Abstract
This paper reviews the subject of Si quantum dots embedded in dielectric and its application to the realization of non volatile semiconductor memo¬ries. In the first part of the paper various approaches for the analysis of the materials through transmission electron microscopy (TEM) are critically discussed. The ad¬vantages coming from an innovative application of energy filtered TEM are put in clear evidence. The paper then focuses on the synthesis of the materials: two dif¬ferent methodologies for the realization of the dots, both based on chemical vapor deposition are described in detail, and physical models providing some understand¬ing of the observed phenomenology are reported. We then discuss the application of this nanotechnology to the realization of the storage nodes in non volatile semi¬conductor memories. The following sections describe the electrical characteristics found in the test devices and some key aspects are described in terms of quantita¬tive models. The test devices show several performance advantages, indicating that the approach is an excellent candidate for the realization of Flash memories of the nanoelectronic era.
PACS 73.63. Bd - Nanocrystalline materials.
PACS 73.63.Kv - Quantum dots.
PACS 85.30.-z - Semiconductor devices.
PACS 85.35. -p - Nanoelectronic devices.
Similar content being viewed by others
References
Kirby J., Nobel lectures, Physics 1996-2000, edited by Ekspong G. (World Scientific Publishig Co. Singapore) 2002, p. 474.
Dennard R. H. et al, Design of Ion-Implanted MOSFET’s with Very Small Physical Dimensions, IEEE Solid J. State Ckt, CS-9 (1974) 256
Baccarani G., Wordeman M. R. and Dennard R. H., Generalized scaling theory and its application to a 1/4 micrometer MOSFET design, IEEE Trans. Electron Devices, ED-31 (1984) 452–461.
Sze S. M. (Editor), VLSI Technology, 2nd Edition (McGraw Hill) 1988.
Hori T., Gate Dielectrics and MOS (ULSIs) 1997.
Rimini E., Ion Implantation: Basics to Device Fabrication (Kluwer Academic Publishers, Boston) 1995.
Sze S. M., Physics of Semiconductor Devices, 2nd Edition (Wiley) 1981.
Cappelletti P., Golla C, Olivo P. and Zanoni E., Flash Memories (Kluwer Academic Publishers) 1998.
International Technology Roadmap for Semiconductors (ITRS), 2002 Edition, Process Integration, Devices, and Structures and Emerging Research Devices.
Wade W. and Lammers D., EE Times, July 16 (2001).
Yoshikawa K., Technology Requirements for Next Decade Flash Memories, in Proceedings of the 30th European Solid-State Device Research Conference, Cork Ireland, 11-13, September 2000 (Frontier Group, ESSDERC) 2000, p. 72.
Desalvo B., Lombardo S. (Guest Editors), Proceedings of the Workshop “Non volatile memories with discrete storage nodes”, Special issue of Solid-State Electronics, 48 (2004).
Minami S. et al, “A 3Volt 1Mbit full-featured EEPROM using a highly-reliable MONOS device technology”, IEICE Trans. Electron E, 776C (1994) 1260.
Eetan B. et al, “NROM: A novel localized trapping, 2-bit nonvolatile memory cell”, IEEE Electron. Dev. Lett, 21 (2000) 543.
Tiwari S. et al., Volatile and non-volatile memories in silicon with nano-crystal storage, in Proceedings of the IEDM (IEEE, New York) 1995, p. 521.
Gebel T., Rebohle L., Zhao J., Borchert D., FrÖb H., Borany J.V. and Skorupa W., Mater. Res. Soc. Symp. Proc, 638 (2001) F18.1.
Hanafi H. I., Tiwari S. and Khan I., IEEE Trans. Electron. Dev., 43 (1996) 1553.
De Blauwe J., Ostraat M., Green M. L., Weber G., Sorsch T., Kerber A., Klemens F., Cirelli R., Ferry E., Grazul J. L., Baumann F., Kim Y., Mansfield W., Bude J., Lee J. T. C, Hillenius S. J., Flagan R. C. and Atwater H. A., Proceedings of the IEDM (IEEE, New York) 2000.
Madhukar S., Smith K., Muralidhar R., O’Meara D., Sadd M., Nguyen B.-Y., White B. and Jones B., Mater. Res. Soc. Symp. Proc, 638 (2001) F5.2.1.
Lombardo S. and Campisano S. U., Electrical and Optical Properties of semi-insulating polycrystalline Si thin finis: the role of microstructure and doping, Mater. Sci. Eng. Rep. R, 17 (1996) 281.
Iacona F., Franzo G. and Spinella C, J. Appl. Phys., 87 (2000) 1295.
Crupi L, Lombardo S., Spinella C, Buongiorno C, Liao Y., Gerardi C, Fazio B., Vulpio M. and Privitera S., J. Appl. Phys., 89 (2001) 5552.
Gourbilleau F., Portier X., Ternon C, Voivenel P., Madelon R. and Rizk R., Appl. Phys. Lett, 78 (2001) 3058.
