Abstract
Sputtered copper and tungsten thin films both with and without tungsten and chromium superlayers were tested by using nanoindentation probing to initiate and drive delamination. The adhesion energies of the films were calculated from the induced delaminations using the analysis presented in “Quantitative adhesion measures of multilayer films: Part I. Indentation mechanics.” Copper films ranging in thickness from 150 to 1500 nm in the as-sputtered condition had measured adhesion energies ranging from 0.2 to 2 J/m2, commensurate with the thermodynamic work of adhesion. Tungsten films ranging in thickness from 500 to 1000 nm in the as-sputtered condition had measured adhesion energies ranging from 5 to 15 J/m2. The superlayer was shown to induce radial cracking when under residual tension, resulting in underestimation of the adhesion energy when the film was well adhered. Under conditions of weak adherence or residual compression, the superlayer provided an excellent means to induce a delamination and allowed an accurate and reasonably precise quantitative measure of thin film adhesion.
Similar content being viewed by others
References
D.B. Marshall and A.G. Evans, J. Appl. Phys. 56, 2632 (1984).
G. Bao, S. Ho, B. Fan, and Z. Suo, Int. J. Sol. Struc. 29, 1105 (1990).
Z. Suo, J. Appl. Mech. 57, 627 (1990).
Z. Suo and J.W. Hutchinson, Mater. Sci. Eng. A107, 135 (1989).
J.S. Wang and Z. Suo, Acta Metall. 38, 1279 (1990).
T.L. Becker, Jr, J.M. McNaney, R.M. Cannon, and R.O. Ritchie, Mech. Mater. 25, 291 (1997).
A. Bagchi, G.E. Lucas, Z. Suo, and A.G. Evans, J. Mater. Res. 9, 1734 (1994).
M.P. deBoer and W.W. Gerberich, Acta Metall. 44, 3169 (1996).
M.P. deBoer and W.W. Gerberich, Acta Metall. 44, 3177 (1996).
M.P. deBoer, M.D. Kriese, and W.W. Gerberich, J. Mater. Res. 12, 2673 (1997).
M.D. Kriese, N.R. Moody, and W.W. Gerberich, in Boundaries and Interfaces in Materials: The David A. Smith Symposium, edited by R.C. Pond, W.A.T. Clark, and A.H. King (TMS, Warrendale, PA, 1998), p. 113.
M.D. Kriese, N.R. Moody, and W.W. Gerberich, in Thin Films—Stresses and Mechanical Properties VII, edited by R.C. Cammarata, M. Nastasi, E.P. Busso, and W.C. Oliver (Mater. Res. Soc. Symp. Proc. 505, Warrendale, PA, 1998), p. 363.
S.W. Russell, S.A. Rafalski, R.L. Spreitzer, J. Li, M. Moinpour, F. Moghadam, and T.L. Alford, Thin Solid Films 262, 154 (1995).
G.C. Stoney, Proc. R. Soc. Lond. A82, 172 (1909).
W.D. Nix, Metall. Trans. A 20A, 2217 (1988).
M. deBoer, Ph.D. dissertation, University of Minnesota (1996).
M. Ohring, The Materials Science of Thin Films (Academic Press, New York, 1992).
T.W. Wu, J. Mater. Res. 6, 407 (1991).
T.Y. Tsui, C.A. Ross, and G.M. Pharr, in Materials Reliability in Microelectronics VII, edited by J.J. Clement, R.R. Keller, K.S. Krisch, J.J.E. Sanchez, and Z. Suo (Mater. Res. Soc. Symp. Proc. 473, Pittsburgh, PA, 1997), pp. 57–62.
CRC Handbook of Chemistry and Physics, edited by D.R. Lide (CRC Press, New York, 1993).
W.D. Kingery, H.K. Bowen, and D.R. Uhlmann, Introduction to Ceramics (John Wiley & Sons, Inc., New York, 1976).
A.G. Evans, M. Rühle, B.J. Dalgleish, and P.G. Charalambides, Mater. Sci. Eng. A126, 53 (1990).
T. Hong, J.R. Smith, and D.J. Srolovitz, Acta Metall. 43, 2721 (1995).
A. Bagchi and A.G. Evans, Thin Solid Films 286, 203 (1996).
J.W. Hutchinson and Z. Suo, in Advances in Applied Mechanics, edited by J.W. Hutchinson and T.Y. Hu (Academic Press, Inc., New York, 1992), pp. 63–169.
V. Tvergaard and J.W. Hutchinson, J. Mech. Phys. Sol. 41, 1119 (1993).
A.G. Evans and J.W. Hutchinson, Acta Metall. 37, 909 (1989).
W.C. Oliver and G.M. Pharr, J. Mater. Res. 7, 564 (1992).
H.M. Jensen, Eng. Frac. Mech. 40, 475 (1991).
G. Gioia and M. Ortiz, in Advances in Applied Mechanics, edited by J.W. Hutchinson and T.Y. Hu (Academic Press, Inc., New York, 1997), pp. 120–192.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Kriese, M.D., Gerberich, W.W. & Moody, N.R. Quantitative adhesion measures of multilayer films: Part II. Indentation of W/Cu, W/W, Cr/W. Journal of Materials Research 14, 3019–3026 (1999). https://doi.org/10.1557/JMR.1999.0405
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1557/JMR.1999.0405