Summary
Self-assembly is the autonomous organization of components into patterns or structures without human intervention. This is the approach followed by nature to generate living cells and represents one of the practical strategies to fabricate ensembles of nanostructures. In static self-assembly the formation of ordered structures could require energy but once formed the structures are stable. The introduction of additional regular features in the environment could be used to template the self-assembly guiding the organization of the components and determining the final structure they form. In this regard self-assembly of block copolymers represents a potent platform for fundamental studies at the nanoscale and for application-driven investigation as a tool to fabricate functional nanostructured materials. Block copolymers can hierarchically assemble into chemically distinct domains with size and periodicity on the order of 10 nm or below, offering a potentially inexpensive route to generate large-area nanostructured materials. The final structure characteristics of these materials are dictated by the properties of the elementary block copolymers, like chain length, volume fraction or degree of block incompatibility. Modern synthetic chemistry offers the possibility to design these macromolecules with very specific length scales and geometries, directly embodying in the block copolymers the code that drives their self- assembling process. The understanding of the kinetics and thermodynamics of the block copolymer self-assembly process in the bulk phase as well as in thin films represents a fundamental prerequisite toward the exploitation of these materials. Incorporating block copolymer into device fabrication procedures or directly into devices, as active elements, will lead to the development of a new generation of devices fabricated using the fundamental law of nature to our advantage in order to minimize cost and power consumption in the fabrication process. Moreover the capability to precisely organize these nano-objects on appropriate substrates is the key point to support the technological development of new device concepts with predictable characteristics based on these nano-materials. In the next coming years this area of research, at the intersection between fundamental science and technology, is expected to disclose additional insights in the physics of the self-assembly process and to delineate unforeseen applications for these exciting materials.
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Liddle J. A. and Gallatin G. M., Nanomanufacturing: A Perspective, ACS Nano, 10 (2016) 2995.
Kelly M. J., Intrinsic top-down unmanufacturability, Nanotechnology, 22 (2011) 245303.
Lehn J.-M., Toward complex matter: Supramolecular chemistry and self-organization, Proc. Natl. Acad. Sci. U.S.A., 99 (2002) 4763.
Lehn J.-M., Toward self-organization and complex matter, Science, 295 (2002) 2400.
Whitesides G. M. and Boncheva M., Beyond molecules: Self-assembly of mesoscopic and macroscopic components, Proc. Natl. Acad. Sci. U.S.A., 99 (2002) 4769.
Whitesides G. M. and Grzybowski B., Self-Assembly at All Scales, Science, 295 (2002) 2418.
Winkler D. A. and Halley J. D., Consistent concepts of self-organization and self-assembly, Complexity, 14 (2008) 10.
Stuart M. A. C, Huck W. T. S., Genzer J., Müller M., Ober C, Stamm M., Sukhorukov G. B., Szleifer I., Tsukruk V. V., Urban M., Winnik F., Zauscher S., Luzinov I. and Minko S., Emerging applications of stimuli-responsive polymer materials, Nat. Mater., 9 (2010) 101.
Epstein I. R. and Xu B., Reaction-diffusion processes at the nano- and microscales, Nat. Nanotechnol., 11 (2016) 312.
Cummins C., Ghoshal T., Holmes J. D. and Morris M. A., Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application, Adv. Mater. (2016), DOI: 10.1002/adma.201503432.
Herr D. J. C., Directed block copolymer self-assembly for nanoelectronics fabrication, J. Mater. Res., 26 (2011) 122.
Cheng J. Y., Mayes A. M. and Ross C. A., Nanostructure engineering by templated self-assembly of block copolymers, Nat. Mater., 3 (2004) 823.
Cheng J. Y., Ross C. A., Smith H. I. and Thomas E. L., Templated Self-Assembly of Block Copolymers: Top-Down Helps Bottom-Up, Adv. Mater., 18 (2006) 2505.
Jeong S. J., Kim J. Y., Kim B. H., Moon H. S. and Kim S. O., Directed self-assembly of block copolymers for next generation nanolithography, Mater. Today, 16 (2013) 468.
Bates F. S. and Fredrickson G. H., Block Copolymer Thermodynamics: Theory and Experiment, Annu. Rev. Phys. Chem., 41 (1990) 525.
Fredrickson G. H. and Bates F. S., DYNAMICS OF BLOCK COPOLYMERS: Theory and Experiment, Annu. Rev. Mater. Sci., 26 (1996) 501.
Lutz J. F., Aperiodic Copolymers, ACS Macro Lett., 3 (2014) 1021.
Ring W., Mita I., Jenkins A. D. and Bikales N. M., Source-Based Nomenclature for Copolymers, Pure Appl. Chem., 57 (1985) 1427.
Kim H. C., Park S. M. and Hinsberg W. D., Block copolymer based nanostructures: materials, processes, and applications to electronics, Chem. Rev., 110 (2010) 146.
