Abstract
Optical emission spectroscopic studies of dc-94.92 MHz hybrid plasma generated in the newly developed magnetron sputtering system were performed during the growth of YBa2Cu3O7−δ (YBCO) thin films. All the detectable species showed uniform spatial distribution along the radial direction of the target more than 8 mm above the target surface. High cathode current conditions in the hybrid plasma were found to make the plasma with high ion density. The high ionizing efficiency was concluded to be essential in obtaining an excellent crystalline film. This result is explained by the ion acceleration mechanism through the ion sheath formed near the substrate surface. Oxygen gas introduced into the growing chamber during deposition was found to be responsible for the oxidation of the target surface.
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Ito, W., Mahajan, S., Okayama, S. et al. Optical emission spectroscopic studies on the growth of YBCO thin films by dc-94.92 MHz hybrid plasma sputtering. Journal of Materials Research 9, 1082–1088 (1994). https://doi.org/10.1557/JMR.1994.1082
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DOI: https://doi.org/10.1557/JMR.1994.1082