Inokuma T., Wakayama Y., Muramoto T., Aoki R., Kurata Y. and Hasegawa S., J. Appl. Phys., 83 (1998) 2228.
Zhu J. G., White C. W., Budai J. D., Withrow S. P. and Y. Chen, J. Appl. Phys., 78 (1995) 4386.
Shimizu-Iwayama T., Fujita K., Nakao S., Saitoh K., Fujita T. and Itoh N., J. Appl. Phys., 75 (1994) 7779.
Nicotra G., Lombardo S., Spinella C., Ammendola G., Gerardi C. and Depuro C., Appl. Surf. Sci., 205 (2003) 304.
Iacona F., Bongiorno C., Spinella C., Boninelli S. and Priolo F., J. Appl. Phys., 95 (2004) 3723.
Spinella C., Bongiorno C., Nicotra G., Rimini E., MuscarÀ A. and Coffa S., Appl. Phys. Lett, 87 (2005) 4102.
Zacharias M., Blasing J., Veit P., Tsybeskov L., Hirshman K. and Fauchet P. M., Appl. Phys. Lett., 74 (1999) 2614.
Pacifici D., Moreira E. C, Franzo G., Martorino V., Priolo F. and Icona F., Phys. Rev. B, 65 (2002) 144109.
Krivanek O. L., Kundmann M., and Bourrat X., Mat. Res. Soc. Symp. Proc., 332 (1994) 341.
BarrerÀ R. G. and Fuchs R., Phys. Rev. B, 52 (1995) 3256.
Schmeitz M., J. Phys. C, 14 (1981) 1203.
Egerton R. F., in Electron Energy-Loss Spectroscopy in the Electron Microscopy, 2nd edition (Plenum Press, New York) 1996.
Nicotra G., Puglisi R. A., Lombardo S., Spinella C, Vulpio M., Ammendola G., Bileci M. and Gerardi C, Nucleation kinetics of Si quantum dots on SÌO2, J App. Phys., 95 (2004) 2049.
Nicotra G., Lombardo S., Spinella C, Ammendola G., Gerardi C. and Demuro C, Appl. Surf. Sci., 205 (2003) 304.
Schneidman V. A., Sov. Phys. Technol. Phys., 33 (1988) 1338.
Baron T. et al, J. Crystal Growth, 209 (2000) 1004.
Mazen F. et al., Influence of the Chemical Properties of the Substrate on Silicon Quantum Dot Nucleation, J. Electrochem. Society, 150 (2003) G203–G208.
Puglisi R. A., Nicotra G., Lombardo S., Spinella C, Ammendolai G., Bileci M. and Gerardi C, Exclusion zone surrounding silicon nanoclusters formed by rapid thermal chemical vapour deposition on SÌO2, Surface Sci., 550 (2004) 119.
Desalvo B. et al, IEEE Trans. Electron Devices, 48 (2001) 1789.
Gerardi C, Ammendola G., Melanotte M., Lombardo S., I. CRUPI and Rimini E., Proc. ESSDERG, (2002) 475.
Lombardo S., Gerardi C, Corso D., Ammendola G., I. Crupi and Melanotte M.„ Proceedings of IEEE-NVSMW, (2003) 105.
De Salvo B., Gerardi C, Lombardo S., Baron T., Perniola L., Mariolle D., Mur P., Toffoli A., Gely M., Semeria M. N., Deleonibus S., Ammendola G., Ancarani V., Melanotte M., Bez R., Baldi L., Corso D., Crupi I., Puglisi R. A., Nicotra G., Rimini E., Mazen F., Ghibaudo G., Pananakakis G., Monzio compagnoni C, Ielmini D., Lacaita A., Spinelli A., Wan Y. M. and Van Der Jeugd K., HOW far will Silicon nanocrystals push the scaling limits of NVMs technologies?, IEDM Tech. Dig., (2003).
Lombardo S., Gerardi C, Corso D., Ammendola G., I. Crupi and Melanotte M., Proc. ESSDERG 2003.
Spitale E., Corso D., Crupi I., Nicotra G., Lombardo S., Deleruyelle D., Gely M., Buffet N., De Salvo B. and Gerardi C, Effect of high-k materials in the control dielectric stack of nanocrystal memories, to be published in Proc. ESSDERC 2004
Lombardo S., Puglisi R. A., CRupi L, Corso D., Nicotra G., Perniola L., De Salvo B. and Gerardi C, Distribution of the Threshold Voltage Window in Nanocrystal Memories with Si Dots Formed by Chemical Vapor Deposition: Effect of Partial Self-Ordering, Proc. IEEE-NVSMW 200Jh.
Strukov D. B. and Likharev K. K., Prospects for terabit-scale nanoelectronic memories, Nanotechnology, 16 (2005) 137.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Lombardo, S., Spinella, C. & Rimini, E. Si quantum dots for nanoelectronics: From materials to applications. Riv. Nuovo Cim. 28, 1–31 (2005). https://doi.org/10.1393/ncr/i2006-10002-8
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1393/ncr/i2006-10002-8