Fasolka M. J. and Mayes A. M., BLOCK COPOLYMER THIN FILMS: Physics and Applications, Annu. Rev. Mater. Res., 31 (2001) 323.
Leiblert L., Theory of Microphase Separation in Block Copolymers, Macromolecules, 1617 (1980) 1602.
Bates F. S., Polymer-Polymer Phase Behavior, Science, 251 (1991) 898.
Abetz V. and Simon P. F. W., Phase Behaviour and Morphologies of Block Copolymers, Adv. Polym. Sci., 189 (2005) 125.
Kim J. K., Yang S. Y., Lee Y. and Kim Y., Functional nanomaterials based on block copolymer self-assembly, Prog. Polym. Sci., 35 (2010) 1325.
Nunns A., Gwyther J. and Manners I., Inorganic block copolymer lithography, Polymer, 54 (2013) 1269.
Zhou J., Whittell G. R. and Manners I., Metalloblock Copolymers: New Functional Nanomaterials, Macromolecules, 47 (2014) 3529.
Park C., Yoon J. and Thomas E. L., Enabling nanotechnology with self assembled block copolymer patterns, Polymer, 44 (2003) 6725.
Li M. and Ober C. K., Block copolymer patterns and templates, Mater. Today, 9 (2006) 30.
Bates F. S. and Fredrickson G. H., Block copolymers: Designer soft materials, Phys. Today, 52 (1999) 32.
Darling S. B., Directing the self-assembly of block copolymers, Prog. Polym. Sci., 32 (2007) 1152.
Segalman R. A., Patterning with block copolymer thin films, Mater. Sci. Engin. R: Rep., 48 (2005) 191.
Kramer E. J., Phase transition in thin block copolymer films, MRS Bull., 35 (2010) 457.
Koo K., Ahn H., Kim S.-W., Ryu D. Y. and Russell T. P., Directed self-assembly of block copolymers in the extreme: guiding microdomains from the small to the large, Soft Matter, 9 (2013) 9059.
Cochran E. W., Garcia-Cervera C. J. and Fredrickson G. H., Stability of the gyroid phase in diblock copolymers at strong segregation, Macromolecules, 39 (2006) 2449.
Matsen M. W. and Schick M., Stable and Unstable Phases of a Diblock Copolymer Melt, Phys. Rev. Lett., 72 (1994) 2660.
Ohta T., Equilibrium Morphology of Block Copolymer Melts, Macromolecules, 19 (1986) 2621.
Han C. D., Kim J. and Kim J. K., Determination of the Order-Disorder Transition Temperature, Macromolecules, 22 (1989) 383.
Son J. G., Gotrik K. W. and Ross C. A., High-Aspect-Ratio Perpendicular Orientation of PS-b-PDMS Thin Films under Solvent Annealing, ACS Macro Lett., 1 (2012) 1279.
Russell T. P., Temperature Dependence of the Interaction Parameter of Polystyrene and Poly(methylmethacrylate), Macromolecules, 23 (1990) 890.
Giammaria T. J., Ferrarese Lupi F., Seguini G., Perego M., Vita F., Francescangeli O., Wenning B., Ober C. K., Sparnacci K., Antonioli D., Gianotti V. and Laus M., Micrometer scale ordering of silicon-containing block copolymer thin films via high temperature thermal treatment, ACS Appl. Mater. Interfaces, 8 (2016) 9897.
Son J. G., Chang J. B., Berggren K. K. and Ross C. A., Assembly of sub-10-nm block copolymer patterns with mixed morphology and period using electron irradiation and solvent annealing, Nano Lett., 11 (2011) 5079.
Albert J. N. L., Bogart T. D., Lewis R. L., Beers K. L., Fasolka M. J., Hutchison J. B., Vogt B. D. and Epps T. H., Gradient Solvent Vapor Annealing of Block Copolymer Thin Films Using a Microfluidic Mixing Device, Nano Lett., 11 (2011) 1351.
Bai W., Hannon A. F., Gotrik K. W., Choi H. K., Aissou K., Liontos G., Ntetsikas K., Alexander-Katz A., Avgeropoulos A. and Ross C. A., Thin Film Morphologies of Bulk-Gyroid Polystyrene-block- Polydimethylsiloxane under Solvent Vapor Annealing, Macromolecules, 47 (2014) 6000.
Lo T. Y., Chao C. C. and Ho R. M., Phase Transitions of Polystyrene-b-poly(dimethylsiloxane) in Solvents of Varying Selectivity, Macromolecules, 46 (2013) 7513.
Kennemur J. G., Yao L., Bates F. S. and Hillmyer M. A., Sub-5nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography, Macromolecules, 47 (2014) 1411.
Yokoyama H., Diffusion of block copolymers, Mater. Sci. Engin. R: Rep., 53 (2006) 199.
