Microstructure of Film Growth from Filtrating Mono-dispersed Particle Suspension

Abstract

The deposition mechanism that determines the microstructure of colloidal films was investigated using a constant-filtration-rate procedure. In particular, we studied the dependence of the grain size on the filtration rate and the volume fraction of the particles in liquid. We correlated the surface diffusion distance to the final grain size and identified a processing window for large-grain colloidal films. The necessary conditions for homoepitaxy of colloidal crystals were successfully identified. In particular, the surface diffusion distance of deposited particles before embedment emerged as an important parameter for film microstructural control. Sufficiently long the diffusion distances correlated well with the slow deposition rates often required for crystal growth. Low deposition rates allowed more time for depositing particles to sample surface sites for low-energy configurations. This surface diffusion model for microstructure control has universal application to other film deposition methods for mono-dispersed particles.