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Analysis of the Reservoir Length and its Effect on Electromigration Lifetime

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Abstract

This report studies the electromigration performance of W-plug via structures under the reservoir effect. The lifetime improvement factor M was observed to be a weak function of the stressing current and approximately equal to 2. A Simple model is included in the report to explain this observation. The model also predicts the most effective reservoir length for electromigration lifetime improvement.

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References

  • H.S. Rathore, R.G. Filippi, R.A. Estabil, J.J. Wachnik, and T. Kwok, in Stress-Induced Phenomena in Metallization, Proc. 2nd Int. Workshop, edited by P. Ho, C.Y. Li, and P. Totta (Am. Inst. Phys., New York, 1994), p. 165.

    Google Scholar 

  • C-K. Hu, M.B. Small, and P.S. Ho, J. Appl. Phys. 74, 969 (1993).

    Google Scholar 

  • M. Fujii, K. Koyama, and J. Aoyama, Conf. Proc. VLSI Multilevel Integr. Circuit (VMIC) 312 (1997).

    Article  CAS  Google Scholar 

  • H.A. Le, N.C. Tso, and J.W. McPherson . J. Electrochem. Soc. 2522 (1997).

  • I.A. Blech and E.S. Meieran, J. Appl. Phys. 40, 485 (1969).

  • I.A. Blech and C. Herring, Appl. Phys. Let. 29, 131 (1976).

    Article  CAS  Google Scholar 

  • I.A. Blech, J. Appl. Phys. 47, 1203 (1976).

    Article  CAS  Google Scholar 

  • H.A. Le, K. Banerjee, and J.W. McPherson, Semicond. Sci. Technol. 11, 858 (1996).

    Article  CAS  Google Scholar 

  • R.G. Filippi, G.A. Biery, and R.A. Wachnik, J. Appl. Phys. 78(6), 3759 (1995).

    Article  CAS  Google Scholar 

  • J.R. Kraayeveld, A.H. Verbruggen, and A.W-J. Willemsen, Appl. Phys. Lett. 67(9), 1227 (1995).

    Article  Google Scholar 

  • M. Gall, D. Jawarani, and H. Kawasaki, in Materials Reliability in Microelectronics VI, edited by W.F. Filter, J.J. Clement, A.S. Oates, R. Rosenberg, and P.M. Lenahan (Mater. Res. Soc. Symp. Proc. 428, Pittsburgh, PA, 1996), p. 81.

    Article  Google Scholar 

  • N.D. Bui, in Materials Reliability in Microelectronics VI, edited by W.F. Filter, J.J. Clement, A.S. Oates, R. Rosenberg, and P.M. Lenahan (Mater. Res. Symp. Proc. 428, Pittsburgh, PA, 1996), p. 87.

    Google Scholar 

  • J.G. Sevillano, P. van Houtte, and E. Aernoudt, Prog. Mater. Sci. 25, 69 (1980).

    Google Scholar 

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Correspondence to H. A. Le.

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Le, H.A., Ting, L., Tso, N.C. et al. Analysis of the Reservoir Length and its Effect on Electromigration Lifetime. Journal of Materials Research 17, 167–171 (2002). https://doi.org/10.1557/JMR.2002.0025

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  • DOI: https://doi.org/10.1557/JMR.2002.0025

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