Lodge T. P. and Dalvi M. C., Mechanisms of Chain Diffusion in Lamellar Block Copolymers, Phys. Rev. Lett., 75 (1995) 657.
Dalvi M., Eastman C. and Lodge T., Diffusion in microstructured block copolymers: Chain localization and entanglements, Phys. Rev. Lett., 71 (1993) 2591.
Epps, III T. H. and O’Reilly R. K., Block copolymers: controlling nanostructure to generate functional materials — synthesis, characterization, and engineering, Chem. Sci., 7 (2016) 1674.
Cheng J., Ross C., Chan V., Thomas E., Lammertink R. and Vancso G., Formation of a cobalt magnetic dot array via block copolymer lithography, Adv. Mater., 13 (2001) 1174.
Ruiz R., Kang H., Detcheverry F. A., Dobisz E., Kercher D. S., Albrecht T. R., de Pablo J. J. and Nealey P. F., Density multiplication and improved lithography by directed block copolymer assembly, Science, 321 (2008) 936.
Frascaroli J., Brivio S., Ferrarese Lupi F., Seguini G., Boarino L., Perego M. and Spiga S., Resistive Switching in High-Density Nanodevices Fabricated by Block Copolymer Self-Assembly, ACS Nano, 9 (2015) 2518.
Stefik M. and Guldin S., Block copolymer self-assembly for nanophotonics, Chem. Soc. Rev., 44 (2015) 5076.
Dolan J. A., Wilts B. D., Vignolini S., Baumberg J. J., Steiner U. and Wilkinson T. D., Optical Properties of Gyroid Structured Materials: From Photonic Crystals to Metamaterials, Adv. Opt. Mater., 3 (2015) 12.
Tang J., Wang H.-T., Lee D. H., Fardy M., Huo Z., Russell T. P. and Yang P., Holey silicon as an efficient thermoelectric material, Nano Lett., 10 (2010) 4279.
Lim J., Wang H.-T., Tang J., Andrews S. C., So H., Lee J., Lee D. H., Russell T. P. and Yang P., Simultaneous Thermoelectric Property Measurement and Incoherent Phonon Transport in Holey Silicon, ACS Nano, 10 (2016) 124.
Lee J., Lim J. and Yang P., Ballistic phonon transport in holey silicon, Nano Lett., 15 (2015) 3273.
Rahman A., Ashraf A., Xin H., Tong X., Sutter P., Eisaman M. D. and Black C. T., Sub-50-nm self-assembled nanotextures for enhanced broadband antireflection in silicon solar cells, Nature Commun., 6 (2015) 5963.
Tsai H., Pitera J. W., Miyazoe H., Bangsaruntip S., Engelmann S. U., Liu C.-c., Cheng J. Y., Bucchignano J. J., Klaus D. P., Joseph E. A., Sanders D. P., Colburn M. E. and Guillorn M. A., Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication, ACS Nano, 8 (2014) 5227.
Wan L., Ruiz R., Gao H., Patel K. C. and Albrecht T. R., The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography, ACS Nano, 9 (2015) 7506.
Querelle S. E., Jackson E. A., Cussler E. L. and Hillmyer M. A., Ultrafiltration Membranes with a Thin Poly(styrene)-b-poly(isoprene) Selective Layer, ACS Appl. Mater. Interfaces, 5 (2013) 5044.
Yang S. Y., Yang J. A., Kim E. S., Jeon G., Oh E. J., Choi K. Y., Hahn S. K. and Kim J. K., Single-file diffusion of protein drugs through cylindrical nanochannels, ACS Nano, 4 (2010) 3817.
Shen L., He C., Qiu J., Lee S.-M., Kalita A., Cronin S. B., Stoykovich M. P. and Yoon J., Nanostructured Silicon Photocathodes for Solar Water Splitting Patterned by the Self-Assembly of Lamellar Block Copolymers, ACS Appl. Mater. Interfaces, 7 (2015) 26043.
Checco A., Ocko B. M., Rahman, A. Black C. T., Tasinkevych M., Giacomello A. and Dietrich S., Collapse and reversibility of the superhydrophobic state on nanotextured surfaces, Phys. Rev. Lett., 112 (2014) 216101.
Checco A., Rahman A. and Black C. T., Robust superhydrophobicity in large-area nanostructured surfaces defined by block-copolymer self assembly, Adv. Mater., 26 (2014) 886.
Killops K. L., Gupta N., Dimitriou M. D., Lynd N. A., Jung H., Tran H., Bang J. and Campos L. M., Nanopatterning Biomolecules by Block Copolymer Self-Assembly, ACS Macro Lett., 1 (2012) 758.
Jeong C. K., Jin H. M., Ahn J.-H., Park T. J., Yoo H. G., Koo M., Choi Y.-K., Kim S. O. and Lee K. J., Electrical biomolecule detection using nanopatterned silicon via block copolymer lithography, Small, 10 (2014) 337.
