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Microstructure and properties of PbZr0.6Ti0.4O3 and PbZrO3 thin films deposited on template layers

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Abstract

Polycrystalline Pb(ZrxTi1−x)O3 thin films with x = 0.6 and 1.0 were deposited at low temperatures (450–525 °C) on (111)Pt/Ti/SiO2/Si substrates by metalorganic chemical vapor deposition. The films were characterized by x-ray diffraction, electron microscopy, and electrical measurements. The texture of the films could be improved by using one of two template layers: PbTiO3 or TiO2. Electrical properties, including dielectric constants, loss tangents, polarization, coercive field, and breakdown field, were also examined. PbZrO3 films on Pt/Ti/SiO2/Si with a pseudocubic (110) orientation exhibited an electric-field-induced transformation from the antiferroelectric phase to the ferroelectric phase. The effect of varying processing conditions on the microstructure and electrical properties of the films is discussed.

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Author notes

  1. M. T. Lanagan

    Present address: Materials Research Laboratory, Pennsylvania State University, PA, 16802, University Park, USA

  2. N. Chen

    Present address: Bell Laboratories, IL, 2600 Warrenville Road, 60532, Lisle, USA

  3. Y. Huang

    Present address: International Truck and Engine Company, IL, 10400 W. North Avenue, 60160, Melrose Park, USA

Authors and Affiliations

  1. Energy Technology Division, Argonne National Laboratory, Illinois, 60439–4838, Argonne, USA

    R. E. Koritala & M. T. Lanagan

  2. Materials Science Division, Argonne National Laboratory, Illinois, 60439–4838, Argonne, USA

    N. Chen, G. R. Bai, Y. Huang & S. K. Streiffer

Authors
  1. R. E. Koritala
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  2. M. T. Lanagan
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  3. N. Chen
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  4. G. R. Bai
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  5. Y. Huang
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  6. S. K. Streiffer
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Koritala, R.E., Lanagan, M.T., Chen, N. et al. Microstructure and properties of PbZr0.6Ti0.4O3 and PbZrO3 thin films deposited on template layers. Journal of Materials Research 15, 1962–1971 (2000). https://doi.org/10.1557/JMR.2000.0283

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  • DOI: https://doi.org/10.1557/JMR.2000.0283

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