Skip to main content
SpringerLink
Log in

Atomic force microscope investigation of the thermal stability of thin TiSi2 films

  • Articles
  • Published:
Journal of Materials Research Aims and scope Submit manuscript

Abstract

The thermal stability of TiSi2 films on Si has been studied using the atomic force microscope (AFM). Changes in the surface roughness, film morphology, and sheet resistance were monitored during a series of rapid thermal annealing treatments. A linear increase of the root-mean-square (rms) roughness with time was observed during the early stages of degradation, in agreement with a surface diffusion model of thermal grooving, followed by an apparent saturation roughness that was attributed to the effective rupture of the film.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. J. Winnerl, in Silicides, Germanides and their Interfaces, edited by R.W. Fathauer, S. Mantl, L. J. Schowalter, and K.N. Tu (Mater. Res. Soc. Symp. Proc. 320, Pittsburgh, PA, 1994), p. 37.

  2. S. Ogawa, T. Yoshida, and T. Kouzaki, Appl. Phys. Lett. 56, 725 (1990).

    Article  CAS  Google Scholar 

  3. J. F. Chen, L.J. Chen, and W. Lur, Nucl. Instrum. Methods B96, 361 (1995).

    Article  Google Scholar 

  4. L.A. Clevenger and R. W. Mann, in Silicides, Germanides and Their Interfaces, edited by R. W. Fathauer, S. Mantl, L. J. Schowalter, and K.N. Tu (Mater. Res. Soc. Symp. Proc. 320, Pittsburgh, PA, 1994), p. 15.

  5. C. Osburn, in Rapid Thermal Processing, Science and Technology, edited by R. Fair (Academic Press, Inc., San Diego, CA, 1993), p. 227.

    Chapter  Google Scholar 

  6. S.W. Sun, F. Pintchovski, P. J. Tobin, and R.L. Hance, in Rapid Thermal Processing of Electronic Materials, edited by S.R. Wilson, R. Powell, and D.E. Davies (Mater. Res. Soc. Symp. Proc. 92, Pittsburgh, PA, 1987), p. 165.

  7. L.F. Mattheiss and J. C. Hensel, Phys. Rev. B 39, 7754 (1989).

    Article  CAS  Google Scholar 

  8. A. Wang and J. Lien, in VLSI Science and Technology/1985, edited by W.M. Bullis and S. Broydo (Electrochem. Soc., Pennington, NJ, 1985), p. 203.

    Google Scholar 

  9. A.K. Nanda, S. Meester, and C. W. Wilkins, in Rapid Thermal and Integrated Processing, edited by J. J. Wortman, J. C. Gelpey, M.L. Green, S. R. J. Brueck, and F. Roozeboom (Mater. Res. Soc. Symp. Proc. 342, Pittsburgh, PA, 1994), p. 111.

  10. H. Jeon, C. A. Sukow, J.W. Honeycutt, T. P. Humphreys, R. J. Nemanich, and G. A. Rozgonyi, in Advanced Metallizations in Microelectronics, edited by A. Katz, S. P. Murarka, and A. Appelbaum (Mater. Res. Soc. Symp. Proc. 181, Pittsburgh, PA, 1990), p. 569.

  11. R. Mann, C. Racine, and R. Bass, in Rapid Thermal and Integrated Processing, edited by J. C. Gelpey, M.L. Green, J. J. Wortman, and R. Singh (Mater. Res. Soc. Symp. Proc. 224, Pittsburgh, PA, 1991), p. 115.

  12. J. Winnerl, Semiconductor Int., 81 (August 1994).

  13. K.L. Saenger, C. Cabral, Jr., L. A. Clevenger, R. A. Roy, and S. Wind, J. Appl. Phys. 78, 7040 (1995).

    Article  CAS  Google Scholar 

  14. K. Srikrishna, R. Jairath, and G. Huglin, in Rapid Thermal and Integrated Processing, edited by J. C. Gelpey, M. L. Green, J. J. Wortman, and R. Singh (Mater. Res. Soc. Symp. Proc. 224, Pittsburgh, PA, 1991).

  15. J-M. Dilhac, C. Ganibal, N. Nolhier, P. B. Moynagh, C. P. Chew, and P.J. Rosser, Appl. Surf. Sci. 63, 131 (1993).

    Article  CAS  Google Scholar 

  16. G.E. Georgiou, H. Abiko, F. A. Baiocchi, N. T. Ha, and S. Nakahara, J. Electrochem. Soc. 141, 1351 (1994).

    Article  CAS  Google Scholar 

  17. Q.F. Wang, J.Y. Tsai, C.M. Osburn, R. Chapman, and G.E. McQuire, Appl. Phys. Lett. 61, 2920 (1992).

    Article  CAS  Google Scholar 

  18. C.Y. Wong, L.K. Wang, P.A. McFarland, and C.Y. Ting, J. Appl. Phys. 60, 243 (1996).

    Article  Google Scholar 

  19. H. Jeon, C. Sukow, J. W. Honeycutt, G. Rozgonyi, and R. Nemanich, J. Appl. Phys. 71, 4269 (1992).

    Article  CAS  Google Scholar 

  20. P. Revesz, L. R. Zheng, L.S. Hung, and J. W. Mayer, Appl. Phys. Lett. 48, 1591 (1986).

    Article  CAS  Google Scholar 

  21. C. A. Sukow and R. J. Nemanich, J. Mater. Res. 9, 1214 (1994).

    Article  CAS  Google Scholar 

  22. A. V. Amorsolo, Jr., P. D. Funkenbusch, and A. M. Kadin, J. Mater. Res. 11, 412 (1996).

    Article  CAS  Google Scholar 

  23. M. Nicolet and S. Lau, in VLSI Handbook, edited by N. G. Einspruch (Academic Press, Inc., Orlando, FL, 1985), p. 415.