Ross C, Smith H., Savas T., Schattenburg M., Farhoud M., Hwang M., Walsh M., Abraham M. C. and Ram R. J., Fabrication of patterned media for high-density magnetic storage, J. Vac. Sci. Technol. B, 17 (1999) 3168.
Ross C., Patterned magnetic recording media, Annu. Rev. Mater. Res., 31 (2001) 203.
Hong A. J., Liu C.-C., Wang Y., Kim J., Xiu F., Ji S., Zou J., Nealey P. F. and Wang K. L., Metal nanodot memory by self-assembled block copolymer lift-off, Nano Lett., 10 (2010) 224.
Xu T., Kim H.-C., Derouchey J., Seney C, Levesque C, Martin P., Stafford C. M. and Russell T. P., The influence of molecular weight on nanoporous polymer films, Polymer, 42 (2001) 9091.
Seguini G., Giammaria T. J., Ferrarese Lupi F., Sparnacci K., Antonioli D., Gianotti V., Vita F., Placentino I. F., Hilhorst J., Ferrero C., Francescangeli O., Laus M. and Perego M., Thermally induced self-assembly of cylindrical nanodomains in low molecular weight PS-b-PMMA thin films, Nanotechnology, 25 (2014) 045301.
Ham S., Shin C., Kim E., Ryu D. Y., Jeong U., Russell T. P. and Hawker C. J., Microdomain Orientation of PS-b-PMMA by Controlled Interfacial Interactions, Macromolecules, 41 (2008) 6431.
Zucchi I. A., Poliani E. and Perego M., Microdomain orientation dependence on thickness in thin films of cylinder-forming PS-b-PMMA, Nanotechnology, 21 (2010) 185304.
Han E., Leolukman M., Kim M. and Gopalan P., Resist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography, ACS Nano, 4 (2010) 6527.
Peng Q., Tseng Y.-C., Darling S. B. and Elam J. W., A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates, ACS Nano, 5 (2011) 4600.
Huang E., Pruzinsky S., Russell T. P., Mays J. and Hawker C. J., Neutrality conditions for block copolymer systems on random copolymer brush surfaces, Macromolecules, 32 (1999) 5299.
Bates C. M., Seshimo T., Maher M. J., Durand W. J., Cushen J. D., Dean L. M., Blachut G., Ellison C. J. and Willson C. G., Polarity-switching top coats enable orientation of sub-10-nm block copolymer domains, Science, 338 (2012) 775.
Hamley I. W., Ordering in thin films of block copolymers: Fundamentals to potential applications, Prog. Polym. Sci., 34 (2009) 1161.
Mastroianni S. E. and Epps T. H., Interfacial Manipulations: Controlling Nanoscale Assembly in Bulk, Thin Film, and Solution Block Copolymer Systems, Langmuir, 29 (2013) 3864.
Sakurai S., Progress in control of microdomain orientation in block copolymers: Efficiencies of various external fields, Polymer, 12 (2008) 2781.
Xiang H., Lin Y. and Russell T. P., Electrically induced patterning in block copolymer films, Macromolecules, 37 (2004) 5358.
Liedel C, Pester C. W., Ruppel M., Lewin C, Pavan M. J., Urban V. S., Shenhar R., Bosecke P. and Boker A., Block copolymer nanocomposites in electric fields: kinetics of alignment, ACS Macro Lett., 2 (2013) 53.
Sinturel C., Vayer M., Morris M. and Hillmyer M. A., Solvent Vapor Annealing of Block Polymer Thin Films, Macromolecules, 46 (2013) 5399.
Kim S. O., Solak H. H., Stoykovich M. P., Ferrier N. J., de Pablo J. J. and Nealey P. F., Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates, Nature, 424 (2003) 411.
Bita I., Yang J. K. W., Jung Y. S., Ross C. A., Thomas E. L. and Berggren K. K., Graphoepitaxy of self-assembled block copolymers on two-dimensional periodic patterned templates, Science, 321 (2008) 939.
Park S., Lee D. H., Xu J., Kim B., Hong S. W., Jeong U., Xu T. and Russell T. P., Macroscopic 10-Terabit Square-Inch Arrays from Block Copolymers with Lateral Order, Science, 323 (2009) 1030.
Mansky P., Liu Y., Huang E., Russell T. P. and Hawker C., Controlling Polymer-Surface Interactions with Random Copolymer Brushes, Science, 275 (1997) 1458.
Peters R. D., Yang X. M., Kim T. K. and Nealey P. F., Wetting behavior of block copolymers on self-assembled films of alkylchlorosiloxanes: effect of grafting density, Langmuir, 16 (2000) 9620.
Ryu D. Y., Shin K., Drockenmuller E., Hawker Craig J. and Russell T. P., A generalized approach to the modification of solid surfaces, Science, 308 (2005) 236.
