of surface microstructures. These investigations were also useful in understanding the fundamentals of microstructure formation under ion bombardment and the field emission characteristics of the carbon-based emitters. Several device concepts aimed toward achieving a low-voltage switchable triode were also tested with varying degrees of success. In this paper, we discuss various technological issues related to the materials, processes, and devices.

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Authors and Affiliations

  1. DuPont Central Research and Development, Wilmington, Delaware, 19880, USA

    Gillian A. M. Reynolds, Lap-Tak Cheng, Robert Bouchard, Paul Moffett, Howard Jones & Linda F. Robinson

  2. Department of Materials Science and Engineering and Department of Physics and Astronomy, University of Delaware, Newark, Delaware, 19716, USA

    S. Ismat Shah

  3. DuPont Electronic Technologies, Research Triangle Park, North Carolina, 27709, USA

    Daniel I. Amey

Authors
  1. Gillian A. M. Reynolds
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  2. Lap-Tak Cheng
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  3. Robert Bouchard
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  4. Paul Moffett
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  5. Howard Jones
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  6. Linda F. Robinson
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  7. S. Ismat Shah
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  8. Daniel I. Amey
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Reynolds, G.A.M., Cheng, LT., Bouchard, R. et al. Electron field emission from Ar+ ion-treated thick-film carbon paste. Journal of Materials Research 17, 2590–2598 (2002). https://doi.org/10.1557/JMR.2002.0375

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  • DOI: https://doi.org/10.1557/JMR.2002.0375

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