    Chapter  Google Scholar 

  24. F.M. d’Heurle, Int. Mater. Rev. 34, 53 (1989).

    Article  Google Scholar 

  25. P.D. Hren, H. Al-Shareef, S. H. Rou, A. I. Kingon, P. Buaud, and E.A. Irene, in Advanced Metallization and Processing for Semiconductor Devices and Circuits II, edited by A. Katz, S.P. Murarka, Y. I. Nissim, and J. M. E. Harper (Mater. Res. Soc. Symp. Proc. 260, Pittsburgh, PA, 1992), p. 575.

  26. F.Y. Genin, Acta Metall. Mater. 43, 4289 (1995).

    Article  CAS  Google Scholar 

  27. Kidd Electronics RTA Manual, Kidd Electronics, La Jolla, CA, 1995.

  28. Digital Instruments Nanoscope III Scanning Probe Microscopy Control System User’s Manual, Ver. 2.5, 1992, Digital Instruments, Inc., Santa Barbara, CA.

  29. Digital Instruments Nanoscope III Atomic Force Microscope Instruction Manual Version 2.1, 1992, Digital Instruments, Inc., Santa Barbara, CA.

  30. A.V. Amorsolo, Jr., “TiSi2 Formation by Rapid Thermal Processing: Effects of Processing on Material Properties,” Ph.D. Thesis in Materials Science, University of Rochester, 1996.

  31. D. J. Srolovitz and S. A. Safran, J. Appl. Phys. 60, 247 (1986).

    Article  CAS  Google Scholar 

  32. F. Y. Genin, W. W. Mullins, and P. Wynblatt, Acta Metall. 40, 3239 (1992).

    Article  CAS  Google Scholar 

  33. D. J. Srolovitz and S. A. Safran, J. Appl. Phys. 60, 255 (1986).

    Article  CAS  Google Scholar 

  34. L. J. Chen, W. Lur, J.F. Chen, T. L. Lee, and J. M. Liang, in Rapid Thermal and Integrated Processing III, edited by J. J. Wortman, J. C. Gelpey, M. L. Green, S. R.J. Brueck, and F. Roozeboom (Mater. Res. Soc. Symp. Proc. 342, Pittsburgh, PA, 1994), p. 99.

  35. G. Reiss and H. Brück, Surf. Sci. 269/270, 772 (1992).

    Article  Google Scholar 

  36. Encyclopedia of Materials Science and Engineering, edited by M. B. Bever (Pergamon Press Ltd., London, 1986), Vol. 6, p. 4806.

    Google Scholar 

  37. D. J. Whitehouse, Handbook of Surface Metrology (Institute of Physics, Bristol, UK, 1994).

    Google Scholar 

  38. J. F. Song and T. V. Vorburger, in ASM Handbook, edited by S.D. Henry (ASM INTERNATIONAL, Metals Park, OH, 1992), Vol. 18, p. 334.

    Google Scholar 

  39. T.P. Nolan, R. Sinclair, and R. Beyers, J. Appl. Phys. 71, 720 (1992).

    Article  CAS  Google Scholar 

  40. J. Nulman, in Advanced Metallizations in Microelectronics, edited by A. Katz, S. P. Murarka, and A. Appelbaum (Mater. Res. Soc. Symp. Proc. 181, Pittsburgh, PA, 1990), p. 123.

  41. W.M. Kane, J. P. Spratt, and L. W. Hershinger, J. Appl. Phys. 37, 2085 (1966).

    Article  CAS  Google Scholar 

  42. W.W. Mullins, J. Appl. Phys. 28, 333 (1957).

    Article  CAS  Google Scholar 

  43. C. M. Kennefick and R. Raj, Acta Metall. 37, 2947 (1989).

    Article  CAS  Google Scholar 

  44. F. Y. Genin, W. W. Mullins, and P. Wynblatt, Acta Metall. 41, 3541 (1993).

    Article  CAS  Google Scholar 

  45. S. A. Hackney, Scripta Metall. 22, 1273 (1988).

    Article  CAS  Google Scholar 

  46. S. A. Hackney and G. C. Ojard, Scripta Metall. 22, 1731 (1988).

    Article  Google Scholar 

  47. W.W. Mullins, Acta Metall. 6, 414 (1958).

    Article  Google Scholar 

  48. L. Ratke and H. J. Vogel, Acta Metall. Mater. 39, 915 (1991).

    Article  CAS  Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Department of Mechanical Engineering, University of Rochester, Rochester, 14627, New York, USA

    Alberto V. Amorsolo Jr. & Paul D. Funkenbusch

  2. Department of Electrical Engineering, University of Rochester, Rochester, 14627, New York, USA

    Alan M. Kadin

Authors
  1. Alberto V. Amorsolo Jr.
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Paul D. Funkenbusch
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Alan M. Kadin
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Amorsolo, A.V., Funkenbusch, P.D. & Kadin, A.M. Atomic force microscope investigation of the thermal stability of thin TiSi2 films. Journal of Materials Research 13, 1938–1949 (1998). https://doi.org/10.1557/JMR.1998.0273

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1557/JMR.1998.0273

Search

Navigation