Pickett G. T., Witten T. A. and Nagel S. R., Equilibrium surface orientation of lamellae, Macromolecules, 26 (1993) 3194.
Peters R. D., Yang X. M., Kim T. K., Sohn B. H. and Nealey P. F., Using self-assembled monolayers exposed to x-rays to control the wetting behavior of thin films of diblock copolymers, Langmuir, 16 (2000) 4625.
Borah D., Shaw M. T., Holmes J. D. and Morris M. A., Sub-10nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process, ACS Appl. Mater. Interfaces, 5 (2013) 2004.
Ji S., Liu C.-C., Son J. G., Gotrik K., Craig G. S. W., Gopalan P., Himpsel F. J., Char K. and Nealey P. F., Generalization of the Use of Random Copolymers To Control the Wetting Behavior of Block Copolymer Films, Macromolecules, 41 (2008) 9098.
Ceresoli M., Palermo M., Ferrarese Lupi F., Seguini G., Perego M., Zuccheri G., Phadatare S. D., Antonioli D., Gianotti V., Sparnacci K. and Laus M., Neutral wetting brush layers for block copolymer thin films using homopolymer blends processed at high temperatures, Nanotechnology, 26 (2015) 415603.
Antonioli D., Sparnacci K., Laus M., Ferrarese Lupi F., Giammaria T. J., Seguini G., Ceresoli M., Perego M. and Gianotti V., Composition of ultrathin binary polymer brushes by thermogravimetry-gas chromatography-mass spectrometry, Anal. Bioanal. Chem., 408 (2016) 3155.
Milner S. T., Polymer Brushes, Science, 251 (1991) 905.
Kopf A., Baschnagel J., Wittmer J. and Binder K., On the adsorption process in polymer brushes: a monte carlo study, Macromolecules, 29 (1996) 1433.
Zhao B. and Brittain W. J., Polymer brushes: surface-immobilized macromolecules, Prog. Polym. Sci., 25 (2000) 677.
Iyer K. and Luzinov I., Effect of macromolecular anchoring layer thickness and molecular weight on polymer grafting, Macromolecules, 37 (2004) 9538.
Zdyrko B., Swaminatha I. K. and Luzinov I., Macromolecular anchoring layers for polymer grafting: Comparative study, Polymer, 47 (2006) 272.
Sparnacci K., Antonioli D., Gianotti V., Laus M., Ferrarese Lupi F., Giammaria T. J., Seguini G. and Perego M., Ultrathin random copolymer-grafted layers for block copolymer self-assembly, ACS Appl. Mater. Interfaces, 7 (2015) 10944.
Han E., Stuen K. O., La Y.-H., Nealey P. F. and Gopalan P., Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains, Macromolecules, 41 (2008) 9090.
Gianotti V., Antonioli D., Sparnacci K., Laus M., Giammaria T. J., Ferrarese Lupi F., Seguini G. and Perego M., On the Thermal Stability of PS-b-PMMA Block and P(S-r-MMA) Random Copolymers for Nanopatterning Applications, Macromolecules, 46 (2013) 8224.
Ferrarese Lupi F., Giammaria T. J., Seguini G., Ceresoli M., Perego M., Antonioli D., Gianotti V., Sparnacci K. and Laus M., Flash grafting of functional random copolymers for surface neutralization, J. Mater. Chem. C, 2 (2014) 4909.
Ferrarese Lupi F., Giammaria T. J., Seguini G., Laus M., Enrico E., De Leo N., Boarino L., Ober C. K. and Perego M., Thermally induced orientational flipping of cylindrical phase diblock copolymers, J. Mater. Chem. C, 2 (2014) 2175.
Liu C.-C., Thode C. J., Rincon Delgadillo P. A., Craig G. S. W., Nealey P. F. and Gronheid R., Towards an all-track 300 mm process for directed self-assembly, J. Vac. Sci. Technol. B, 29 (2011) 06F203.
Ryu D. Y., Wang J.-Y., Lavery K. A., Drockenmuller E., Satija S. K., Hawker C. J. and Russell T. P., Surface Modification with Cross-Linked Random Copolymers: Minimum Effective Thickness, Macromolecules, 40 (2007) 4296.
Andreozzi A., Poliani E., Seguini G. and Perego M., The effect of random copolymer on the characteristic dimensions of cylinder-forming PS-b-PMMA thin films, Nanotechnology, 22 (2011) 185304.
Seguini G., Zanenga F., Giammaria T. J., Ceresoli M., Sparnacci K., Antonioli D., Gianotti V., Laus M. and Perego M., Enhanced Lateral Ordering in Cylinder Forming PS-b-PMMA Block Copolymers Exploiting the Entrapped Solvent, ACS Appl. Mater. Interfaces, 8 (2016) 8280.
Li W. and Müller M., Defects in the Self-Assembly of Block Copolymers and Their Relevance for Directed Self-Assembly, Annu. Rev. Chem. Biomol. Engin., 6 (2015) 187.
