Abstract
The deposition of Cu, Zn, Pt, and Co precursor particles from solution onto a flat silicon wafer using a spin coater was studied. Homogeneously distributed monodisperse particles can be obtained. The dependence of particle size and number density on solution concentration and rotation frequency was investigated. Different solvents and support modifications were studied. The particles were analyzed using dark-field microscopy, scanning electron microscopy, and atomic force microscopy.
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Doornkamp, C., Laszlo, C., Wieldraaijer, W. et al. Exploration of the deposition of submicrometer particles by spin-coating. Journal of Materials Research 10, 411–424 (1995). https://doi.org/10.1557/JMR.1995.0411
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DOI: https://doi.org/10.1557/JMR.1995.0411