Müller M. and de Pablo J. J., Computational Approaches for the Dynamics of Structure Formation in Self-Assembling Polymeric Materials, Annu. Rev. Mater. Res., 43 (2013) 1.
Matsen M. W. and Bates F., Unifying weak- and strong-segregation block-copolymer theories, Macromolecules, 29 (1996) 1091.
Marencic A. P. and Register R. A., Controlling order in block copolymer thin films for nanopatterning applications, Annu. Rev. Chem. Biomol. Engin., 1 (2010) 277.
Gianotti V., Antonioli D., Sparnacci K., Laus M., Giammaria T. J., Ceresoli M., Ferrarese Lupi F., Seguini G. and Perego M., Characterization of ultra-thin polymeric films by Gas chromatography-Mass spectrometry hyphenated to thermogravimetry, J. Chromatogr. A, 1368 (2014) 204.
Ferrarese Lupi F., Giammaria T. J., Seguini G., Vita F., Francescangeli O., Sparnacci K., Antonioli D., Gianotti V., Laus M. and Perego M., Fine Tuning of Lithographic Masks through Thin Films of PS-b-PMMA with Different Molar Mass by Rapid Thermal Processing, ACS Appl. Mater. Interfaces, 6 (2014) 7180.
Ceresoli M., Ferrarese Lupi F., Seguini G., Sparnacci K., Gianotti V., Antonioli D., Laus M., Boarino L. and Perego M., Evolution of lateral ordering in symmetric block copolymer thin films upon rapid thermal processing, Nanotechnology, 25 (2014) 275601.
Ceresoli M., Volpe F. G., Seguini G., Antonioli D., Gianotti V., Sparnacci K., Laus M. and Perego M., Scaling of correlation length in lamellae forming PS-b-PMMA thin films upon high temperature rapid thermal treatments, J. Mater. Chem. C, 3 (2015) 8618.
Sparnacci K., Antonioli D., Gianotti V., Laus M., Zuccheri G., Ferrarese Lupi F., Giammaria T. J., Seguini G., Ceresoli M. and Perego M., Thermal stability of functional P(S-r-MMA) random copolymers for nanolithographic applications, ACS Appl. Mater. Interfaces, 7 (2015) 3920.
Ferrarese Lupi F., Giammaria T. J., Ceresoli M., Seguini G., Sparnacci K., Antonioli D., Gianotti V., Laus M. and Perego M., Rapid thermal processing of self-assembling block copolymer thin films, Nanotechnology, 24 (2013) 315601.
Campbell I. P., He C. and Stoykovich M. P., Topologically Distinct Lamellar Block Copolymer Morphologies Formed by Solvent and Thermal Annealing, ACS Macro Lett., 2 (2013) 918.
Gu X., Gunkel I., Hexemer A., Gu W. and Russell T. P., An in situ grazing incidence X-ray scattering study of block copolymer thin films during solvent vapor annealing, Adv. Mater., 26 (2014) 273.
Qiang Z., Zhang Y., Groff J. A., Cavicchi K. A. and Vogt B. D., A generalized method for alignment of block copolymer films: solvent vapor annealing with soft shear, Soft Matter, 10 (2014) 6068.
Yager K. G., Fredin N. J., Zhang X., Berry B. C., Karim A. and Jones R. L., Evolution of block-copolymer order through a moving thermal zone, Soft Matter, 6 (2010) 92.
Choi E., Park S., Ahn H., Lee M., Bang J., Lee B. and Ryu D. Y., Substrate-Independent Lamellar Orientation in High-Molecular-Weight Polystyrene-b-poly(methyl methacrylate) Films: Neutral Solvent Vapor and Thermal Annealing, Macromolecules, 47 (2014) 3969.
Jin C., Murphy J. N., Harris K. D. and Buriak J. M., Deconvoluting the Mechanism of Microwave Annealing of Block Copolymer Thin Films, ACS Nano, 8 (2014) 3979.
Majewski P. W. and Yager K. G., Millisecond Ordering of Block Copolymer Films via Photothermal Gradients, ACS Nano, 9 (2015) 3896.
Yoon E., Kim E., Kim D. and Son J. G., Top-Coat Dewetting for the Highly Ordered Lateral Alignment of Block Copolymer Microdomains in Thin Films, Adv. Funct. Mater., 25 (2015) 913.
Stenbock-Fermor A., Knoll A. W., Boker A. and Tsarkova L., Enhancing Ordering Dynamics in Solvent-Annealed Block Copolymer Films by Lithographic Hard Mask Supports, Macromolecules, 47 (2014) 3059.
Park W. I., Kim J. M., Jeong J. W. and Jung Y. S., Deep-Nanoscale Pattern Engineering by Immersion-Induced Self-Assembly, ACS Nano, 8 (2014) 10009.
Perego M., Ferrarese Lupi F., Ceresoli M., Giammaria T. J., Seguini G., Enrico E., Boarino L., Antonioli D., Gianotti V., Sparnacci K. and Laus M., Ordering dynamics in symmetric PS-b-PMMA diblock copolymer thin films during rapid thermal processing, J. Mater. Chem. C, 2 (2014) 6655.
Boyer D. and Viñals J., Domain coarsening of stripe patterns close to onset, Phys. Rev. E, 64 (2001) 050101.
Kamaga C., Ibrahim F. and Dennin M., Dislocation dynamics in an anisotropic stripe pattern, Phys. Rev. E, 69 (2004) 066213.
Harrison C, Adamson D. H., Cheng Z., Sebastian J. M., Sethuraman S., Huse D. A., Register R. A. and Chaikin P. M., Mechanisms of Ordering in Striped Patterns, Science, 290 (2000) 1558.
Ruiz R., Bosworth J. K. and Black C. T., Effect of structural anisotropy on the coarsening kinetics of diblock copolymer striped patterns, Phys. Rev. B, 77 (2008) 054204.
Ruiz R., Sandstrom R. L. and Black C. T., Induced Orientational Order in Symmetric Diblock Copolymer Thin Films, Adv. Mater., 19 (2007) 587.
Vega D. A., Harrison C. K., Angelescu D. E., Trawick M. L., Huse D. A., Chaikin P. M. and Register R. A., Ordering mechanisms in two-dimensional sphere-forming block copolymers, Phys. Rev. E, 71 (2005) 061803.
Harrison C., Angelescu D. E., Trawick M., Cheng Z., Huse D. A., Chaikin P. M., Vega D. A., Sebastian J. M., Register R. A. and Adamson D. H., Pattern coarsening in a 2D hexagonal system, Europhys. Lett., 67 (2004) 800.
Black C. T. and Guarini K. W., Structural evolution of cylindrical-phase diblock copolymer thin films, J. Polym. Sci. A: Polym. Chem., 42 (2004) 1970.
Ji S., Liu C. C., Liao W., Fenske A. L., Craig G. S. W. and Nealey P. F., Domain orientation and grain coarsening in cylinder-forming poly(styrene-b-methyl methacrylate) films, Macromolecules, 44 (2011) 4291.
Rockford L., Liu Y., Mansky P., Russell T. P., Yoon M. and Mochrie S. G. J., Polymers on nanoperiodic, heterogeneous surfaces, Phys. Rev. Lett., 82 (1999) 2602.
Xie N., Li W., Qiu F. and Shi A. C., New strategy of nanolithography via controlled block copolymer self-assembly, Soft Matter, 9 (2013) 536.
Ji S., Wan L., Liu C.-C. and Nealey P. F., Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication, Prog. Polym. Sci., 54–55 (2016) 76.
Stoykovich M. P., Kang H., Daoulas K. C., Liu G., Liu C.-C., De Pablo J. J., Müller M. and Nealey P. F., Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries, ACS Nano, 1 (2007) 168.
Park S., Kim B., Hawker C., Kramer E., Bang J. and Ha J., Controlled ordering of block copolymer thin films by the addition of hydrophilic nanoparticles, Macromolecules, 40 (2007) 8119.
Tada Y., Yoshida H., Ishida Y., Hirai T., Bosworth J. K., Dobisz E., Ruiz R., Takenaka M., Hayakawa T. and Hasegawa H., Directed self-assembly of poss containing block copolymer on lithographically defined chemical template with morphology control by solvent vapor, Macromolecules, 45 (2012) 292.
Segalman R. A., Yokoyama H. and Kramer E. J., Graphoepitaxy of Spherical Domain Block Copolymer Films, Adv. Mater., 136 (2001) 1152.
Ilievski F. and Ross C. A., Graphoepitaxy of block copolymers using selectively removable templates, J. Vac. Sci. Technol. B, 28 (2010) 42.
Tong Q. and Sibener S. J., Visualization of Individual Defect Mobility and Annihilation within Cylinder-Forming Diblock Copolymer Thin Films on Nanopatterned Substrates, Macromolecules, 46 (2013) 8538.
Park S. M., Stoykovich M. P., Ruiz R., Zhang Y., Black C. T. and Nealey P. F., Directed Assembly of Lamellae- Forming Block Copolymers by Using Chemically and Topographically Patterned Substrates, Adv. Mater., 19 (2007) 607.
Maher M. J., Rettner C. T., Bates C. M., Blachut G., Carlson M. C, Durand W. J., Ellison C. J., Sanders D. P., Cheng J. Y. and Willson C. G., Directed self-assembly of silicon-containing block copolymer thin films, ACS Appl. Mater. Interfaces, 7 (2015) 3323.
Jeong S. J., Kim J. E., Moon H. S., Kim B. H., Kim S. M., Kim J. B. and Kim S. O., Soft graphoepitaxy of block copolymer assembly with disposable photoresist confinement, Nano Lett., 9 (2009) 2300.
Park S.-M., Berry B. C., Dobisz E. and Kim H.-C., Observation of surface corrugation-induced alignment of lamellar microdomains in PS-b-PMMA thin films, Soft Matter, 5 (2009) 957.
Perego M., Andreozzi A., Vellei A., Ferrarese Lupi F. and Seguini G., Collective behavior of block copolymer thin films within periodic topographical structures, Nanotechnology, 24 (2013) 245301.
Ferrarese Lupi F., Aprile G., Giammaria T. J., Seguini G., Zuccheri G., De Leo N., Boarino L., Laus M. and Perego M., Thickness and Microdomain Orientation of Asymmetric PS-b-PMMA Block Copolymer Films Inside Periodic Gratings, ACS Appl. Mater. Interfaces, 7 (2015) 23615.
Chen W., Luo J., Shi P., Li C., He X., Hong P., Li J. and Zhao C., Self-assembling morphologies of symmetrical PS-b-PMMA in different sized confining grooves, RSC Adv., 4 (2014) 50393.
Cheng Y., Ross C. A., Thomas E. L., Smith H. I. and Vancso G. J., Templated self-assembly of block copolymers: Effect of substrate topography, Adv. Mater., 15 (2003) 1599.
Xiao S., Yang X. M., Edwards E. W., La Y.-H. and Nealey P. F., Graphoepitaxy of cylinder-forming block copolymers for use as templates to pattern magnetic metal dot arrays, Nanotechnology, 16 (2005) 324.
Hosaka S., Akahane T., Huda M., Zhang H. and Yin Y., Controlling of 6 nm sized and 10 nm pitched dot arrays ordered along narrow guide lines using PS-b-PDMS self-assembly, ACS Appl. Mater. Interfaces, 6 (2014) 6208.
Borah D., Rasappa S., Salaun M., Zellsman M., Lorret O., Liontos G., Ntetsikas K., Avgeropoulos A. and Morris M. A., Soft graphoepitaxy for large area directed self-assembly of polystyrene-block-poly(dimethylsiloxane) block copolymer on nanopatterned poss substrates fabricated by nanoimprint lithography, Adv. Funct. Mater., 25 (2015) 3425.
Frascaroli J., Seguini G., Spiga S., Perego M. and Boarino L., Fabrication of periodic arrays of metallic nanoparticles by block copolymer templates on HfO2 substrates, Nanotechnology, 26 (2015) 215301.
Perego M., Andreozzi A., Seguini G., Schamm-Chardon S., Castro C. and BenAssayag G., Silicon crystallization in nanodot arrays organized by block copolymer lithography, J. Nanoparticle Res., 16 (2014) 2775.
Andreozzi A., Lamagna L., Seguini G., Fanciulli M., Schamm-Chardon S., Castro C. and Perego M., The fabrication of tunable nanoporous oxide surfaces by block copolymer lithography and atomic layer deposition, Nanotechnology, 22 (2011) 335303.
Bigall N. C., Nandan B., Gowd E. B., Horechyy A. and Eychmüller A., High-Resolution Metal Nanopatterning by Means of Switchable Block Copolymer Templates, ACS Appl. Mater. Interfaces, 7 (2015) 12559.
Guarini K. W., Black C. T., Zhang Y., Babich I. V., Sikorski E. M. and Gignac L. M., Low voltage, scalable nanocrystal flash memory fabricated by templated self assembly, IEDM 03 technical digest. IEEE International, 2003, pages 22.2.1-22.2.4.
Kang G. B., Kim Y. T., Park J. H., Kim S.-I. and Sohn Y.-S., Fabrication of silicon nanodots on insulator using block copolymer thin film, Curr. Appl. Phys., 9 (2009) e197.
Farrell R. A., Petkov N., Morris M. A. and Holmes J. D., Self-assembled templates for the generation of arrays of 1-dimensional nanostructures: From molecules to devices, J. Colloid Interface Sci., 349 (2010) 449.
Ferrarese Lupi F., Giammaria T. J., Volpe F. G., Lotto F., Seguini G., Pivac B., Laus M. and Perego M., High Aspect Ratio PS-b-PMMA Block Copolymer Masks for Lithographic Applications, ACS Appl. Mater. Interfaces, 6 (2014) 21389.
Castro C., Schamm-Chardon S., Pecassou B., Andreozzi A., Seguini G., Perego M. and BenAssayag G., In-plane organization of silicon nanocrystals embedded in SiO2 thin films, Nanotechnology, 24 (2013) 075302.
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Perego, M., Seguini, G. Self-assembly strategies for the synthesis of functional nanostructured materials. Riv. Nuovo Cim. 39, 279–312 (2016). https://doi.org/10.1393/ncr/i2016-10124-4
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DOI: https://doi.org/10.1393/ncr/i2016-10124-4